IP Library Granted Patent US 7,939,866
Granted Patent B2
US 7,939,866 · App. 12/124,783 · Granted May 10, 2011

Field effect transistor

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Quick Facts
Patent No.
US 7,939,866
App. No.
12/124,783
Granted
May 10, 2011
Kind
B2
Abstract

A transistor includes a first electrode on a substrate, wherein the first electrode comprises a bus bar and has first and second first electrode fingers extending therefrom, the fingers being spaced apart to define a channel therebetween. The transistor also includes a second electrode on the substrate having a second electrode finger spaced apart from the first electrode and extending along the channel to define a gate region between the fingers. The gate region comprises a “curved” portion beyond the end of the second electrode finger proximate to the bus bar of the first electrode and a gate electrode extends along the gate region, through the “curved” gate portion. The substrate further comprises an active layer beneath the gate region, characterized in that the active layer extends beyond the end of the second electrode finger beneath the “curved” portion of the gate region.

Claims (12)

1. A Field Effect Transistor comprising:

a substrate comprising a semiconductor layer;

a first electrode on the substrate, the first electrode comprising a bus bar and having first and second first electrode fingers extending therefrom, the fingers being spaced apart to define a receiving channel therebetween;

a second electrode on the substrate having a second electrode finger spaced apart from the first electrode and extending along the receiving channel to define a gate region between the fingers, the gate region comprising a curved portion bent and free of a right angle in plan view beyond the end of the second electrode finger proximate to the bus bar of the first electrode;

a gate electrode extending along the gate region, through the curved gate portion;

the substrate further comprising an active layer beneath the gate region, the active layer being adapted to change between on and off states on application of a voltage to the gate electrode;

characterised in that the active layer extends beyond the end of the second electrode finger beneath the curved portion of the gate region.

2. A Field Effect Transistor as claimed in claim 1 , wherein the first electrode is a source and the second electrode is a drain.

3. A Field Effect Transistor as claimed in claim 1 , wherein the first electrode is a drain and the second electrode is a source.

4. A Field Effect Transistor as claimed in claim 1 , wherein each of the first and second electrodes comprises a plurality of electrode fingers, the fingers of the first and second electrodes being interdigitated to define a meandering gate region therebetween having a plurality of curved portions.

5. A Field Effect Transistor as claimed in claim 1 , wherein the substrate further comprises a cap layer arranged between the first and second electrodes and the semiconductor layer.

6. A Field Effect Transistor as claimed in claim 5 , the cap layer comprising an aperture extending through the cap layer to the semiconductor layer, the gate being disposed within the aperture.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 19, 2019
From: RFMD (UK) LIMITED
To: QORVO US, INC.
Reel/Frame 051330/0388 →
CHANGE OF NAME Recorded Apr 16, 2009
From: FILTRONIC COMPOUND SEMICONDUCTORS LIMITED
To: RFMD (UK) LIMITED
Reel/Frame 022552/0462 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 3, 2008
From: ATHERTON, JOHN STEPHEN
To: FILTRONIC COMPOUND SEMICONDUCTORS LIMITED
Reel/Frame 021628/0112 →