IP Library Granted Patent US 8,294,370
Granted Patent B2
US 8,294,370 · App. 12/182,645 · Granted Oct 23, 2012

High frequency generator for ion and electron sources

Assignee: Astrium GmbH
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,294,370
App. No.
12/182,645
Granted
Oct 23, 2012
Kind
B2
Abstract

A device for coupling ionization energy into an ion or electron source, which is excited inductively or inductively-capacitively is provided. The device includes: a discharge vessel for a gas, which is to be ionized; a coupling coil, which is wound around the discharge vessel and feeds in a high frequency energy, which is required for plasma excitation; a coupling capacitor, which is electrically coupled to the coupling coil; a high frequency generator, which is electrically coupled to the coupling coil. The high frequency generator forms, together with the at least one coupling capacitor, a resonant circuit. The high frequency generator includes a PLL controller for automatic impedance matching of the resonant circuit, so that the resonant circuit can be driven at a resonant frequency.

Claims (45)

1. A device, which couples ionization energy into an ion or electron source, which is excited inductively or inductively-capacitively, and which comprises:

a discharge vessel holding a gas which is to be ionized,

a coupling coil, which is wound around the discharge vessel and feeds in a high frequency energy, which is required for plasma excitation;

a coupling capacitor, which is electrically coupled to the coupling coil;

a high frequency generator, which is electrically coupled to the coupling coil and which forms together with the at least one coupling capacitor a resonant circuit, the high frequency generator including a PLL controller for automatic impedance matching of the resonant circuit, so that the resonant circuit can be driven at a resonant frequency.

2. The device as claimed in claim 1 , wherein the PLL controller carries out a frequency and/or phase control for the impedance matching of the resonant circuit.

3. The device as claimed in claim 1 , wherein power control of the high frequency generator is performed by setting an input direct voltage and an input current of the high frequency generator.

4. The device as claimed in claim 1 , wherein the high frequency generator is connected to the coupling coil with or without interposing an impedance matching network.

5. The device as claimed in claim 1 , wherein the resonant circuit is a series or parallel resonant circuit.

6. The device as claimed in claim 1 , wherein the coupling coil has a center tap, to which the high frequency generator is attached.

7. The device as claimed in claim 1 , wherein the coupling coil is disposed between two or more coupling capacitors.

8. The device as claimed in claim 1 , wherein the high frequency generator is connected to the coupling coil without interposing electronic components for an intermediate transformation.

9. The device as claimed claim 1 , wherein the coupling coil is grounded unilaterally.

10. The device as claimed in claim 1 , wherein the coupling coil is attached insulated from a ground potential via the resonant circuit.

11. The device as claimed in claim 1 , wherein the coupling coil and the plasma form a transformer, the plasma representing a secondary winding of the transformer.

12. The device as claimed in claim 1 , wherein a resonant frequency is set in a range of 0.5 MHz to 30 MHz.

13. The device as claimed in claim 1 , wherein power that is coupled into the high frequency generator is in a range of 1 W to 10 kW.

14. The device as claimed in claim 1 , wherein a load impedance, which is coupled to the high frequency generator, is in a range of 0.1 ohm to 1 ohm or in a range of 1 ohm to 50 ohms.

15. The device as claimed in claim 1 , wherein the discharge vessel is made of a non-conducting material exhibiting low high frequency losses.

16. The device as claimed in claim 1 , wherein the coupling coil comprises a single layered or a multi-layered or a bifilar winding.

17. The device, as claimed in claim 1 , wherein the coupling coil is wound around the discharge vessel or disposed inside the discharge vessel.

18. The device as claimed in claim 1 , wherein the coupling coil is wound about the discharge vessel of the corresponding shape in a cylindrical, conical, spherical or partially conical manner with a cylindrical transition body.

19. The device as claimed in claim 1 , wherein coupling capacitor and the coupling coil are attached to the high frequency generator by way of a transformer.

20. The device as claimed in claim 19 , wherein on the primary side the transformer is capacitively coupled to the high frequency generator and on the secondary side to the at least one coupling capacitor, and the coupling coil forms the resonant circuit.

21. The device as claimed in claim 1 , wherein the high frequency generator comprises a power output stage.

22. The device as claimed in claim 21 , wherein the power output stage is one of

a half bridge class D output stage;

a full bridge class D output stage;

a push pull output stage;

a output stage of class E;

a output stage of class F; or

a output stage of class C.

23. A device, which couples ionization energy into an ion or electron source, which is excited inductively or inductively-capacitively, and which comprises:

a discharge vessel holding a gas which is to be ionized,

a coupling coil, which is wound around the discharge vessel and feeds in a high frequency energy, which is required for plasma excitation;

a coupling capacitor, which is electrically coupled to the coupling coil;

a high frequency generator, which is electrically coupled to the coupling coil and which forms together with the at least one coupling capacitor a resonant circuit, the high frequency generator including a PLL controller for automatic impedance matching of the resonant circuit, so that the resonant circuit can be driven at a resonant frequency, wherein coupling capacitor and the coupling coil are attached to the high frequency generator by way of a transformer, wherein on the primary side the transformer is capacitively coupled to the high frequency generator and on the secondary side to the at least one coupling capacitor, and the coupling coil forms the resonant circuit

a device that measures current and the voltage in the resonant circuit and which is coupled to the PLL controller, in order to feed the measured current and the measured voltage as the controlled variables to the PLL controller.

24. The device, as claimed in claim 1 , wherein the coupling capacitor is disposed in the high frequency generator or outside this high frequency generator.

25. A device, which couples ionization energy into an ion or electron source, which is excited inductively or inductively-capacitively, and which comprises:

a discharge vessel holding a gas which is to be ionized,

a coupling coil, which is wound around the discharge vessel and feeds in a high frequency energy, which is required for plasma excitation;

a coupling capacitor, which is electrically coupled to the coupling coil;

a high frequency generator, which is electrically coupled to the coupling coil and which forms together with the at least one coupling capacitor a resonant circuit, the high frequency generator including a PLL controller for automatic impedance matching of the resonant circuit, so that the resonant circuit can be driven at a resonant frequency, wherein the discharge vessel includes a gas inlet and an outlet, which is configured opposite said gas inlet, with at least two extraction grids, each of which has one multi-apertured mask, which serves as the electric lens for focusing the ion beams that are to be extracted.

26. The device, as claimed in claim 25 , wherein an electric field is applied to the extraction grids.

Assignments (4)
CHANGE OF NAME Recorded May 21, 2020
From: ASTRIUM GMBH
To: AIRBUS DS GMBH
Reel/Frame 052726/0616 →
DEMERGER Recorded May 21, 2020
From: AIRBUS DS GMBH
To: AIRBUS - SAFRAN LAUNCHERS GMBH
Reel/Frame 052729/0659 →
CHANGE OF NAME Recorded May 21, 2020
From: AIRBUS - SAFRAN LAUNCHERS GMBH
To: ARIANEGROUP GMBH
Reel/Frame 052741/0274 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 7, 2008
From: KADRNOSCHKA, WERNER; LEBEDA, ANTON; KILLINGER, RAINER; MUELLER, JOHANN; WEIS, STEFAN
To: ASTRIUM GMBH
Reel/Frame 021804/0711 →
Priority Claims (1)
DE 10 2007 036 592 · Aug 2, 2007 · national
Continuity (1)
Related Publication 20090058303A1 · Mar 5, 2009