Self-releasing resist material for nano-imprint processes
View Patent ↗Nanoimprint lithography using resist material with the addition of a surfactant is described. A template release layer is formed on a pattern of a template. A non-ionic surfactant is added to a resist material to form a mixed resist material. The resist material may comprise a hydrocarbon material having an unsaturated bond, such as an acrylate material. The surfactant may comprise polyalkylene glycol or an organically modified polysiloxane. A resist layer is then formed on a substrate from the mixed resist material. The surfactant added to the resist material forms a resist release layer on the surface of the resist layer. The template is then pressed into the resist layer, where the template release layer and the resist release layer are between the pattern of the template and the resist layer.
1. A method of performing an imprint process, the method comprising:
forming a template release layer on a pattern of a template;
adding a non-ionic surfactant to a resist material to form a mixed resist material, wherein the non-ionic surfactant comprises polyalkylene glycol;
forming a resist layer on a substrate from the mixed resist material, wherein the surfactant added to the resist material forms a resist release layer on the surface of the resist layer; and
pressing the template into the resist layer, wherein the template release layer and the resist release layer are between the pattern of the template and the resist layer.
2. The method of claim 1 wherein the polyalkylene glycol surfactant has a non-polar alkane block and a polar ether block, the polar ether block is more soluble in the resist material than the non-polar alkane block so that the non-polar alkane block separates out along the surface of the resist layer to form the resist release layer.
3. The method of claim 1 wherein the concentration of the surfactant in the resist material is in the range of about 0.05% to 5% by weight.
4. The method of claim 1 wherein the resist material comprises an acrylate material.
5. The method of claim 4 wherein the acrylate material comprises one of a neopentyl glycol dimethacrylate, trimethylpropane triacrylate, propoxylated glyceryl triacrylate, isobornyl methacrylate, or octyldecyl acrylate.
6. The method of claim 1 wherein the template release layer comprises a fluorinated release layer.
7. The method of claim 6 wherein the fluorinated release layer is formed from a perfluoropolyether diacrylate material.
8. The method of claim 1 further comprising:
performing a curing process to cure the resist layer, wherein the pattern from the template is imprinted in the cured resist layer;
separating the template from the cured resist layer; and
performing an etching process to pattern the substrate based on the pattern imprinted in the cured resist layer.
9. A method of performing nanoimprint lithography, the method comprising:
forming a template release layer on a nanometer-scale pattern of a template;
adding a polyalkylene glycol surfactant to a resist material to form a mixed resist material, wherein the resist material comprises a hydrocarbon with an unsaturated bond;
forming a resist layer on a substrate from the mixed resist material, wherein the surfactant added to the resist material forms a resist release layer on the surface of the resist layer; and
pressing the template into the resist layer, wherein the template release layer and the resist release layer are between the pattern of the template and the resist layer.
10. The method of claim 9 wherein the concentration of the polyalkylene glycol surfactant in the resist material is in the range of about 0.05% to 5% by weight.
11. The method of claim 9 wherein the resist material comprises an acrylate material.
12. The method of claim 11 wherein the acrylate material comprises one of a neopentyl glycol dimethacrylate, trimethylpropane triacrylate, propoxylated glyceryl triacrylate, isobornyl methacrylate, or octyldecyl acrylate.
13. The method of claim 9 wherein the template release layer comprises a fluorinated release layer.
14. The method of claim 13 wherein the fluorinated release layer is formed from a perfluoropolyether diacrylate material.
15. The method of claim 9 further comprising:
performing a curing process to cure the resist layer, wherein the pattern from the template is imprinted in the cured resist layer;
separating the template from the cured resist layer; and
performing an etching process to pattern the substrate based on the pattern imprinted in the cured resist layer.