IP Library Granted Patent US 8,276,258
Granted Patent B1
US 8,276,258 · App. 12/198,657 · Granted Oct 2, 2012

Method for fabricating a magnetic recording transducer

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Quick Facts
Patent No.
US 8,276,258
App. No.
12/198,657
Granted
Oct 2, 2012
Kind
B1
Abstract

A method and system provide a magnetic transducer that includes an underlayer and a first nonmagnetic layer on the underlayer. The method and system include providing a first trench in the first nonmagnetic layer. The first trench has at least one edge corresponding to at least one side shield. The method and system also include providing a second nonmagnetic layer in the first trench and providing a second trench in the second nonmagnetic layer. The method and system include providing the main pole. At least part of the main pole resides in the second trench. The method and system further include removing at least a portion of the second nonmagnetic layer between the edge(s) and the main pole. The method and system also provide the side shield(s) in the first trench. The side shield(s) extend from at least an air-bearing surface location to not further than a coil front location.

Claims (53)

1. A method for fabricating a magnetic transducer having an underlayer and a first nonmagnetic layer residing on the underlayer, the method comprising:

providing a first trench in the first nonmagnetic layer, the first trench having at least one edge corresponding to at least one side shield;

providing a second nonmagnetic layer in the trench;

providing a second trench in the second nonmagnetic layer;

providing the main pole, at least a portion of the main pole residing in the second trench;

removing at least a portion of the second nonmagnetic layer residing between the at least one edge and the main pole; and

providing the at least one side shield in the first trench, the at least one side shield extending from at least an air-bearing surface (ABS) location to not further than a coil front location.

2. The method of claim 1 further comprising:

providing a stop layer in the first trench, the second nonmagnetic layer residing on at least a portion of the stop layer, the second trench having a bottom not lower than the portion of the stop layer.

3. The method of claim 2 wherein the step of providing the second trench further includes:

forming the second trench in the second nonmagnetic layer using a reactive ion etch.

4. The method of claim 2 wherein the stop layer is a wet etch stop layer and wherein the step of removing the at least the portion of second nonmagnetic layer further includes:

wet etching the at least the portion of the second nonmagnetic layer.

5. The method of claim 1 wherein the step of providing the main pole further includes:

providing at least one nonmagnetic layer:

providing at least one magnetic layer; and

planarizing the at least one magnetic layer.

6. The method of claim 5 wherein the step of providing the at least one nonmagnetic layer further includes:

depositing a planarization stop layer; and

depositing a nonmagnetic track width adjustment layer.

7. The method of claim 5 wherein the step of providing the at least one nonmagnetic layer further includes:

depositing a nonmagnetic track width adjustment layer.

8. The method of claim 1 wherein the step of providing the main pole further includes:

providing at least one bevel on the main pole.

9. The method of claim 8 wherein the at least one bevel includes at least one of a top bevel and a bottom bevel.

10. The method of claim 1 wherein the step of providing the at least one side shield further includes:

providing a side shield mask, the side shield mask extending from at least the coil front location distal from the ABS location;

depositing a side shield material; and

planarizing the side shield material.

11. The method of claim 10 wherein the step of providing the at least one side shield further includes:

depositing a planarization stop layer before the side shield material is deposited; and

removing an exposed portion of the planarization stop layer after the step of planarizing the magnetic recording transducer.

12. The method of claim 10 wherein the step of providing the side shield mask further includes:

forming at least one canted corner such that the at least one side shield includes the at least one canted corner.

13. The method of claim 1 further comprising:

providing a write gap, at least a portion of the write gap residing on the main pole; and

providing a top shield, at least a portion of the top shield residing on the main pole.

14. A method for fabricating a magnetic transducer having an underlayer and a first nonmagnetic layer residing on the underlayer, the method comprising:

providing a first trench in the first nonmagnetic layer, the first trench having at least one edge corresponding to at least one side shield;

providing a stop layer in the first trench;

providing a second nonmagnetic layer in the trench after the stop layer is provided, the second nonmagnetic layer residing on the portion of the stop layer;

providing a second trench in the second nonmagnetic layer, the second trench having a bottom not lower than the stop layer;

providing a main pole, at least a portion of the main pole residing in the second trench;

removing at least a portion of the second nonmagnetic layer residing between the at least one edge and the main pole, the stop layer preventing removal of the first nonmagnetic layer;

providing a side shield mask, the side shield mask extending from at least a coil front location distal from an air-bearing surface (ABS) location;

depositing a planarization stop layer;

depositing a side shield material after the planarization stop layer is deposited;

planarizing the magnetic recording transducer to form the at least one side shield; and

removing an exposed portion of the planarization stop layer after the step of planarizing the magnetic recording transducer.

15. The method of claim 14 wherein the step of providing the main pole further includes:

depositing at least one nonmagnetic layer, a portion of the at least one nonmagnetic layer residing in the second trench;

depositing a main pole layer, at least a portion of the main pole layer residing in the second trench; and

planarizing the magnetic recording transducer.

Assignments (9)
PATENT COLLATERAL AGREEMENT - DDTL LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 067045/0156 →
PATENT COLLATERAL AGREEMENT - A&R LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 064715/0001 →
RELEASE OF SECURITY INTEREST AT REEL 038710 FRAME 0845 Recorded Feb 8, 2022
From: JPMORGAN CHASE BANK, N.A.
To: WESTERN DIGITAL (FREMONT), LLC; WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 058965/0445 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 19, 2019
From: WESTERN DIGITAL (FREMONT), LLC
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 050450/0582 →
RELEASE OF SECURITY INTEREST Recorded Mar 5, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: WESTERN DIGITAL (FREMONT), LLC
Reel/Frame 045501/0158 →
SECURITY AGREEMENT Recorded May 16, 2016
From: WESTERN DIGITAL (FREMONT), LLC
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 038744/0755 →
SECURITY AGREEMENT Recorded May 16, 2016
From: WESTERN DIGITAL (FREMONT), LLC
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038744/0675 →
SECURITY AGREEMENT Recorded May 16, 2016
From: WESTERN DIGITAL (FREMONT), LLC
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 038710/0845 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 24, 2008
From: TRAN, UT; BAI, ZHIGANG
To: WESTERN DIGITAL (FREMONT), LLC
Reel/Frame 021735/0801 →