IP Library Granted Patent US 8,026,566
Granted Patent B2
US 8,026,566 · App. 12/149,115 · Granted Sep 27, 2011

Semiconductor device and method for manufacturing semiconductor device

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Quick Facts
Patent No.
US 8,026,566
App. No.
12/149,115
Granted
Sep 27, 2011
Kind
B2
Abstract

A semiconductor device includes a first metal foil, an insulating sheet mounted on an upper surface of the first metal foil main, at least one second metal foil mounted on the insulating sheet, at least one solder layer mounted on the at least one second metal foil, and at least one semiconductor element mounted on the at least one second metal foil through the at least one solder layer. The at least one semiconductor has a thickness of 50 μm or greater and less than 100 μm.

Claims (17)

1. A semiconductor device, comprising:

a first metal foil;

an insulating sheet mounted on an upper surface of the first metal foil;

at least one second metal foil mounted on the insulating sheet;

at least one solder layer mounted on the at least one second metal foil;

at least one semiconductor element mounted on the at least one second metal foil through the at least one solder layer, said at least one semiconductor having a thickness of 50 μm or greater and less than 100 μm; and

an oxide film selectively formed on an outer peripheral portion of an upper surface of the at least one second metal foil.

2. A semiconductor device, comprising:

a first metal foil;

an insulating sheet mounted on an upper surface of the first metal foil;

at least one second metal foil mounted on the insulating sheet;

at least one solder layer mounted on the at least one second metal foil;

at least one semiconductor element mounted on the at least one second metal foil through the at least one solder layer, said at least one semiconductor having a thickness of 50 μm or greater and less than 100 μm; and

a wetting suppressing layer formed on a selected portion of an upper face of the at least one second metal foil to suppress wetting by solder of the at least one solder layer,

wherein the wetting suppressing layer comprises a resist pattern.

3. A semiconductor device according to claim 2 , wherein a material of the at least one solder layer is tin-silver solder or tin-antimony solder.

4. A semiconductor device according to claim 2 , wherein the resist pattern surrounds the at least one solder layer.

Assignments (2)
MERGER AND CHANGE OF NAME Recorded Aug 26, 2011
From: FUJI ELECTRIC SYSTEMS CO., LTD. (FES); FUJI TECHNOSURVEY CO., LTD. (MERGER BY ABSORPTION)
To: FUJI ELECTRIC CO., LTD.
Reel/Frame 026970/0872 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 20, 2010
From: FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD.
To: FUJI ELECTRIC SYSTEMS CO., LTD.
Reel/Frame 024252/0438 →