IP Library Granted Patent US 8,431,264
Granted Patent B2
US 8,431,264 · App. 12/179,701 · Granted Apr 30, 2013

Hybrid thin-film battery

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Quick Facts
Patent No.
US 8,431,264
App. No.
12/179,701
Granted
Apr 30, 2013
Kind
B2
Abstract

An electrochemical device is claimed and disclosed wherein certain embodiments have a cathode greater than about 4 μm and less than about 200 μm thick; a thin electrolyte less than about 10 μm thick; and an anode less than about 30 μm thick. Another claimed and disclosed electrochemical device includes a cathode greater than about 0.5 μm and less than about 200 μm thick; a thin electrolyte less than about 10 μm thick; and an anode less than about 30 μm thick, wherein the cathode is fabricated by a non-vapor phase deposition method. A non-vacuum deposited cathode may be rechargeable or non-rechargeable. The cathode may be made of CF x (carbon fluoride) material, wherein, for example, 0<x<4. The electrochemical device may also include a substrate, a current collector, an anode current collector, encapsulation and a moderating layer.

Claims (33)

1. An electrochemical device comprising:

a non-vapor phase deposited positive cathode greater than about 0.5 μm and less than about 200 μm thick;

a layer on the positive cathode;

a vapor phase deposited electrolyte less than about 10 μm thick over the layer on said positive cathode;

a negative anode less than about 30 μm thick is positioned directly on the vapor phase deposited electrolyte; and

wherein said electrochemical device is non-rechargeable.

2. An electrochemical device comprising: a positive cathode greater than about 4 μm and less than about 200 μm thick; an electrolyte less than about 10 μm thick; a negative anode less than about 30 μm thick; and wherein said cathode comprises CF X material.

3. The electrochemical device of claim 2 wherein x falls within the range of 0 to 4.

4. The electrochemical device of claim 1 comprising a non-rechargeable cathode consisting of CF X material.

5. The electrochemical device of claim 4 , wherein x falls within the range of 0 to 4.

6. The electrochemical device of claim 1 further comprising: a positive cathode greater than about 4 μm and less than about 200 μm thick.

7. The electrochemical device of claim 3 comprising a non-rechargeable cathode consisting of CF X material.

8. An electrochemical device comprising:

a non-vapor phase deposited cathode;

an anode; and

a vapor phase deposited electrolyte less than about 10 μm thick and positioned directly on the anode;

a layer between the cathode and the electrolyte; and

wherein said electrochemical device is non-rechargeable.

9. An electrochemical device comprising:

a non-vapor phase deposited cathode;

an anode; and

a vapor phase deposited electrolyte less than about 10 μm thick and positioned directly on the anode;

a layer between the cathode and the electrolyte; and

wherein said cathode comprises CF X material, and wherein x falls within the range of 0 to 4.

10. The electrochemical device of claim 6 comprising a non-rechargeable cathode consisting of CF X material.

11. A method of manufacturing an electrochemical device comprising:

depositing a positive cathode comprising CFX that is greater than about 0.5 μm and less than about 200 μm thick;

depositing an electrolyte that is less than about 10 μm thick; depositing a negative anode that is less than about 30 μm thick; and depositing said positive cathode by a non-vapor phase deposition process.

12. The method of claim 11 wherein x falls within the range of 0 to 4.

13. A method of manufacturing an electrochemical device comprising: depositing a cathode comprising CF X using a non-vapor phase deposition process; depositing an electrolyte that is less than about 10 μm thick; and depositing an anode.

14. The electrochemical device of claim 1 , wherein the layer is absorbed into the cathode.

15. The electrochemical device of claim 8 , wherein the layer is absorbed into the cathode.

16. The electrochemical device of claim 9 , wherein the layer is absorbed into the cathode.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 19, 2014
From: FEENEX, INC.
To: SAPURAST RESEARCH LLC
Reel/Frame 034298/0730 →
CHANGE OF NAME Recorded Nov 7, 2014
From: INFINITE POWER SOLUTIONS, INC.
To: FEENEX, INC.
Reel/Frame 034192/0790 →
RELEASE OF SECURITY INTEREST IN PATENTS Recorded Aug 6, 2010
From: LAMINAR DIRECT CAPITAL, L.L.C., AS COLLATERAL AGENT
To: INFINITE POWER SOLUTIONS, INC.
Reel/Frame 024804/0064 →
GRANT OF PATENT SECURITY INTEREST Recorded Feb 1, 2010
From: INFINITE POWER SOLUTIONS, INC.
To: LAMINAR DIRECT CAPITAL, L.L.C., AS COLLATERAL AGENT
Reel/Frame 023870/0904 →