Dual power source pulse generator for a triggering system
View Patent ↗A dual power source pulse generator in power connection with a pair of electrodes having a first electrode, a second electrode and an air gap therebetween. The dual power source pulse generator includes a first pulse source producing a high voltage low current pulse across the pair of electrodes to allow dielectric breakdown, and a second pulse source electrically connected in parallel with an output of the first pulse source, and producing a low voltage high current pulse to thereby produce a current flow of high-density plasma between the same electrodes of the pair of electrodes in response to the high voltage low current pulse.
1. A dual power source pulse generator in power connection with a pair of electrodes having a first electrode, a second electrode and an air gap therebetween, the dual power source pulse generator comprising:
a first pulse source configured to produce a high voltage low current pulse across the pair of electrodes; and
a second pulse source electrically connected in parallel with an output of the first pulse source, and configured to produce a low voltage high current pulse between the pair of electrodes in response to the high voltage low current pulse.
2. The dual power source pulse generator of claim 1 , wherein the first pulse source and the second pulse source are connected via a plurality of diodes.
3. The dual power source pulse generator of claim 1 , wherein the first pulse source comprises:
a rectifier in power connection with a power source;
a first diode disposed in series with the rectifier;
a charging circuit comprising a capacitor;
a switch disposed in series with the capacitor;
a pulse transformer having a primary winding and a secondary winding, the primary winding in power connection with the power source through the switch and the secondary winding in power connection with the pair of electrodes; and
a second diode electrically connected between the secondary winding and the pair of electrodes.
4. The dual power source pulse generator of claim 3 , wherein the first diode comprises a silicon-controlled rectifier.
5. The dual power source pulse generator of claim 1 , wherein the second pulse source comprises:
a rectifier in power connection with a power source;
a charging circuit in power connection with the rectifier and the pair of electrodes.
6. The dual power source pulse generator of claim 5 , wherein the charging circuit comprises:
a capacitor disposed in parallel with the pair of electrodes; and
a first resistor in series connection with the capacitor.
7. The dual power source pulse generator of claim 6 , wherein the second pulse source further comprises:
an inductor;
a second resistor in series connection with the inductor; and
a diode.
8. The dual power source pulse generator of claim 6 , wherein the capacitor is chargeable up to approximately 600 V.
9. The dual power source pulse generator of claim 6 , wherein the second pulse source further comprises a discharge switch in power connection between the charging circuit and the pair of electrodes.
10. The dual power source pulse generator of claim 1 , wherein when the high voltage low current pulse is initially applied across the pair of electrodes to reduce an impedance of the air gap and form an arc between the air gap, a low voltage high current pulse is triggered across the pair of electrodes to enable high current to flow across the pair of electrodes.
11. The dual power source pulse generator of claim 1 , wherein the first pulse source is configured to receive a voltage of approximately 120 to 480 volts alternating current and the second pulse source is configured to receive a voltage of approximately 480 volts alternating current.
12. An ablative plasma gun including a pair of electrodes, the ablative plasma gun comprising:
a barrel having an opening;
a dual power source pulse generator configured to generate a high voltage low current pulse and a low voltage high current pulse; and
the pair of electrodes having an air gap formed therebetween and in power connection with the dual power source pulse generator via a single pair of conductors, configured to receive the high voltage low current pulse and the low voltage high current pulse in response to the high voltage low current pulse,
wherein an arc is across the air gap in response to the high voltage low current pulse and the low voltage high current pulse.
13. The ablative plasma gun of claim 12 , wherein the dual power source pulse generator comprises:
a first pulse source electrically connected with the pair of electrodes, and configured to produce a high voltage low current pulse across the pair of electrodes to allow dielectric breakdown; and
a second pulse source electrically connected in parallel with an output of the first pulse source and the pair of electrodes, and configured to produce a low voltage high current pulse of the pair of electrodes in response to the high voltage low current pulse.
14. The ablative plasma gun of claim 13 , wherein the first pulse source and the second pulse source are connected via a plurality of diodes disposed and configured to prevent feedback into the first pulse source and the second pulse source, respectively.
15. The ablative plasma gun of claim 13 , wherein the first pulse source comprises:
a rectifier in power connection with a power source;
a first diode disposed in series with the rectifier;
a charging circuit comprising a capacitor;
a switch disposed in series with the capacitor;
a pulse transformer having a primary winding and a secondary winding, the primary winding in power connection with the power source through the switch and the secondary winding in power connection with the pair of electrodes; and
a second diode electrically connected between the secondary winding and the pair of electrodes.
16. The ablative plasma gun of claim 13 , wherein the second pulse source comprises:
a rectifier in power connection with a power source;
a charging circuit in power connection with the rectifier and the pair of electrodes.
17. The ablative plasma gun of claim 16 , wherein the charging circuit comprises:
a capacitor disposed in parallel with the pair of electrodes; and
a first resistor in series connection with the capacitor.
18. The ablative plasma gun of claim 17 , wherein the capacitor is chargeable up to approximately 600 V.
19. The ablative plasma gun of claim 16 , wherein the second pulse source further comprises:
an inductor;
a second resistor in series connection with the inductor; and
a diode configured to block high voltage from flowing into the second pulse source.
20. The ablative plasma gun of claim 19 , wherein the second pulse source further comprises a switch in power connection between the charging circuit and the pair of electrodes.