Evaporation apparatus
View Patent ↗An evaporation apparatus is capable of preventing a sag phenomenon in a substrate. The evaporation apparatus includes a substrate supporting unit. The substrate supporting unit includes a substrate supporter for supporting side walls of a substrate in a chamber toward the same direction as an intake direction of the substrate entering the chamber; and a substrate-aiding supporter for supporting other side walls of the substrate that are not supported by the substrate supporter.
1. An evaporation apparatus, comprising:
a substrate supporting unit comprising:
a substrate supporter supporting a first group of side walls of a substrate disposed within a chamber, with the first group of side walls disposed along a same direction as an intake direction of the substrate entering the chamber; and
a substrate-aiding supporter supporting a second group of side walls of the substrate that are different from the first group of side walls.
2. The evaporation apparatus of claim 1 , in which the substrate-aiding supporter comprises:
a supporting bar for supporting at least one of the second group of side walls of the substrate; and
a driver for driving the supporting bar in opposite directions.
3. The evaporation apparatus of claim 2 , in which the supporting bar comprises:
a fixing plate having a supporting plate in physical contact with a bottom surface of the substrate; and
a coupling bar for physically coupling the driver to the fixing plate.
4. The evaporation apparatus of claim 3 , in which the coupling bar comprises a pair of structures extended from the second group of side walls of the substrate that are different from the first group of side walls, with the pair of structures physically coupled to the driver.
5. The evaporation apparatus of claim 4 , in which the substrate-aiding supporter comprises:
a first substrate-aiding supporter for supporting the second group of side walls of the substrate that are different from the first group of side walls being supported by the substrate supporter; and
a second substrate-aiding supporter disposed to face the first substrate-aiding supporter and supporting the second group of side walls of the substrate that are different from the first group of side walls being supported by the substrate supporter.
6. The evaporation apparatus of claim 3 , in which multiple fixing plates are physically coupled to the coupling bar.
7. The evaporation apparatus of claim 6 , in which the substrate-aiding supporter comprises:
a first substrate-aiding supporter for supporting the second group of side walls of the substrate that are different from the first group of side walls being supported by the substrate supporter; and
a second substrate-aiding supporter disposed to face the first substrate-aiding supporter and support the second group of side walls of the substrate that are different from the first group of side walls being supported by the substrate supporter.
8. The evaporation apparatus of claim 3 , in which the substrate-aiding supporter comprises:
a first substrate-aiding supporter for supporting the second group of side walls of the substrate that are different from the first group of side walls being supported by the substrate supporter; and
a second substrate-aiding supporter disposed to face the first substrate-aiding supporter and supporting the second group of side walls of the substrate that are different from the first group of side walls being supported by the substrate supporter.
9. The evaporation apparatus of claim 2 , in which the substrate-aiding supporter comprises:
a first substrate-aiding supporter for supporting the second group of side walls of the substrate that are different from the first group of side walls being supported by the substrate supporter; and
a second substrate-aiding supporter disposed to face the first substrate-aiding supporter and supporting the second group of side walls of the substrate that are different from the first group of side walls being supported by the substrate supporter.
10. The evaporation apparatus of claim 1 , in which the substrate-aiding supporter comprises:
a first substrate-aiding supporter for supporting the second group of side walls of the substrate that are different from the first group of side walls being supported by the substrate supporter; and
a second substrate-aiding supporter disposed to face the first substrate-aiding supporter and supporting the second group of side walls of the substrate that are different from the first group of side walls being supported by the substrate supporter.
11. An evaporation apparatus, comprising:
a substrate supporting unit comprising:
a substrate supporter supporting two side walls of a substrate received by a chamber, with the two side walls of the substrate being opposite to and facing each other, and the side walls of the substrate being located along an intake direction of the substrate during reception of the substrate by the chamber; and
at least one substrate-aiding supporter, each of the at least one substrate-aiding supporter supporting one of side walls of the substrate with the side walls of the substrate being different from the side walls being supported by the substrate supporter.
12. The evaporation apparatus of claim 11 , comprised of a supporting plate of the at least one substrate-aiding supporter being in physical contact with a surface of the substrate with the surface being different from a surface having a mask pattern, and the substrate supporter being in physical contact with the surface of the substrate with the surface that is different from the surface having the mask pattern.
13. A method of supporting a substrate in an evaporation apparatus, the method comprising:
providing a substrate supporter and at least one substrate-aiding supporter in an interior of a chamber of the evaporation apparatus;
receiving, within the chamber, the substrate through an opening into the chamber;
moving the substrate supporter in the chamber by a lever assembly, and supporting two opposite side walls of the substrate by the substrate supporter, with the substrate supporter physically contacting a surface of the substrate, and with the surface being opposite to and different from a surface having a mask pattern; and
moving the at least one substrate-aiding supporter in the chamber by a driver, and supporting side walls of the substrate by the at least one substrate-aiding supporter with the side walls of the substrate being different from the side walls being supported by the substrate supporter, with the at least one substrate-aiding supporter being in physical contact with the surface of the substrate, and with the surface being opposite to and different from the surface having the mask pattern.
14. An evaporation apparatus for practice of the method of claim 13 , comprised of:
a supporting plate of the at least one substrate-aiding supporter in physical contact with a surface of the substrate that is different from a surface having a mask pattern; and
the substrate supporter is in physical contact with the surface of the substrate that is different from the surface having the mask pattern.
15. An evaporation apparatus for the practice of the method of claim 13 , in which the substrate-aiding supporter comprises:
a supporting bar disposed to support the side walls of the substrate;
a driver moving the supporting bar in opposite directions; and
the supporting bar comprising:
a fixing plate having a supporting plate in physical contact with a bottom surface of the substrate; and
a coupling bar physically coupling the driver to the fixing plate; and
the coupling bar comprising a pair of structures extending from the side walls of the substrate that are different from the side walls supported by the substrate supporter, with the pair of structures being physically coupled to the driver.