IP Library Granted Patent US 8,136,224
Granted Patent B1
US 8,136,224 · App. 12/121,540 · Granted Mar 20, 2012

Method and system for providing a perpendicular magnetic recording head utilizing a mask having an undercut line

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Quick Facts
Patent No.
US 8,136,224
App. No.
12/121,540
Granted
Mar 20, 2012
Kind
B1
Abstract

A method and system for providing a PMR pole in a magnetic recording transducer including an intermediate layer are disclosed. The method and system include providing a mask including a line on the intermediate layer. The line has at least one side, a top, and a bottom. The side(s) have an undercut such that the top of the line is wider than the bottom. The method further include providing a hard mask on the PMR transducer. The hard mask includes an aperture corresponding to the line. Thus, an aperture in the hard mask corresponding to the line is provided. The method and system also include forming a trench in the intermediate layer under the aperture. The trench has a bottom and a top wider than the bottom. The method further includes providing a PMR pole, at least a portion of which resides in the trench.

Claims (37)

1. A method for providing a PMR pole in a magnetic recording transducer including an intermediate layer, the method comprising:

providing a mask on the intermediate layer, the mask including a line having at least one side, a top, and a bottom, the at least one side having an undercut such that the top is wider than the bottom;

providing a hard mask on the PMR transducer, the hard mask including an aperture corresponding to the line;

forming a trench in the intermediate layer under the aperture, the trench having a bottom and a top wider than the bottom; and

providing a PMR pole, at least a portion of the PMR pole residing in the trench.

2. The method of claim 1 wherein the step of providing the hard mask further includes:

removing the line without removing all of the hard mask, thereby providing the aperture in the hard mask corresponding to the line.

3. The method of claim 2 wherein the removing the line further includes:

performing a lift-off.

4. The method of claim 1 wherein the line includes a photoresist line.

5. The method of claim 1 wherein the mask is a bi-layer mask.

6. The method of claim 5 wherein the bi-layer mask includes a photoresist layer and a polydimethylglutarimide layer on the photoresist layer.

7. The method of claim 1 wherein the step of forming the trench further includes:

performing at least one reactive ion etch to remove a portion of the intermediate layer.

8. The method of claim 1 further comprising:

providing a nonmagnetic layer in the trench, at least a portion of the nonmagnetic layer residing in the trench, the PMR pole residing on the nonmagnetic layer.

9. The method of claim 1 further comprising:

providing a planarization stop layer under the line.

10. The method of claim 8 wherein the step of providing the PMR pole further includes:

plating a PMR pole layer; and

performing a planarization.

11. The method of claim 1 wherein the step of providing the PMR pole further includes:

providing a seed layer for the PMR pole layer.

12. The method of claim 1 wherein the top of the PMR pole has a width of not more than one hundred fifty nanometers.

13. The method of claim 12 wherein the width is not more than one hundred nanometers.

14. A method for providing a magnetic recording transducer including an intermediate layer, the method comprising:

providing a planarization layer on the intermediate layer;

providing a bi-layer mask on the planarization layer, the bi-layer mask including a line having at least one side, a top, and a bottom, the at least one side having an undercut such that the top is wider than the bottom;

providing a hard mask layer on the bi-layer mask;

performing a lift-off to remove the line to form an aperture in the hard mask layer;

performing a reactive ion etch to form an additional aperture in the planarization layer and a trench in the intermediate layer under the aperture, the trench having a bottom and a top wider than the bottom;

providing the PMR pole layer; and

performing a planarization on the PMR pole layer to form a PMR pole, at least a portion of the PMR pole residing in the trench.

15. The method of claim 14 further comprising:

providing a nonmagnetic layer in the trench, at least a portion of the nonmagnetic layer residing in the trench.

16. The method of claim 14 wherein the step of providing the PMR pole further includes:

providing a seed layer on the nonmagnetic layer.

Assignments (7)
RELEASE OF SECURITY INTEREST AT REEL 038710 FRAME 0845 Recorded Feb 8, 2022
From: JPMORGAN CHASE BANK, N.A.
To: WESTERN DIGITAL (FREMONT), LLC; WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 058965/0445 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 19, 2019
From: WESTERN DIGITAL (FREMONT), LLC
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 050450/0582 →
RELEASE OF SECURITY INTEREST Recorded Mar 5, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: WESTERN DIGITAL (FREMONT), LLC
Reel/Frame 045501/0158 →
SECURITY AGREEMENT Recorded May 16, 2016
From: WESTERN DIGITAL (FREMONT), LLC
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 038744/0755 →
SECURITY AGREEMENT Recorded May 16, 2016
From: WESTERN DIGITAL (FREMONT), LLC
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 038710/0845 →
SECURITY AGREEMENT Recorded May 16, 2016
From: WESTERN DIGITAL (FREMONT), LLC
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038744/0675 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 26, 2008
From: SUN, HAI; ZHANG, JINQIU; YUAN, HONGPING; LI, DONGHONG; HONG, LIUBO; SHEN, YONG
To: WESTERN DIGITAL (FREMONT), LLC
Reel/Frame 021441/0494 →