IP Library Granted Patent US 8,047,020
Granted Patent B2
US 8,047,020 · App. 12/304,154 · Granted Nov 1, 2011

Method of producing vitreous silica crucible

Assignee: Japan Super Quartz Corporation
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Quick Facts
Patent No.
US 8,047,020
App. No.
12/304,154
Granted
Nov 1, 2011
Kind
B2
Abstract

The method of producing a vitreous silica crucible, comprises deposition step of depositing silica powder on an inner wall surface of a cylindrical rotation mold having a bottom while rotating the mold; and a fusion step to obtain a vitreous silica crucible by heating and fusing the silica powder deposited on the inner wall surface of the mold and thereby vitrifying the silica powder. In the deposition step, a density of the deposited silica powder layer on the inner wall surface of the mold is controlled within a predetermined range by controlling the electrostatic charging voltage of the silica powder to be in a range of 1.0 kV or less in absolute value, and supplying the thus controlled silica powder to the inner wall surface of the mold. Thus, a wall thickness of the vitreous silica crucible is controlled.

Claims (10)

1. A method of producing a vitreous silica crucible, comprising:

performing deposition of a silica powder by depositing silica powder as a single layer of unmelted silica powder on an inner wall surface of a cylindrical mold that has a bottom while rotating the mold;

shaving the wall using a device to control the thickness of the single layer of unmelted silica powder in the target thickness; and

performing fusion of the single layer of unmelted silica powder to obtain a vitreous silica crucible comprising a single layer of vitreous silica by heating, fusing through a one-step arc heat fusing process after the step of shaving, and thereby vitrifying the silica powder deposited on the inner surface of the mold,

wherein:

during the deposition of the silica powder, electrostatic charging voltage of the unmelted silica powder is controlled to be in a range of 0.0 kV to −1.0 kV in absolute value by controlling a relative humidity of an atmospheric gas being in contact with the unmelted silica powder to be not lower than 55%, by adding humidified gas, water vapor, or droplets of pure water to the atmospheric gas being in contact with the unmelted silica powder without performing an arc heat fusing process at the same time,

the thus controlled unmelted silica powder is supplied to the inner wall surface of the mold to maintain the density of the deposited unmelted silica powder layer on the inner wall surface of the mold within a predetermined range, wherein the thickness of the unmelted silica powder layer deposited on the bottom portion of the mold is controlled to be within ±1% compared with the target thickness, and

the one-step arc heat fusing process performed after the step of shaving is the only arc heat fusing process performed.

2. A method of producing a vitreous silica crucible according to claim 1 , wherein the relative humidity is controlled to be in a range of 60% to 90%.

3. A method of producing a vitreous silica crucible according to claim 1 , wherein the electrostatic charging voltage is controlled to be in a range of 0.0 kV to −0.9 kV in absolute value.

Assignments (2)
MERGER Recorded Oct 15, 2018
From: JAPAN SUPER QUARTZ CORPORATION
To: SUMCO CORPORATION
Reel/Frame 047237/0179 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 22, 2009
From: FUJITA, TAKESHI; KANDA, MINORU
To: JAPAN SUPER QUARTZ CORPORATION
Reel/Frame 023262/0522 →
Priority Claims (1)
JP 2007-196649 · Jul 27, 2007 · national
Continuity (1)
Related Publication 20100162760A1 · Jul 1, 2010