Spatially precise optical treatment or measurement of targets through intervening birefringent layers
View Patent ↗A treatment pattern (such as a focused spot, an image, or an interferogram) projected on a treatment target may lose precision if the treatment beam must pass through a birefringent layer before reaching the target. In the general case, the birefringent layer splits the treatment beam into ordinary and extraordinary components, which propagate in different directions and form two patterns, displaced from each other, at the target layer. The degree of birefringence and the orientation of the optic axis, which influence the amount of displacement, often vary between workpieces or between loci on the same workpiece. This invention measures the orientation of the optic axis and uses the data to adjust the treatment beam incidence direction, the treatment beam polarization, or both to superpose the ordinary and extraordinary components into a single treatment pattern at the target, preventing the birefringent layer from causing the pattern to be blurred or doubled.
1. An apparatus for optically treating or measuring a target through a birefringent layer having an optic axis, comprising:
a light source adapted to generate a treatment or measurement beam having an incidence direction and a polarization characteristic, and a monitor beam;
a monitoring apparatus for monitoring an orientation of the optic axis or effects that indicate the orientation; and
an alignment apparatus for adjusting the relative orientation of the optic axis and at least one of the incidence direction or the polarization characteristic based on the monitored data;
where
the monitor beam forms at least a first spot and a second spot on the target with respective intensities I 1 and I 2 , widths W 1 and W 2 , and a distance d between centers of the two spots, where I 1 is greater than I 2 , and W 1 is greater than W 2 ;
the monitor beam enters the birefringent layer at an incident locus;
the birefringent layer can split beams with some combinations of incidence direction and polarization characteristic into ordinary and extraordinary components propagating at different angles; and
an optimal adjustment of the alignment apparatus, based on at least one of I 1 and I 2 , W 1 or d, creates an acceptably resolved pattern at the target.
2. The apparatus of claim 1 , wherein the optimal adjustment, based on at least one of I 1 and I 2 , W 1 or d, causes the beam to be refracted substantially parallel to the optic axis of the birefringent layer at the incident locus.
3. The apparatus of claim 1 , wherein the optimal adjustment, based on at least one of I 1 and I 2 , W 1 or d, causes the beam to be refracted substantially perpendicular to the optic axis of the birefringent layer at the incident locus.
4. The apparatus of claim 1 , wherein
the polarization characteristic is substantially linear at a polarization angle; and
the optimal adjustment, based on at least one of I 1 and I 2 , W 1 or d, causes the beam to be refracted substantially in the same plane as the dominant polarization direction and the optic axis at the incident locus.
5. The apparatus of claim 1 , wherein
the polarization characteristic is substantially linear at a polarization angle; and
the optimal adjustment, based on at least one of I 1 and I 2 , W 1 or d, causes the polarization angle to be substantially parallel to the plane of the incident beam and the optic axis at the incident locus.
6. The apparatus of claim 1 , wherein
the polarization characteristic is substantially linear at a polarization angle; and
the optimal adjustment, based on at least one of I 1 and I 2 , W 1 or d, causes the polarization angle to be substantially perpendicular to the plane of the incident beam and the optic axis at the incident locus.
7. The apparatus of claim 1 , further comprising a storage medium configured to store reference data, for use for said optional adjustment of the alignment apparatus, based on at least one of I 1 and I 2 , W 1 or d.
8. The apparatus of claim 7 , wherein the monitoring apparatus is configured to collect monitored data for an entire area of a workpiece to be measured or treated.
9. The apparatus of claim 1 , wherein the monitoring apparatus is configured to collect monitored data from a workpiece during treatment or measurement.
10. The apparatus of claim 9 , further comprising a controller coupled to the monitoring apparatus and alignment apparatus, and adapted to perform functions comprising:
collecting data from the monitoring apparatus;
calculating the optimal adjustment of the alignment apparatus, based on at least one of I 1 and I 2 , W 1 or d, to enable the treatment or measurement beam to project into a focused spot, an image or an interference pattern of predetermined characteristics on the target; and
commanding the alignment apparatus to make the optimal adjustment.
11. The apparatus of claim 10 , wherein the controller is adapted to perform further functions comprising:
attenuating or extinguishing the treatment or measurement beam in response to monitored data; and
ceasing to attenuate or extinguish the treatment or measurement beam in response to monitored data.
12. The apparatus of claim 1 , wherein the monitoring apparatus is configured to monitor the orientation of the optic axis indirectly by monitoring the polarization of light reflected, diffracted, or scattered through the birefringent layer.
13. The apparatus of claim 1 , wherein the monitoring apparatus is configured to form an image of the two spots to provide I 1 and I 2 , W 1 or d for making the optimal adjustment.
14. The apparatus of claim 13 , wherein the monitoring apparatus comprises a camera.
15. The apparatus of claim 14 , wherein the extended polarized light source is an LCD screen.
16. The apparatus of claim 14 , wherein the camera comprises a CCD array.