Optoelectronic display and method of manufacturing the same
An optoelectronic display comprising a plurality of pixels, each pixel comprising a plurality of sub-pixels, wherein the optoelectronic display comprises a colour-forming layer which is patterned providing a plurality of discrete colour-forming regions in a two-dimensional array, and wherein an addressing array is provided for addressing the discrete colour-forming regions, at least some of the discrete colour-forming regions having portions which are separately addressable by the addressing array, each portion defining a sub-pixel of the optoelectronic display.
1. An optoelectronic display comprising a plurality of pixels, each pixel comprising a plurality of sub-pixels, the optoelectronic display comprising:
a substrate;
a first electrode layer disposed over the substrate;
the light-emissive layer disposed over the first electrode layer, wherein the light-emissive layer is patterned to provide a plurality of discrete light-emissive regions in a two-dimensional array; and
a second electrode layer disposed over the light-emissive layer,
wherein the first electrode layer and/or the second electrode layer comprise a plurality of electrodes, each electrode comprising at least two sub-electrodes associated with each discrete light-emissive region,
wherein at least some of the discrete light-emissive regions have portions which are separately addressable by the plurality of electrodes, and
wherein each portion of the discrete light-emissive regions defines a respective sub-pixel of the plurality of sub-pixels.
2. A display according to claim 1 , wherein each separately addressable portion defines a sub-pixel of a different pixel in the optoelectronic display.
3. A display according to claim 1 , wherein the discrete light-emissive regions comprise 2, 3, 4 or 6 separately addressable portions.
4. A display according to claim 1 , wherein the pixels are square, rectangular, triangular or hexagonal in shape.
5. A display according to claim 1 , wherein the discrete light-emissive regions are one or more of square, rectangular, circular, oval, and hexagonal in shape.
6. A display according claim 1 , wherein the optoelectronic display is a multicolour display.
7. A display according to claim 1 , wherein a gap is provided between said sub-electrodes for preventing lateral conduction between the sub-electrodes.
8. A display according to claim 7 , wherein said gap is filled with an insulating material in order to planarize an upper surface of the electrodes.
9. A display according to claim 8 , wherein said insulating material is an inorganic dielectric material or an organic photoresist material.
10. A display according to claim 1 , wherein said sub-electrodes comprise a patterned layer of conductive material and an unpatterned layer of conductive material, said unpatterned layer being less conductive than said patterned layer for preventing lateral conduction between the sub-electrodes.
11. A display according to claim 10 , wherein the patterned layer comprises a patterned conductive contact layer defining the sub-electrodes and the unpatterned layer comprises a uniform layer of charge injecting material.
12. A display according to claim 1 , wherein the light-emissive layer is patterned by providing a bank structure disposed over the first electrode layer defining a plurality of wells, each well containing one of the discrete light-emissive regions, whereby at least two sub-electrodes are associated with each well.
13. A display according to claim 1 , wherein the first electrode layer comprises the sub-electrodes.
14. A display according to claim 1 , wherein the sub-electrodes are anodes.
15. A display according to claim 1 , wherein the light-emissive layer comprises an organic light-emissive material.
16. A display according to claim 15 , wherein the light-emissive layer comprises a polymer light-emissive material.
17. A display according to claim 1 , wherein a conductive polymer layer is disposed between one of the electrode layers and the light-emissive layer.
18. A method of manufacturing an optoelectronic display, the method comprising:
providing a substrate;
depositing a first electrode layer over the substrate;
depositing a light-emissive layer as a colour-forming layer over the first electrode layer; and
depositing a second electrode layer over the light-emissive layer,
wherein the light-emissive layer is patterned providing a two-dimensional array of discrete light-emissive regions, and wherein the first electrode layer and/or the second electrode layer comprises a plurality of electrodes, each electrode comprising at least two sub-electrodes associated with each discrete light-emissive region.
19. A method according to claim 18 , wherein the colour-forming layer is deposited from solution.
20. A method according to claim 19 , wherein the colour-forming layer is deposited by ink-jet printing or spin coating.
21. A method according to claim 18 , wherein the light-emissive layer is patterned by depositing a bank structure disposed over the first electrode layer defining a plurality of wells prior to depositing the light-emissive layer, the light-emissive layer being subsequently deposited such that each well contains one of the discrete light-emissive regions, whereby at least two sub-electrodes are associated with each well.
22. A method according to claim 18 , wherein the sub-electrodes are patterned by laser ablation, e-beam ablation, dry etching, wet etching, or direct writing.