IP Library Granted Patent US 7,622,147
Granted Patent B2
US 7,622,147 · App. 12/127,092 · Granted Nov 24, 2009

Liquid crystal display having an insulating layer on a portion of the common electrode

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Quick Facts
Patent No.
US 7,622,147
App. No.
12/127,092
Granted
Nov 24, 2009
Kind
B2
Abstract

In a liquid crystal display apparatus, a lower substrate has a transmissive electrode formed in a transmissive area of a first substrate and a reflective electrode formed in a reflective area of the first substrate. An upper substrate has a second substrate, a first insulating layer formed on the second substrate corresponding to the transmissive area, a common electrode formed on the first insulating layer and the second substrate corresponding to the reflective area, and a second insulating layer formed on the common electrode corresponding to the reflective area. Accordingly, the liquid crystal display apparatus may have a uniform cell gap, thereby improving a reflectance and a transmittance thereof.

Claims (26)

1. A method of manufacturing a liquid crystal display device comprising a substrate, the method comprising;

forming a first insulating layer on a first area of the substrate, the substrate having the first area and a second area adjacent to the first area;

forming a common electrode on the first insulating layer and the second area of the substrate, and the common electrode having a first portion in the first area and a second portion in the second area, the first and a second portions forming a step so that the first portion is farther from the substrate than the second portion; and

forming a second insulating layer on the common electrode in the second area.

2. The method of claim 1 , wherein each of the first and second insulating layers comprises a positive type photoresist or a negative type photoresist.

3. The method of claim 1 , wherein the first insulating layer comprises a photoresist different from a photoresist of the second insulating layer.

4. The method of claim 1 , prior to forming the first insulating layer, further comprising:

forming a color filter layer on the substrate;

partially removing the color filter layer to form at least one hole formed in the second area such that the substrate is exposed through the hole; and

forming a planarization layer to reduce a step-difference between the color filter layer and the substrate exposed through the hole.

5. A method of manufacturing a liquid crystal display apparatus, the method comprising:

forming a color filter layer on a first area and a second area of a first substrate, the second area being adjacent to the first area, the color filter layer having a different thickness in the first and second area, and

forming a common electrode on the color filter layer,

forming a transmissive electrode on a second substrate, and

forming a reflective electrode on the transmissive electrode in the first area;

forming an insulating thin layer between the first substrate and the second substrate exclusively in the first area; and

interposing a liquid crystal layer between the first substrate and the second substrate.

6. The method of claim 5 , wherein the color filter layer has a first thickness at a position corresponding to the first area and a second thickness that is thicker than the first thickness at a position corresponding to the second area.

7. A method of manufacturing a liquid crystal display device comprising a substrate, the method comprising;

forming a first insulating layer on a first area of the substrate, the substrate having the first area and a second area adjacent to the first area;

forming a common electrode on the first insulating layer and the second area of the substrate; and

forming a second insulating layer on the common electrode in the second area,

wherein the first insulating layer comprises a photoresist different from a photoresist of the second insulating layer.

8. The method of claim 7 , wherein the first insulating layer is formed by developing a positive type photoresist and the second insulating layer is formed by developing a negative type photoresist.

9. The method of claim 7 , wherein the first insulating layer is formed by developing a negative type photoresist and the second insulating layer is formed by developing a positive type photoresist.

10. The method of claim 7 , wherein the first insulating layer and the second insulating layer are patterned by using one mask.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 17, 2012
From: SAMSUNG ELECTRONICS CO., LTD.
To: SAMSUNG DISPLAY CO., LTD.
Reel/Frame 029045/0860 →