IP Library Granted Patent US 8,487,970
Granted Patent B2
US 8,487,970 · App. 12/245,578 · Granted Jul 16, 2013

Digital imaging of marking materials by thermally induced pattern-wise transfer

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Quick Facts
Patent No.
US 8,487,970
App. No.
12/245,578
Granted
Jul 16, 2013
Kind
B2
Abstract

An imaging system including an image receiving structure including a material layer having a tunable energy transfer characteristic; and an energy source to emit an energy beam at the material having the tunable energy transfer characteristic such that marking material is pattern-wise transferred to the image receiving structure. An imaging system includes an image receiving structure disposed to be in direct contact with marking material; and an energy source to emit a pattern-wise modulated energy beam at a region of the image receiving structure contacting the marking material to pattern-wise transfer marking material to the image receiving structure.

Claims (42)

1. An imaging system, comprising:

an image receiving structure including a material having a tunable energy transfer characteristic configured to pattern-wise mask a transmission of energy from the energy source to the marking material;

an energy source to emit an energy beam at the material having the tunable energy transfer characteristic such that marking material is pattern-wise transferred to a surface of the image receiving structure; and

a second energy source to emit an energy beam at the image receiving structure, the second energy source selected to pattern-wise tune the energy transfer characteristic of the marking material.

2. The imaging system of claim 1 , further comprising:

a donor structure to receive a layer of marking material;

wherein the image receiving structure further comprises:

a first layer including the material having the tunable energy transfer characteristic; and

a second layer disposed between the first layer and the donor structure.

3. The imaging system of claim 1 , wherein the image receiving structure comprises a layer including a siloxane material.

4. The imaging system of claim 1 , wherein the material having a tunable energy transfer characteristic includes a bi-stable phase change material.

5. The imaging system of claim 1 , wherein the tunable energy transfer characteristic of the material is defined by a tunable transmittance, the material including at least one of a thermochromic material and a photochromic material.

6. The imaging system of claim 1 , wherein:

the material having the tunable energy transfer characteristic has a first transmittance in a first state and a second transmittance in a second state; and

the first transmittance is less than the second transmittance.

7. The imaging system of claim 1 , wherein:

the material having the tunable energy transfer characteristic has a first absorbance and a first reflectance in a first state and a second absorbance and a second reflectance in a second state;

the first absorbance is less than the second absorbance; and

the first reflectance is higher than the second reflectance.

8. An imaging system, comprising:

an image receiving structure disposed to be in direct contact with a marking material; and

an energy source to emit a pattern-wise modulated energy beam at a region of the image receiving structure contacting the marking material to pattern-wise transfer marking material to the image receiving structure, wherein the region of the image receiving structure contacting the marking material at which the pattern-wise modulated energy beam is directed is offset from a minimum distance point between the image receiving structure and a donor structure towards an exit from a nip between the donor structure and the image receiving structure.

9. The imaging system of claim 8 , further comprising:

a cooling system to cool the marking material transferred to the image receiving structure prior to contacting a substrate.

10. The imaging system of claim 8 , wherein the region of the image receiving structure contacting the marking material at which the pattern-wise modulated energy beam is directed is offset from the exit from the nip.

11. The imaging system of claim 8 , wherein the energy source is configured to emit the pattern-wise modulated energy beam such that an amount of energy delivered to the marking material is less than an amount of energy to change a phase of the marking material.

12. A method of imaging, comprising:

pattern-wise tuning a tunable energy transfer characteristic of a material of an image receiving structure;

selectively transferring marking material to the image receiving structure according to the energy transfer characteristic of the material; and

selectively modifying viscoelastic properties of the marking material using the material of the image receiving structure as a mask.

13. The method of imaging of claim 12 , further comprising:

pattern-wise transferring thermal energy to the material of the image receiving structure; and

transferring at least part of the thermal energy of the material to the marking material.

14. The method of imaging of claim 12 , further comprising:

irradiating the image receiving structure with an energy beam; and

pattern-wise transmitting at least part of the irradiation incident on the image receiving structure to the marking material.

15. The method of imaging of claim 12 , further comprising:

pattern-wise changing at least one of a transmittance, an absorbance, and a reflectance of the material of the image receiving structure.

16. An imaging system, comprising:

an image receiving structure including a material having a tunable energy transfer characteristic configured to pattern-wise absorb energy from the energy source and indirectly transfer at least a part of the energy to the marking material through heat conduction;

an energy source to emit an energy beam at the material having the tunable energy transfer characteristic such that marking material is pattern-wise transferred to a surface of the image receiving structure; and

a second energy source to emit an energy beam at the image receiving structure, the energy source selected to pattern-wise tune the energy transfer characteristic of the marking material.

Assignments (10)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 6, 2025
From: XEROX CORPORATION
To: GENESEE VALLEY INNOVATIONS, LLC
Reel/Frame 073842/0479 →
SECOND LIEN NOTES PATENT SECURITY AGREEMENT Recorded Jul 2, 2025
From: XEROX CORPORATION
To: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 071785/0550 →
FIRST LIEN NOTES PATENT SECURITY AGREEMENT Recorded Apr 11, 2025
From: XEROX CORPORATION
To: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 070824/0001 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT RF 064760/0389 Recorded Feb 13, 2024
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: XEROX CORPORATION
Reel/Frame 068261/0001 →
SECURITY INTEREST Recorded Feb 13, 2024
From: XEROX CORPORATION
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 066741/0001 →
SECURITY INTEREST Recorded Nov 20, 2023
From: XEROX CORPORATION
To: JEFFERIES FINANCE LLC, AS COLLATERAL AGENT
Reel/Frame 065628/0019 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVAL OF US PATENTS 9356603, 10026651, 10626048 AND INCLUSION OF US PATENT 7167871 PREVIOUSLY RECORDED ON REEL 064038 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Jun 28, 2023
From: PALO ALTO RESEARCH CENTER INCORPORATED
To: XEROX CORPORATION
Reel/Frame 064161/0001 →
SECURITY INTEREST Recorded Jun 22, 2023
From: XEROX CORPORATION
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 064760/0389 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 20, 2023
From: PALO ALTO RESEARCH CENTER INCORPORATED
To: XEROX CORPORATION
Reel/Frame 064038/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 10, 2009
From: STOWE, TIMOTHY D.; CHOW, EUGENE M.; PATTEKAR, ASHISH V.; PEETERS, ERIC
To: PALO ALTO RESEARCH CENTER INCORPORATED
Reel/Frame 023073/0230 →