TFT LCD structure and the manufacturing method thereof

1. A thin film transistor liquid crystal display (TFT LCD), comprising:

a color filter substrate and an array substrate disposed opposite to each other;

wherein the array substrate comprises a base substrate, data lines and gate lines formed on the base substrate, and an insulating protective layers on the data lines or gate lines;

the color filter substrate and the array substrate are assembled with each other in a peripheral portion with sealant mixed with metal micro-balls at a ratio, a top conductive film is formed on the insulating protective layer above the data lines or gate lines below the sealant in the peripheral portion, and the top conductive film, the insulating protective layer, and the data lines or gate lines constitute a capacitor together.

2. The TFT LCD of claim 1 , wherein the top conductive film is formed of the same material as that for a pixel electrode on the insulating protective film.

3. The TFT LCD of claim 2 , wherein the top conductive film and the pixel electrode on the insulating protective film are isolated from each other.

4. The TFT LCD of claim 1 , wherein the data lines or gate lines are formed of a material selected from the group consisting of molybdenum, aluminum, Al—Ni alloy, Mo—W alloy, chrome, and copper.

5. The TFT LCD of claim 1 , wherein the insulating protective layer is formed of a material selected from the group consisting of oxide, nitride, and oxynitride.

6. A method of manufacturing a thin film transistor liquid crystal display (TFT LCD), comprising:

forming, on a base substrate, gate lines, thin film transistors, data lines, and an insulating protective layer above the data lines and gate lines;

depositing and patterning a transparent electrode layer on the insulating protective layer so as to form a pixel electrode and a top conductive film that is above the data lines or gate lines in a periphery region, where sealant mixed with micro-balls is coated for assembling, so as to obtain an array substrate; and

assembling the array substrate with a color filter substrate using the sealant mixed with metal micro-balls in the periphery region.

7. The method of claim 6 , wherein the data lines or gate lines are formed of a material selected from the group consisting of molybdenum, aluminum, Al—Ni alloy, Mo—W alloy, chrome, and copper.

8. The method of claim 6 , wherein the insulating protective layer is formed of a material selected from the group consisting of oxide, nitride, and oxynitride.