Color filter substrate and manufacturing method thereof

1. A method of manufacturing a color filter substrate, comprising the steps of:

preparing a color mask including a cyan transparent layer, a fuchsine transparent layer, and a yellow transparent layer, wherein the cyan transparent layer, the fuchsine transparent layer, and the yellow transparent layer do not overlap with one another on the color mask;

preparing a color sensitive material substrate including a red sensitive emulsion cyan layer, a green sensitive emulsion fuchsine layer, and a blue sensitive emulsion yellow layer by forming a backing layer, the red sensitive emulsion cyan layer, a red sensitive mask red layer, a first spacer layer, the green sensitive emulsion fuchsine layer, a green sensitive mask yellow layer, a second spacer layer, a yellow filter layer, the blue sensitive emulsion yellow layer, and a protection film on the second substrate sequentially, which layers are stacked together, wherein the red sensitive mask red layer is capable of blocking blue light and green light from being irradiated to the red sensitive emulsion cyan layer, and the green sensitive mask yellow layer is capable of preventing blue light from being irradiated into the underlaying layers;

exposing the stacked layers of the backing layer, the red sensitive emulsion cyan layer, the red sensitive mask red layer, the first spacer layer, the green sensitive emulsion fuchsine layer, the green sensitive mask yellow layer, the second spacer layer, the yellow filter layer, the blue sensitive emulsion yellow layer, and the protection film of the color sensitive material substrate by using the color mask by using a femto second white laser and then removing the color mask from the color sensitive material substrate; and

performing processes of development, bleaching, fixation, and stabilization on the color sensitive material substrate to obtain red transparent regions, green transparent regions and blue transparent regions in an array.

2. The method of claim 1 , wherein said preparing a color mask including a cyan transparent layer, a fuchsine transparent layer, and a yellow transparent layer comprises the steps of:

depositing a layer of a first transparent material on a first substrate;

applying a layer of photoresist on the first transparent material;

performing a scanning on a surface of the photoresist so that a portion of the photoresist is exposed;

forming a first transparent material layer pattern after development, etching, and photoresist lifting-off;

repeating the above steps and forming a second transparent material layer pattern and a third transparent material layer pattern on the first substrate, sequentially; and

depositing a protection film on the first substrate after the above steps.

3. The method of claim 2 , wherein the first transparent material and the second transparent material and the third transparent material are a combination of a cyan transparent material, a fuchsine transparent layer and a yellow transparent layer.

4. The method of claim 1 , wherein said exposing the color sensitive material substrate using the color mask comprises:

aligning the color mask and the color sensitive material substrate, and

exposing the color sensitive material substrate using a femto second white laser.

5. The method of claim 1 , further comprising the step of:

depositing a indium tin oxide (ITO) layer on the color sensitive material substrate.

6. The method of claim 5 , wherein the ITO layer is deposited at the room temperature by using magnetic ion sputtering process.