Granted Patent B2

US 7,742,511 · App. 12/210,028 · Granted Jun 22, 2010

Abstract

Claims (44)

1. A laser system for processing a workpiece, the laser system comprising:

a tunable pulsed laser source having an output comprising a set of optical pulses, wherein the tunable pulsed laser source comprises:

a seed source adapted to generate a seed signal;

an optical circulator having a first port coupled to the seed source, a second port, and a third port;

a modulator driver adapted to produce an electrical waveform;

an amplitude modulator coupled to the modulator driver and adapted to receive the electrical waveform, wherein the amplitude modulator is characterized by a first side coupled to the second port of the optical circulator and a second side;

a first optical amplifier characterized by an input end and a reflective end, wherein the input end is coupled to the second side of the amplitude modulator; and

a second optical amplifier coupled to the third port of the optical circulator;

a controller configured to adjust laser parameters of the tunable pulsed laser source;

a supporting member configured to support the workpiece; and

an optical system configured to adjust laser beams from the tunable pulsed laser source and direct them towards the workpiece.

2. The laser system of claim 1 further comprising a wavelength converter.

3. The laser system of claim 2 wherein the wavelength converter comprises a harmonic generator configured to generate harmonic wavelengths from a fundamental wavelength.

4. The laser system of claim 3 wherein the wavelength converter further comprises a plurality of mirrors configured for a laser beam from the tunable pulsed laser source to bypass the wavelength converter.

5. The laser system of claim 3 wherein the harmonic generator comprises at least one non-linear crystal.

6. The laser system of claim 1 further comprising a Digital-to-Analog Converter (DAC) configured to provide electrical waveforms.

7. The laser system of claim 1 wherein the workpiece comprises at least a first layer and a second layer, the first layer and the second layer comprising different materials.

8. The laser system of claim 7 wherein the set of optical pulses comprises:

a first set of pulses characterized by a first set of shapes, a first set of durations and a first set of intensities; and

a second set of pulses characterized by a second set of shapes, a second set of durations, and a second set of intensities, wherein the first set of pulses is different from the second set of pulses.

9. The laser system of claim 8 wherein the first set of pulses is used in processing the first layer and the second set of pulses is used in processing the second layer.

10. The laser system of claim 1 further comprising a sensor coupled to the controller and configured to detect a phase of laser processing.

11. The laser system of claim 10 wherein the phase of laser processing comprises an end of laser processing.

12. The laser system of claim 1 further comprising a digital-to-analog converter configured to generate the electrical waveform, the digital-to-analog converter being characterized by a sampling rate of 500 megasamples/second or faster and an analog electrical bandwidth larger than 100 MHz.

13. A method of laser processing, the method comprising:

outputting a first set of optical pulses from a tunable pulsed laser source toward a workpiece, wherein the workpiece comprises at least a first layer of a first material and a second layer of a second material, the first material being different from the second material, wherein the tunable pulsed laser source comprises:

a seed source adapted to generate a seed signal;

an optical circulator having a first port coupled to the seed source, a second port, and a third port;

a modulator driver adapted to produce an electrical waveform;

an amplitude modulator coupled to the modulator driver and adapted to receive the electrical waveform, wherein the amplitude modulator is characterized by a first side coupled to the second port of the optical circulator and a second side;

a first optical amplifier characterized by an input end and a reflective end, wherein the input end is coupled to the second side of the amplitude modulator; and

a second optical amplifier coupled to the third port of the optical circulator;

processing the first layer using the first set of optical pulses;

outputting a second set of optical pulses from the tunable pulsed laser source toward the workpiece, wherein the second set of optical pulses is different from the first set of optical pulses; and

processing the second layer using the second set of optical pulses.

14. The method of claim 13 wherein at least one of the first set of optical pulses or the second set of optical pulse are characterized by a fundamental wavelength, the method further comprising converting the fundamental wavelength to a harmonic wavelength.

15. The method of claim 13 further comprising:

detecting a signal associated with a termination of processing of the first layer; and

receiving the detected signal at a controller coupled to the tunable pulsed laser source.

16. The method of claim 13 wherein:

the first set of optical pulses comprises a first set of pulses characterized by a first set of shapes, a first set of durations, and a first set of intensities; and

the second set of optical pulses comprises a second set of pulses characterized by a second set of shapes, a second set of durations, and a second set of intensities.

17. The method of claim 13 wherein a duration for switching from the first set of optical pulses to the second set of optical pulses is shorter than a duration between any two consecutive optical pulses.

18. The method of claim 13 wherein laser processing comprises at least one of drilling, cutting, or cleaning.

Assignments (9)