METHOD OF MANUFACTURING OF SUBSTRATE
A method of manufacturing a substrate is provided for readily processing a substrate in the presence of a supercritical fluid in a deposition step, an etching step, a resist peeling step and the like. The method of manufacturing a substrate of the present invention is a method of manufacturing a substrate for processing a surface of the substrate by filling a liquid fluid in a reaction chamber in which the substrate is placed, and reacting a precursor solved in the liquid fluid in the vicinity of the surface of the substrate, wherein the substrate is placed on a ceiling of the reaction chamber with the surface of the substrate oriented downward.
1 . A method of manufacturing a substrate for processing a surface of the substrate by filling a liquid fluid in a reaction chamber in which the substrate is placed, and reacting a precursor solved in the liquid fluid in the vicinity of the surface of the substrate, wherein said substrate is placed on a ceiling of said reaction chamber with the surface of the substrate oriented downward.
2 . The method of manufacturing a substrate according to claim 1 , wherein said substrate is heated from a back side of the substrate.
3 . The method of manufacturing a substrate according to claim 2 , wherein heat insulation is provided between heating means for heating the substrate and an inner wall of said reaction chamber.
4 . The method of manufacturing a substrate according to claim 1 , wherein a flow regulation plate is disposed at a position opposite to the surface of the substrate.
5 . The method of manufacturing a substrate according to claim 4 , wherein a gap between the surface of the substrate and said flow regulation plate is set to 20 mm or less.
6 . The method of manufacturing a substrate according to claim 5 , wherein said reaction chamber is divided into a first reaction chamber and a second reaction chamber by said flow regulation plate, and said first reaction chamber is held at the same pressure as said second reaction chamber.
7 . The method of manufacturing a substrate according to claim 6 , wherein said liquid fluid is supplied to said second reaction chamber.
8 . The method of manufacturing a substrate according to claim 1 , wherein said liquid fluid is a supercritical fluid.
9 . A method of manufacturing a substrate for processing a surface of the substrate by filling a liquid fluid in a reaction chamber in which the substrate is placed, and reacting a precursor solved in the liquid fluid in the vicinity of the surface of the substrate, wherein said substrate is placed in a direction in which heat rises due to a convection of the liquid fluid.
10 . The method of manufacturing a substrate according to claim 9 , wherein said substrate is heated from a back side of the substrate.
11 . The method of manufacturing a substrate according to claim 10 , wherein heat insulation is provided between heating means for heating the substrate and an inner wall of said reaction chamber.
12 . The method of manufacturing a substrate according to claim 9 , wherein a flow regulation plate is disposed at a position opposite to the surface of the substrate.
13 . The method of manufacturing a substrate according to claim 12 , wherein a gap between the surface of the substrate and said flow regulation plate is set to 20 mm or less.
14 . The method of manufacturing a substrate according to claim 12 , wherein said reaction chamber is divided into a first reaction chamber and a second reaction chamber by said flow regulation plate, and said first reaction chamber is held at the same pressure as said second reaction chamber.
15 . The method of manufacturing a substrate according to claim 14 , wherein said liquid fluid is supplied to said second reaction chamber.
16 . The method of manufacturing a substrate according to claim 9 , wherein said liquid fluid is a supercritical fluid.