Method for placing dummy patterns in a semiconductor device layout
View Patent ↗Disclosed is a method for placing dummy patterns in a semiconductor device layout. More specifically, the method places the dummy patterns densely between main patterns in accordance with a sequence and configuration. The method includes placing vertical dummies having a greater length than width in a region other than main patterns to form a first layout, removing the vertical dummies within a first distance from the main patterns to form a second layout, placing horizontal dummies having a greater length than width in a vacant space of the second layout to form a third layout, and removing the horizontal dummies within a second distance from the main patterns in the third layout. The method prevents and/or inhibits pattern deformation.
1. A semiconductor device layout comprising:
main patterns;
vertical dummies in a region other than the main patterns and at least a first distance away from each of the main patterns, each of the vertical dummies having a greater length than width and a size that is inversely proportional to a density of the main patterns, and the first distance corresponds to a minimum design rule; and
horizontal dummies in a vacant space other than the main patterns and the vertical dummies, and not within a second distance of any of the main patterns, each of the horizontal dummies having a greater width than length and a size that is inversely proportional to the density of the main patterns.
2. The semiconductor device layout according to claim 1 , wherein the vertical and horizontal dummies have a rectangle shape.
3. The semiconductor device layout according to claim 1 , wherein the vertical dummies within the first distance from the main patterns in the first layout violate a minimum design rule.
4. The semiconductor device layout according to claim 1 , wherein the vertical dummies and the horizontal dummies have shapes rotated 90 degrees relative to each other.
5. The semiconductor device layout according to claim 1 , wherein the length of the vertical dummies and the width of the horizontal dummies are a multiple of the width of the vertical dummies and the length of the horizontal dummies, respectively.
6. The semiconductor device layout according to claim 1 , wherein the first distance has a value not more than 1.5 times the width of the vertical dummies.
7. The semiconductor device layout according to claim 1 , wherein the second distance has a value not more than 1.5 times the width of the horizontal dummies.
8. The semiconductor device layout according to claim 1 , wherein the vertical dummies in the first layout have identical sizes and shapes, and the horizontal dummies in the first layout have identical sizes and shapes.
9. A semiconductor device layout, comprising:
main patterns;
vertical dummies in a region other than the main patterns and at least a first distance away from each of the main patterns, each of the vertical dummies having a a first fixed width and greater length than the first fixed width, and the first distance corresponds to a minimum design rule and is not more than 1.5 times the first fixed width; and
horizontal dummies in a vacant space other than the main patterns and the vertical dummies, and not within a second distance of any of the main patterns, each of the horizontal dummies having a first fixed length and a greater width than the first fixed length, and the second distance is not more than 1.5 times the first fixed length.
10. The semiconductor device layout according to claim 9 , wherein the vertical dummies have a length equal to at least 3 times a width thereof, and the horizontal dummies have a width equal to at least 3 times a length thereof.
11. The semiconductor device layout according to claim 9 , wherein the vertical dummies have a length equal to at least 4 times a width thereof, and the horizontal dummies have a width equal to at least 4 times a length thereof.
12. The semiconductor device layout according to claim 9 , wherein the vertical dummies have a length equal to at least 5 times a width thereof, and the horizontal dummies have a width equal to at least 5 times a length thereof.
13. The semiconductor device layout according to claim 9 , wherein the vertical and horizontal dummies have a rectangle shape.
14. The semiconductor device layout according to claim 13 , wherein the vertical dummies in the first layout have identical sizes and shapes, and the horizontal dummies in the first layout have identical sizes and shapes.
15. A semiconductor device layout comprising:
main patterns;
vertical dummies in a region other than the main patterns and at least a first distance away from each of the main patterns, each of the vertical dummies having a greater length than width, wherein the vertical dummy has a length equal to at least 3 times a width thereof, and the first distance corresponds to a minimum design rule; and
horizontal dummies in a vacant space other than the main patterns and the vertical dummies, and not within a second distance of any of the main patterns, each of the horizontal dummies having a greater width than length, wherein the horizontal dummy has a width equal to at least 3 times a length thereof.
16. The semiconductor device layout according to claim 15 , wherein the horizontal and vertical dummies have a size that is inversely proportional to a density of the main patterns.
17. The semiconductor device layout according to claim 15 , wherein the vertical dummies have a first fixed width, and the first distance corresponds to a multiple of the first fixed width of the vertical dummies.
18. The semiconductor device layout according to claim 15 , wherein the horizontal dummies have a first fixed length, and the second distance corresponds to a multiple of the first fixed length of the horizontal dummies.
19. The semiconductor device layout according to claim 15 , wherein the vertical dummies in the first layout have identical sizes and shapes.
20. The semiconductor device layout according to claim 15 , wherein the horizontal dummies in the first layout have identical sizes and shapes.