Gasification system
View Patent ↗A gasification system method and apparatus to convert a feed stream containing at least some organic material into synthesis gas having a first region, a second region, a gas solid separator, and a means for controlling the flow of material from the first region to the second region. The feed stream is introduced into the system, and the feed stream is partially oxidized in the first region thereby creating a solid material and a gas material. The method further includes the steps of separating at least a portion of the solid material from the gas material with the gas solid separator, controlling the flow of the solid material into the second region from the first region, and heating the solid material in the second region with an electrical means.
1. A gasification system comprising:
a first region where material is introduced into the system and where the material may be partially oxidized, the first region including a gas solid separator;
a second region heated by an electrical means;
a means for controlling the rate of flow of material from the first region into the second region;
a thermal residence chamber and at least one primary gas duct allowing gas flow between the gasification system and the thermal residence chamber; and
wherein at least one primary gas duct between the first region and the thermal residence chamber is positioned to allow gas flow to circumvent the means for controlling the rate of flow of the material from the first region into the second region.
2. The gasification system of claim 1 wherein the means for controlling the rate of flow of material is selected from the group of an active grate, an auger, a rake, an agitating grate, one or more rotating drums, a piston, and combinations thereof.
3. The gasification system of claim 1 further comprising at least one primary oxidant port in the first region capable of allowing the introduction of at least one oxidant into the first region.
4. The gasification system of claim 1 wherein the gas solid separator is positioned between the second region and the means for controlling the rate of flow of the material from the first region into the second region.
5. The gasification system of claim 1 wherein at least one primary gas duct allows gas flow between the first region and the thermal residence chamber.
6. The gasification system of claim 1 wherein at least one primary gas duct between the first region and the thermal residence chamber is positioned to allow gas flow through the means for controlling the rate of flow of the material from the first region into the second region.
7. The gasification system of claim 1 further comprising at least one secondary gas duct allowing gas flow between the second region and the thermal residence chamber.
8. The gasification system of claim 1 further comprising an ignition source in the thermal residence chamber.
9. The gasification system of claim 3 further comprising at least one secondary oxidant port.
10. The gasification system of claim 9 wherein the secondary oxidant port is provided in the thermal residence chamber.
11. The gasification system of claim 9 wherein the secondary oxidant port is provided in one or more primary and secondary ducts connecting the gasification system to the thermal residence chamber.
12. The gasification system of claim 1 wherein the electrical means for heating the second region is selected from the group joule heating, plasma heating, and combinations thereof.
13. The gasification system of claim 1 further comprising a plasma source in the thermal residence chamber.