Image sensor and fabricating method thereof
View Patent ↗An image sensor and fabricating method thereof are disclosed by which damage to a protective layer can be prevented in a manner of reducing thermal stress of an uppermost metal line in performing thermal treatment for enhancing the dark characteristic. Such damage can be prevented by forming a poly layer pattern in an insulating interlayer on at least one side of the uppermost layer metal line.
1. An apparatus comprising:
a semiconductor substrate defined into a sensing part and a peripheral driving part;
a plurality of photodiodes and transistors formed in the sensing part of the semiconductor substrate;
an insulating layer formed over the semiconductor substrate including the photodiodes and the transistors;
at least one lower insulating interlayer formed over the insulating layer;
at least one lower metal line formed over the at least one insulating interlayer;
an upper insulating interlayer formed over the semiconductor substrate including the at least one lower metal line;
an upper metal line formed over the upper insulating interlayer;
a poly layer formed over the upper insulating interlayer on at least one side of the upper metal line such that the uppermost surfaces of the upper insulating layer, the upper metal line and the poly layer are coplanar; and
a protective layer formed over the upper insulating interlayer including the poly layer and the upper metal line.
2. The apparatus of claim 1 , wherein the width and the depth of the poly layer is in a range between approximately 1/100 to 1/300 of the width and the depth of the upper metal line.
3. The apparatus of claim 1 , wherein the poly layer is formed of a polyimide-based polymer.
4. The apparatus of claim 1 , wherein the protective layer comprises an oxide layer.
5. The apparatus of claim 1 , wherein each of the at least one lower metal line and the upper metal line is composed of one selected from the group consisting of Al, Cu, Mo, Ti, Ta.
6. The apparatus of claim 5 , wherein each of the at least one lower metal line and the upper metal line is formed in a single layer.
7. The apparatus of claim 5 , wherein each of the at least one lower metal line and the upper metal line is formed in a stacked layer.
8. A method comprising:
providing a semiconductor substrate defined into a sensing part and a peripheral driving part; and then
forming a plurality of photodiodes and transistors in the sensing part of the semiconductor substrate; and then
forming an insulating layer over the semiconductor substrate including the photodiodes and the transistors; and then
forming at least one lower insulating interlayer over the insulating layer; and then
forming at least one lower metal line over the at least one insulating interlayer; and then
forming an upper insulating interlayer over the semiconductor substrate including the at least one lower metal line; and then
forming an upper metal line over the upper insulating interlayer; and then
forming a poly layer over the upper insulating interlayer on at least one side of the upper metal line such that the uppermost surface of the upper insulating layer, the upper metal line and the poly layer are coplanar; and then
forming a protective layer over the upper insulating interlayer including the poly layer and the upper metal line.
9. The method of claim 8 , wherein the width and the depth of the poly layer is in a range between approximately 1/100 to 1/300 of the width and the depth of the upper metal line.
10. The method of claim 8 , wherein the poly layer is formed of polyimide based polymer.
11. The method of claim 8 , wherein the protective layer is formed of oxide.
12. The method of claim 8 , wherein each of the at least one lower metal line and the upper metal line is composed of one selected from the group consisting of Al, Cu, Mo, Ti, Ta.
13. The method of claim 12 , wherein each of the at least one lower metal line and the upper metal line is formed in a single layer.
14. The method of claim 12 , wherein each of the at least one lower metal line and the upper metal line is formed in a stacked layer.
15. The method of claim 8 , wherein forming the poly layer comprises:
forming a trench in the upper insulating interlayer on at least one side of the upper metal line; and then
depositing a polyimide-based polymer over the upper insulating interlayer to fill up the trench; and then
performing chemical mechanical polishing on the polyimide-based polymer to expose the uppermost surface of the upper insulating interlayer and the upper metal line such that the polyimide-based polymer remains in the trench.
16. The method of claim 8 , further comprising the step of performing a thermal treatment after forming the protective layer.
17. The method of claim 16 , wherein the thermal treatment is performed at a temperature in a range between approximately 350 to 450° C.
18. The method of claim 8 , further comprising, after forming the protective layer:
forming a color filter layer over the protective layer corresponding spatially to the photodiodes; and then
forming a microlens pattern over and corresponding spatially to the color filter layer.
19. A method comprising:
forming photodiodes in a semiconductor substrate; and then
forming transistors over the semiconductor substrate including the photodiodes; and then
forming an insulating layer over the semiconductor substrate including the photodiodes and the transistors; and then
forming a lower insulating interlayer over the insulating layer; and then
forming lower metal lines over the lower insulating interlayer; and then
forming an upper insulating interlayer over lower insulating interlayer including the lower metal line; and then
forming an upper metal line over the upper insulating interlayer; and then
forming a trench in the upper insulating interlayer on both sides of the upper metal line; and then
forming a polyimide-based polymer pattern in the trenches such that the uppermost surface of the upper insulating layer, the upper metal line and the polyimide-based polymer pattern are coplanar; and then
forming a protective layer over the upper insulating interlayer including the polyimide-based polymer pattern and the upper metal line; and then
performing a thermal treatment after forming the protective layer.
20. The method of claim 19 , wherein the protective layer is formed of oxide.
21. The method of claim 19 , further comprising, after forming the protective layer:
forming a color filter layer over the protective layer corresponding spatially to the photodiodes; and then
forming a microlens pattern over and corresponding spatially to the color filter layer.