IP Library Granted Patent US 7,723,919
Granted Patent B2
US 7,723,919 · App. 12/125,673 · Granted May 25, 2010

Front panel for plasma display panel and method for producing the same

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Quick Facts
Patent No.
US 7,723,919
App. No.
12/125,673
Granted
May 25, 2010
Kind
B2
Abstract

The present invention provides a front panel for a plasma display panel which can suppress the incidence of chipping of the barrier rib of a rear panel for a PDP, can enhance the stability of initial electron emission in a dielectric layer, and can reduce a voltage required for maintaining a wall charge. The front panel for a plasma display panel includes a substrate, a plurality of electrodes formed on the substrate, a dielectric layer formed to cover the respective electrodes and the substrate, a dielectric-protection layer formed to cover the dielectric layer, and powder components dispersed on the dielectric-protection layer, wherein an annealed layer having a thickness of 10 to 300 nm is formed on at least the exposed surface of each of the powder components, wherein said exposed surface does not contact the dielectric-protection layer.

Claims (28)

1. A front panel for a plasma display panel comprising:

a substrate,

a plurality of electrodes formed on the substrate,

a dielectric layer formed to cover the respective electrodes and the substrate,

a dielectric-protection layer formed to cover the dielectric layer, and

powder components dispersed on the dielectric-protection layer,

wherein an annealed layer having a thickness of 10 to 300 nm is formed on at least an exposed surface of each of the powder components, wherein said exposed surface does not contact the dielectric-protection layer.

2. The front panel for a plasma display panel according to claim 1 , wherein the annealed layer is a thickness of 10 to 100 nm.

3. The front panel for a plasma display panel according to claim 1 , wherein the annealed layer is formed on an entire surface of the powder component.

4. The front panel for a plasma display panel according to claim 1 ,

wherein the powder component emits light by cathode-luminescence having a peak in a wavelength region of 200 to 300 nm by irradiation of an electron beam, and

wherein light by cathode-luminescence emitted from the annealed layer has higher luminous intensity than light by cathode-luminescence emitted from an inner layer adjacent to the annealed layer on an inside of the annealed layer.

5. The front panel for a plasma display panel according to claim 1 ,

wherein the powder component emits light by cathode-luminescence having a peak in a wavelength region of 200 to 300 nm by irradiation of an electron beam, and

wherein light by cathode-luminescence emitted from a top portion of the powder component has higher luminous intensity than light by cathode-luminescence emitted from a bottom portion of the powder component, wherein said top portion does not contact the dielectric-protection layer and said bottom portion contacts the dielectric-protection layer.

6. The front panel for a plasma display panel according to claim 1 , wherein an average particle diameter of the powder components is 3.0 μm or less.

7. The front panel for a plasma display panel according to claim 1 , wherein an average particle diameter of the powder components is 0.2 μm or more.

8. The front panel for a plasma display panel according to claim 1 , wherein a base material of the powder component has a single crystal structure.

9. The front panel for a plasma display panel according to claim 1 , wherein the dielectric layer includes at least one of magnesium oxide, calcium oxide, strontium oxide, and barium oxide.

10. The front panel for a plasma display panel according to claim 1 , wherein the powder component includes at least one of magnesium oxide, calcium oxide, strontium oxide, and barium oxide.

11. A plasma display panel having the front panel for a plasma display panel according to claim 1 .

12. A method for producing a front panel for a plasma display panel, comprising:

forming a plurality of electrodes on a substrate,

forming a dielectric layer to cover the respective electrodes and the substrate,

forming a dielectric-protection layer to cover the dielectric layer, and

dispersing powder components on the dielectric-protection layer and then irradiating an energy wave to the exposed surface of each of the powder component to form an annealed layer having a thickness of 10 to 300 nm.

13. The method for producing a front panel for a plasma display panel according to claim 12 , comprising, in place of dispersing the powder components on the dielectric-protection layer and then forming the annealed layer on the exposed surface of each of the powder components, irradiating an energy wave to an entire surface of each of the powder components to form the annealed layer having a thickness of 10 to 300 nm and then dispersing the powder components on the dielectric-protection layer.

14. The method for producing a front panel for a plasma display panel according to claim 12 , wherein annealing of the surface of each of the powder components is performed by any one of flash lamp annealing, laser annealing, and rapid thermal annealing.

Assignments (2)
CHANGE OF NAME Recorded Nov 3, 2008
From: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
To: PANASONIC CORPORATION
Reel/Frame 021779/0851 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 22, 2008
From: SAITOH, MITSUO; MORITA, MASASHI; MAESHIMA, SATOSHI; YAMASHITA, HIDEKI; FUJII, TSUTOMU; KAMIKIHARA, NOBUYUKI
To: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Reel/Frame 021274/0925 →