Pixel structure and active device array substrate
View Patent ↗A pixel structure including an active device, a common line pattern, a protective layer, a pixel electrode, and a patterned semiconductor layer is provided. The active device is disposed on a substrate. In addition, the common line pattern is disposed on the substrate and covered with an insulation layer. The protective layer covers the active device and a part of the insulation layer. The protective layer has a contact window exposing the active device. The pixel electrode is disposed on the protective layer and electrically connected to the active device through the contact window. The patterned semiconductor layer is disposed on the insulation layer above the common line pattern. The patterned semiconductor layer is located between the common line pattern and the pixel electrode.
1. A pixel structure, disposed on a substrate and adapted to be electrically connected to a scan line and a data line, the pixel structure comprising:
an active device, disposed on the substrate and comprising an insulation layer extending to the substrate;
a common line pattern, disposed on the substrate and covered with the insulation layer;
a protective layer, covering the active device and a part of the insulation layer, and comprising a contact window exposing the active device;
a pixel electrode, disposed on the protective layer, and electrically connected to the active device through the contact window; and
a patterned semiconductor layer, disposed on the insulation layer above the common line pattern, and disposed between the common line pattern and the pixel electrode, so as to form a storage capacitor located outside the scan line and without physically contacting the scan line.
2. The pixel structure according to claim 1 , wherein the storage capacitor comprises a capacitance changing along with a size of area of the patterned semiconductor layer.
3. The pixel structure according to claim 1 , wherein the common line pattern has an H shape.
4. The pixel structure according to claim 1 , wherein the storage capacitor further comprises a metal layer disposed on the patterned semiconductor layer and electrically connected to the pixel electrode, and the metal layer and the data line are in a same film layer.
5. The pixel structure according to claim 1 , wherein the active device comprises:
a gate, disposed on the substrate and covered with the insulation layer, wherein the gate is electrically connected to the scan line;
a channel layer, disposed on the insulation layer above the gate;
a source/drain, respectively disposed on the channel layer, wherein the drain is electrically connected to the pixel electrode, and the source is electrically connected to the data line; and
an ohmic contact layer, disposed between the source and the channel layer and between the drain and the channel layer.
6. An active device array substrate, comprising:
a substrate; and
a plurality of pixel structures, disposed on the substrate, wherein each of the pixel structures is electrically connected to a corresponding scan line and a corresponding data line, and each of the pixel structures comprises:
an active device, disposed on the substrate, and comprising an insulation layer extending out of the active device and covering the substrate;
a common line pattern, disposed on the substrate and covered with the insulation layer;
a protective layer, covering the active device and a part of the insulation layer, and comprising a contact window exposing the active device;
a pixel electrode, disposed on the protective layer, and electrically connected to the active device through the contact window; and
a patterned semiconductor layer, disposed on the insulation layer above the common line pattern, and disposed between the common line pattern and the pixel electrode, so as to form a storage capacitor located outside the scan line and without physically contacting the scan line.
7. The active device array substrate according to claim 6 , wherein the storage capacitor comprises a capacitance changing along with a size of area of the patterned semiconductor layer.
8. The active device array substrate according to claim 6 , wherein each of the data lines transmits a display signal to the corresponding pixel structures, and the area of the patterned semiconductor layer in the pixel structures is gradually increased in the transmission direction of the display signal.
9. The active device array substrate according to claim 6 , wherein each of the scan lines transmits a switch signal to the corresponding pixel structures, and the area of the patterned semiconductor layer in the pixel structures is gradually increased in the transmission direction of the switch signal.
10. The active device array substrate according to claim 6 , wherein the common line pattern has an H shape.
11. The active device array substrate according to claim 6 , wherein the storage capacitor further comprises a metal layer disposed on the patterned semiconductor layer and electrically connected to the pixel electrode, and the metal layer and the data line are in a same film layer.
12. The active device array substrate according to claim 6 , wherein the active device comprises:
a gate, disposed on the substrate and covered with the insulation layer, wherein the gate and the scan line are electrically connected;
a channel layer, disposed on the insulation layer above the gate;
a source/drain, respectively disposed on the channel layer, wherein the drain and the pixel electrode are electrically connected and the source and the data line are electrically connected; and
an ohmic contact layer, disposed between the source and the channel layer and between the drain and the channel layer.