Electroplating methods and chemistries for deposition of group IIIA-group via thin films
View Patent ↗An electrochemical co-deposition method and solution to plate uniform, defect free and smooth (In,Ga)—Se films with repeatability and controllable molar ratios of (In,Ga) to Se are provided. Such layers are used in fabrication of semiconductor and electronic devices such as thin film solar cells. In one embodiment, the present invention provides an alkaline electrodeposition solution that includes an In salt, a Se acid or oxide, a tartrate salt as complexing agent for the In species, and a solvent to electrodeposit an In—Se film possessing sub-micron thickness on a conductive surface.
1. A method of electrodepositing a Group IIIA-Group VIA thin film on a conductive surface comprising the steps of:
(a) providing an electrodeposition solution that comprises a solvent, a Group IIIA material source to provide Ga, a Group VIA material source to provide at least one of Se, Te and S, and a complexing agent that complexes with the Ga to form soluble complex ions of Group IIIA material species;
(b) adjusting the pH of the electrodeposition solution to at least 7;
(c) contacting the electrodeposition solution having the pH adjusted to at least 7 with an anode and the conductive surface;
(d) establishing a potential difference between the anode and the conductive surface; and
(e) electrodepositing the Group IIIA-Group VIA thin film on the conductive surface using the electrodeposition solution having the pH adjusted to at least 7 in the presence of the potential difference.
2. The method of claim 1 , wherein a GroupVIA material species from the Group VIA material source does not substantially form a complex with the complexing agent.
3. The solution of claim 1 wherein the GroupVIA material source is capable of dissolving in the solvent under alkaline conditions in the absence of the complexing agent.
4. The method of claim 1 , wherein the Group VIA material source comprises Se.
5. The method of claim 4 , wherein the Group IIIA material source comprises a dissolved Ga metal, and a dissolved Ga salt, wherein the Ga salt is selected from the group consisting of Ga-chloride, Ga-sulfate, Ga-sulfamate, Ga-acetate, Ga-carbonate, Ga-nitrate, Ga-perchlorate, Ga-phosphate, Ga-oxide, and Ga-hydroxide.
6. The method of claim 4 , wherein the Group IIIA material source comprises both dissolved In and Ga metals, and dissolved In and Ga salts, wherein the In salts are selected from the group consisting of In-chloride, In-sulfate, In-sulfamate, In-acetate, In-carbonate, In-nitrate, In-phosphate, In-oxide, In-perchlorate, and In-hydroxide, and wherein the Ga salts are selected from the group consisting of Ga-chloride, Ga-sulfate, Ga-sulfamate, Ga-acetate, Ga-carbonate, Ga-nitrate, Ga-perchlorate, Ga-phosphate, Ga-oxide, and Ga-hydroxide.
7. The method claim 1 wherein the pH value of the electrodeposition solution is in the range of 8-14.
8. The method of claim 1 , wherein the Group VIA material source comprises at least one of the species of (i) at least one of dissolved elemental Se, Te and S, (ii) at least one of acids of Se, Te and S, and (iii) at least one of dissolved Se, Te and S compounds, wherein the Se, Te and S compounds are selected from the group consisting of oxides, chlorides, bromides, iodides, sulfates, nitrates, perchlorates and phosphates of Se, Te and S.
9. The method of claim 1 , wherein the Group VIA material source comprises dissolved elemental Se, an acid of Se, and a dissolved Se compound, wherein the Se compound is selected from the group consisting of oxides, chlorides, bromides, iodides, sulfates, nitrates, perchlorates and phosphates of Se.
10. The method of claim 9 , wherein the complexing agent comprises at least one of a carboxyl functional group and an amine functional group.
11. The method of claim 9 wherein the complexing agent comprises at least one of the species of (i) an acid and (ii) an alkali metal salt of the acid, and wherein the acid comprises one of tartaric acid, citric acid, acetic acid, malonic acid, malic acid, succinic acid, ethylenediaminetetra acetic acid (EDTA), nitrilotriacetic acid (NTA), and hydroxyethylethylenediaminetriacetic acid (HEDTA).
12. The method of claim 11 wherein the complexing agent is an alkali metal salt of tartaric acid including one of potassium sodium tartrate, potassium tartrate, sodium tartrate, ammonium tartrate, tetraalkyl ammonium tartrate, lithium tartrate, alkyl tartrate and dialkyl tartrate.
13. The method of claim 1 , wherein the complexing agent comprises at least one of a carboxyl functional group and an amine functional group.
14. The method of claim 1 , wherein the complexing agent comprises at least one of the species of (i) an acid and (ii) an alkali metal salt of the acid, and wherein the acid is selected from the group consisting of one of tartaric acid, citric acid, acetic acid, malonic acid, malic acid, succinic acid, ethylenediaminetetra acetic acid (EDTA), nitrilotriacetic acid (NTA), and hydroxyethylethylenediaminetriacetic acid (HEDTA).
15. The method of claim 14 , wherein the complexing agent is an alkali metal salt of tartaric acid including one of potassium sodium tartrate, potassium tartrate, sodium tartrate, ammonium tartrate, tetraalkyl ammonium tartrate, lithium tartrate, alkyl tartrate and dialkyl tartrate.
16. The method of claim 1 , wherein the solvent is water.
17. The method of claim 1 , wherein the Group IIIA material source comprises both In and Ga sources.