Semiconductor device and method for fabricating the same
View Patent ↗Embodiments relate to a semiconductor device having a minimized on-resistance. According to embodiments, a semiconductor device may include at least one of the following: a first conductive type well formed on and/or over a semiconductor substrate, a second conductive type body region formed within the first conductive type well a first conductive type source region formed on and/or over the surface of the body region, a first conductive type drain region formed on and/or over the surface of the first conductive type well. Further, according to embodiments, a semiconductor device may include a field insulation layer positioned between the first conductive type source region and the first conductive type drain region and a gate electrode formed on and/or over the field insulation layer. The source region may be formed at a lower position than the drain region.
1. A device, comprising:
a first conductive type well formed over a semiconductor substrate;
a second conductive type body region formed within the first conductive type well;
a first conductive type source region formed over a surface of the second conductive type body region;
a first conductive type drain region formed over a surface of the first conductive type well;
a field insulation layer formed between the first conductive type source region and the first conductive type drain region and having a first portion of a first thickness and a second portion of a second thickness, the second thickness being less than the first thickness; and
a gate electrode formed on top surfaces of the first and second portions of the field insulation layer,
wherein the first conductive type source region is formed at a position lower than a position of the first conductive type drain region.
2. The device of claim 1 , wherein a height position of a top surface of the source region is substantially the same as a height position of a bottom surface of the field insulation layer.
3. The device of claim 2 , wherein a top surface of the drain region is positioned higher than a top surface of the source region.
4. The device of claim 1 , comprising a second conductive type source contact region formed at one side of the first conductive type source region relative to the semiconductor substrate.
5. The device of claim 4 , wherein the second conductive type source contact region is made of silicide.
6. The device of claim 1 , wherein a first conductive type buried layer is formed below the first conductive type well.