CO2 SYSTEM FOR POLYMER FILM CLEANING
An apparatus and method for cleaning polymer film are provided and include a support assembly for supporting the polymer film to be cleaned, the support assembly being constructed and arranged to move the polymer film for cleaning, and at least one nozzle disposed adjacent the polymer film for providing CO 2 to the polymer film for dislodging particulate matter from the polymer film and the at least one aperture, and for cleaning thereof.
1 . An apparatus for cleaning polymer film, comprising:
a support assembly for supporting the polymer film to be cleaned, the support assembly being constructed and arranged to move the polymer film for cleaning; and
at least one nozzle disposed adjacent the polymer film for providing CO 2 to the polymer film for cleaning thereof.
2 . The apparatus according to claim 1 , wherein the support assembly comprises a roller assembly, the roller assembly including a first spool for holding the polymer film to be cleaned and a second spool for holding the polymer film that has been cleaned.
3 . The apparatus according to claim 2 , further comprising at least one transport roller for moving the polymer film between the first spool and the second spool.
4 . The apparatus according to claim 2 , further comprising tension means for providing a select amount of tension to the polymer film for cleaning.
5 . The apparatus according to claim 1 , further comprising a housing for containing the support assembly and the at least one nozzle.
6 . The apparatus according to claim 5 , where the housing is constructed and arranged to be hermetically sealed.
7 . The apparatus according to claim 5 , further comprising temperature control means for controlling a temperature of the atmosphere in the housing.
8 . The apparatus according to claim 5 , further comprising humidity control means for controlling humidity of the atmosphere in the housing.
9 . The apparatus according to claim 1 , wherein the nozzle is adjustable with respect to the polymer film.
10 . The apparatus according to claim 1 , wherein the CO 2 is selected from CO 2 gas, CO 2 liquid, and combinations thereof.
11 . The apparatus according to claim 1 , wherein the polymer film is selected from non-treated films, metalized films and coated films.
12 . The apparatus according to claim 1 , further comprising an inerting gas provided proximate to the film.
13 . The apparatus according to claim 12 , wherein the inerting gas is selected from clean dry air, nitrogen, and combinations thereof.
14 . A method of cleaning polymer film having at least one aperture therein, comprising:
supporting the polymer film to be moved for cleaning; and
providing CO 2 to the polymer film for dislodging particulate matter from the polymer film and the at least one aperture.
15 . The method according to claim 14 , wherein the CO 2 is selected from CO 2 gas, CO 2 -liquid, and combinations thereof.
16 . The method according to claim 14 , wherein the providing CO 2 is from a spray nozzle.
17 . The method according to claim 14 , further comprising inerting an atmosphere proximate the polymer film with an inerting gas.
18 . The method according to claim 17 , wherein the inerting gas is selected from clean dry air, nitrogen, and combinations thereof.
19 . The method according to claim 14 , further comprising filtering the particulate matter dislodged from the polymer film and the at least one aperture.
20 . A method of using CO 2 to clean a polymer film having at least one aperture therein, comprising providing CO 2 fluid to the polymer film for removing particulate matter and veils from the at least one aperture and the polymer film.