IP Library Granted Patent US 8,139,175
Granted Patent B2
US 8,139,175 · App. 12/197,416 · Granted Mar 20, 2012

Thin film transistor, thin film transistor substrate, and methods for manufacturing the same

Assignee: Chimei Innolux Corporation
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Quick Facts
Patent No.
US 8,139,175
App. No.
12/197,416
Granted
Mar 20, 2012
Kind
B2
Abstract

A thin film transistor includes a channel layer of a specific shape, a thermal gradient inducer body, a gate insulating film, a gate electrode and an interlayer insulating film, a source electrode and a drain electrode. The channel layer is formed on a substrate. The channel layer has a nucleation region and a crystal end. The thermal gradient inducer body partially circumscribes the channel layer. The gate insulating film is formed on the substrate, and the channel layer is at least partially covered with the gate insulating film. The gate electrode is formed on the gate insulating film. The interlayer insulating film is formed on the gate insulating film, and the gate electrode is at least partially covered with the interlayer insulating film. The source electrode and the drain electrode are formed on the interlayer insulating film, passed through the gate insulating film and the interlayer insulating film, and electrically connected to the channel layer.

Claims (11)

1. A liquid crystal display comprising:

a first substrate;

a second substrate;

a liquid crystal layer, wherein the liquid crystal layer sandwiched between the first substrate and the second substrate;

a channel layer disposed on the second substrate, wherein the channel layer defining a nucleation region and a crystal end region;

wherein the nucleation region defines a first transverse width and the crystal end region defines a second transverse width, the first transverse width is less than the second transverse width; and

a thermal gradient inducer body disposed on the second substrate, wherein the thermal gradient inducer body substantially circumscribes the channel layer, wherein the thermal gradient inducer body and the channel layer define a gap.

2. The liquid crystal display of claim 1 , wherein the gap between the channel layer and the thermal gradient inducer body has a first length proximal to the crystal end region and a second length proximal to the nucleation region, the first length being less than the second length.

3. The liquid crystal display of claim 1 , wherein the thermal gradient inducer body defines a narrow portion and a wide portion, the narrow portion being proximal to the nucleation region and the wide portion being proximal to the crystal end region.

4. The liquid crystal display of claim 1 , wherein the nucleation region defines a nucleation point, wherein the narrow portion defines an opening that is generally aligned with the nucleation point.

5. The liquid crystal display of claim 1 , wherein the first substrate is a color filter (CF) substrate, the second substrate is a thin film transistor (TFT) substrate.

Assignments (3)
CHANGE OF NAME Recorded Apr 7, 2014
From: CHIMEI INNOLUX CORPORATION
To: INNOLUX CORPORATION
Reel/Frame 032621/0718 →
MERGER Recorded May 10, 2010
From: CHI MEI OPTOELECTRONICS CORP
To: CHIMEI INNOLUX CORPORATION
Reel/Frame 024358/0255 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 25, 2008
From: TING, CHIN-LUNG; WANG, CHENG-CHI
To: CHI MEI OPTOELECTRONICS CORP.
Reel/Frame 021434/0775 →
Priority Claims (1)
TW 93108422 A · Mar 26, 2004 · national
Continuity (3)
Division 11623214 · Jan 15, 2007
Division 11085420 · Mar 21, 2005
Related Publication 20080316386A1 · Dec 25, 2008