Method of manufacturing display device

1. A method of manufacturing a display device, comprising:

preparing a substrate including a first area and a second area;

forming a first layer on the first area and the second area;

forming a second layer only on the first layer of the first area;

respectively forming a first electrode layer on the second layer of the first area and the first layer of the second area;

forming a reflective layer on the first electrode layer of the first area; and

forming a second electrode layer on the reflective layer.

2. The method of manufacturing a display device of claim 1 , wherein light emitting directions of the first and second areas are opposite to each other.

3. The method of manufacturing a display device of claim 1 , wherein the first and second electrode layers of the first area are formed of a transparent material.

4. The method of manufacturing a display device of claim 1 , wherein the first electrode layers formed in the first and second areas are respectively formed of a transparent material.

5. The method of manufacturing a display device of claim 1 , wherein the first electrode layer of the first area is thicker than the second electrode layer.

6. The method of manufacturing a display device of claim 1 , wherein the reflective layer is formed of aluminum (Al), molybdenum (Mo), titanium (Ti), silver (Ag), magnesium (Mg), or gold (Au), or an alloy including at least one of these metals.

7. The method of manufacturing a display device of claim 1 , wherein the display device comprises:

a first pixel electrode including the first electrode layer, the reflective layer, and the second electrode layer of the first area;

an organic emission layer formed on the first pixel electrode;

a second pixel electrode formed on the organic emission layer, and

the second pixel electrode is formed of a transparent material.

8. The method of manufacturing a display device of claim 1 , wherein the display device comprises:

a first pixel electrode including the first electrode layer of the second area;

an organic emission layer formed on the first pixel electrode;

a second pixel electrode formed on the organic emission layer, and

the second pixel electrode is formed of an opaque material.

9. The method of manufacturing a display device of claim 1 , further comprising respectively forming a Thin Film Transistor (TFT) on the substrate in the first and second areas.

10. The method of manufacturing a display device of claim 9 , wherein the first layer is a passivation layer formed on the substrate while covering the TFTs.

11. The method of manufacturing a display device of claim 10 , wherein the second layer is a planarization layer formed on the passivation layer.

12. A display device, comprising:

a substrate including a first area and a second area;

a first layer disposed on both of the first area and the second area;

a second layer disposed only on the first layer of the first area;

a first electrode layer disposed on the second layer of the first area and on the first layer of the second area;

a reflective layer disposed only on the first electrode layer of the first area; and

a second electrode layer disposed only on the reflective layer.

13. The display device of claim 12 , with the first layer having higher light transmittance compared to the second layer.

14. An organic light emitting diode display device, comprising:

a substrate including a first area and a second area;

a passivation layer disposed on both of the first area and the second area;

a planarization layer disposed only on the passivation layer of the first area; and

a multi-layer structure including a first electrode layer, a reflective layer and a second electrode layer, disposed only on the first area.