Manufacturing method for micro-transformers
View Patent ↗A micro-transformer manufacturing method is provided, which can improve throughput, prevent a crack from entering an insulating film between coils, and manufacture the micro-transformer without using a mask material having a high selection ratio. An insulating film is deposited on the whole face of a semiconductor substrate having an impurity-diffused region. This insulating film is partially removed to form a first opening and a second opening. A primary coil is formed such that a center pad contacts the impurity-diffused region through the first opening. A thin insulating film is deposited on the primary coil. An insulator material having a secondary coil formed thereon is adhered onto the insulating film on the primary coil by adhesive tape. The insulator material is sized to not cover both a pad, connected with the center pad of the primary coil through the impurity-diffused region, and an outer-end pad of the primary coil.
1. A micro-transformer manufacturing method comprising the steps of:
forming a primary coil by:
forming an impurity-diffused region selectively on the surface of a semiconductor substrate,
depositing a first insulating film on the surface of the semiconductor substrate having the impurity-diffused region,
forming a first opening and a second opening in the first insulating film, wherein the first opening and the second opening reach the impurity-diffused region,
depositing a first conductive film on the first insulating film,
working the first conductive film into a desired shape around the portion of the first conductive film over the first opening,
depositing a second insulating film on the first insulating film and the first conductive film, and
removing a portion of the second insulating film to expose the portion of the first conductive film over the second opening; and
forming a secondary coil by:
forming a second conductive film on the surface of an insulator material, which is sized to have a smaller area than an area of the second insulating film;
working the second conductive film into a desired shape; and
adhering the secondary coil onto the second insulating film of the primary coil with the insulator material being positioned between the secondary coil and above the second insulating film, while maintaining the portion of the first conductive film over the second opening exposed, and without electrically connecting the exposed portion of the first conductive film over the second opening with the second conductive film.
2. A micro-transformer manufacturing method according to claim 1 , wherein the secondary coil forming step further includes, after forming the second conductive film and working the second conductive film, grinding the face of that side of the insulator material on which the second conductive film is not formed, to thin the insulator material.
3. A micro-transformer manufacturing method according to claim 1 , wherein the secondary coil forming step further includes, after forming the second conductive film and working the second conductive film, depositing a third insulating film on the insulator material and the second conductive film, and forming an opening in the third insulating film that reaches the second conductive film.
4. A micro-transformer manufacturing method according to claim 2 , wherein the secondary coil forming step further includes, between forming and working the second conductive film and grinding the insulator material, depositing a third insulating film on the insulator material and the second conductive film, to form an opening in the third insulating film that reaches the second conductive film.
5. A micro-transformer manufacturing method according to claim 1 , wherein:
the primary coil forming step further includes the step of, after depositing the second insulating film, forming pattern registering markers for adhering the secondary coil to the second insulating film, and
the secondary coil adheres onto the second insulating film of the primary coil with reference to the pattern registering markers, with the insulator material being positioned below the secondary coil and above the second insulating film.
6. A micro-transformer manufacturing method according to claim 5 , wherein the insulator material is sized so that the insulator material does not entirely cover the pattern registering markers formed on the second insulating film.