III-nitride heterojunction device
View Patent ↗A III-nitride heterojunction semiconductor device having a III-nitride heterojunction that includes a discontinuous two-dimensional electron gas under a gate thereof.
1. A III-nitride device comprising:
a III-nitride heterojunction that includes a first III-nitride semiconductor body having one band gap, and a second III-nitride semiconductor body having another band gap disposed on said first III-nitride semiconductor body to generate a two dimensional electron gas;
a first power electrode disposed over said III-nitride heterojunction and electrically coupled to said two dimensional electron gas;
a second power electrode disposed over said III-nitride heterojunction and electrically coupled to said two dimensional electron gas;
a gate arrangement disposed between said first power electrode and said second power electrode; and
spaced interrupted regions in said two-dimensional electron gas below said gate arrangement, wherein a threshold voltage of said III-nitride device is unaffected by said spaced interrupted regions, and wherein at least one of said spaced interrupted regions extends only partially under said gate arrangement.
2. The device of claim 1 , wherein said first and second power electrodes are ohmically coupled to said second III-nitride semiconductor body.
3. The device of claim 1 , wherein said gate arrangement includes an electrode that is schottky coupled to said second III-nitride semiconductor body.
4. The device of claim 1 , wherein said gate arrangement includes a gate electrode and a gate insulation body interposed between said gate electrode and said III-nitride heterojunction.
5. The device of claim 1 , wherein said first power electrode, said second power electrode, and said gate arrangement are parallel elongated bodies.
6. The device of claim 5 , wherein said spaced interrupted regions are disposed along said gate arrangement.
7. The device of claim 1 , wherein said gate arrangement has a width, and at least one of said interrupted regions is less wide than said gate arrangement.
8. The device of claim 1 , wherein said interrupted regions are disposed below respective recesses in said second III-nitride semiconductor body.
9. The device of claim 1 , wherein said interrupted regions comprise recesses formed in said III-nitride heterojunction.
10. The device of claim 1 , further comprising implant regions in said III-nitride heterojunction each said implant region causing the formation of at least one interrupted region.
11. The device of claim 10 , wherein said implant regions comprise a transition metal.
12. The device of claim 11 , wherein said transition metal comprises Fe.
13. The device of claim 10 , wherein said transition metal comprises Cr.
14. The device of claim 10 , wherein said transition metal comprises V.
15. The device of claim 10 , wherein said first III-nitride semiconductor body comprises GaN and said second III-nitride semiconductor body comprises AlGaN.
16. The device of claim 1 , further comprising a substrate, wherein said III-nitride heterojunction is disposed over said substrate.
17. The device of claim 16 , wherein said substrate is comprised of one of Si, SiC, and sapphire.
18. The device of claim 17 , further comprising a transition layer between said substrate and said III-nitride heterojunetion.
19. The device of claim 18 , wherein said transition layer is comprised of AlN.
20. A III-nitride device comprising:
a III-nitride heterojunction that includes a first III-nitride semiconductor body having one band gap, and a second III-nitride semiconductor body having another band gap disposed on said first III-nitride semiconductor body to generate a two dimensional electron gas;
a first power electrode disposed over said III-nitride heterojunction and electrically coupled to said two dimensional electron gas;
a second power electrode disposed over said III-nitride heterojunction and electrically coupled to said two dimensional electron gas;
a gate arrangement disposed between said first power electrode and said second power electrode; and
spaced interrupted regions in said two-dimensional electron gas below said gate arrangement, wherein a width of at least one of said spaced interrupted regions is less than a width of said gate arrangement above, wherein a threshold voltage of said III-nitride device is unaffected by said spaced interrupted regions, and wherein at least one of said spaced interrupted regions extends only partially under said gate arrangement.
21. The device of claim 20 , wherein said first power electrode, said second power electrode, and said gate arrangement are parallel elongated bodies.
22. The device of claim 21 , wherein said spaced interrupted regions are disposed along said gate arrangement.
23. The device of claim 20 , wherein said spaced interrupted regions comprise recesses formed in said III-nitride heterojunction.
24. The device of claim 20 , further comprising implant regions in said III-nitride heterojunction, each said implant region causing the formation of at least one of said spaced interrupted regions.