Semiconductor device
View Patent ↗A semiconductor device includes a plurality of memory cells and a sense amplifier circuit which further includes a plurality of elements such as MOS transistor formed in a well, wherein sensitive element, which are sensitive to dispersion of an impurity density in the well, is distanced from a boundary and are disposed in the center region of the well, while non-sensitive element is disposed in the peripheral region close to the boundary in the well. Since sensitive element requiring precise control of threshold voltage is disposed in the center region having uniform impurity density, and non-sensitive element allowing for less precise control of threshold voltage is disposed in the peripheral region suffering from uneven impurity density, it is possible to effectively use the overall area of the well and to thereby suppress an increase in the layout area of chips.
1. A semiconductor device comprising a sensitive element and a non-sensitive element formed in a first-conductivity-type well, wherein the sensitive element, which is relatively sensitive to dispersion of impurity density of the first-conductivity-type well, is distanced from a boundary of the first-conductivity-type well, and wherein the non-sensitive element, which is not relatively sensitive to dispersion of impurity density of the first-conductivity-type well, is disposed in proximity to the boundary of the first-conductivity-type well.
2. The semiconductor device according to claim 1 , wherein the boundary is in a rectangle.
3. The semiconductor device according to claim 1 , wherein the sensitive element comprising a second-conductivity-type semiconductor layer is distanced from the boundary, and wherein the non-sensitive element comprising the second-conductivity-type semiconductor layer is disposed in proximity to the boundary.
4. The semiconductor device according to claim 1 , wherein the non-sensitive element is disposed between the sensitive element and the boundary.
5. The semiconductor device according to claim 1 , wherein each of the sensitive element and the non-sensitive element is configured of MOS transistor.
6. The semiconductor device according to claim 5 , wherein the sensitive element requires precision control of a threshold voltage thereof, and wherein the non-sensitive element allows for a less precise control of a threshold voltage thereof.
7. A semiconductor device comprising:
a plurality of memory cells; and
a sense amplifier circuit for amplifying a potential difference occurring between bit lines due to a read operation for reading data from the memory cell,
the sense amplifier circuit including a plurality of precharge MOS transistors which are each constituted of a second-conductivity-type semiconductor layer and are formed in a first-conductivity-type well so as to precharge the bit lines before the read operation, and a plurality of sense-amplification MOS transistors which are each constituted of the second-conductivity-type semiconductor layer and are formed in the first-conductivity-type well so as to amplify the potential difference occurring between the bit lines due to the read operation,
wherein the precharge MOS transistors are disposed in proximity to a boundary of the first-conductivity-type well, and
wherein the sense-amplification MOS transistors are distanced from the boundary of the first-conductivity-type well.
8. The semiconductor device according to claim 7 , wherein the boundary is in a rectangle.
9. The semiconductor device according to claim 7 , wherein the first-conductivity-type is n-type and the second-conductivity-type is p-type, and wherein gates of the precharge MOS transistors are each supplied with negative potential during the precharge of the bit lines.
10. A semiconductor device comprising:
a plurality of memory cells; and
a sense amplifier circuit for amplifying a potential difference occurring between bit lines due to a read operation for reading data from the memory cell,
the sense amplifier circuit including a equalize-MOS transistor which is constituted of a second-conductivity-type semiconductor layer and is formed in a first-conductivity-type well so as to equalize the bit lines to the same potential during precharge of the bit lines, and a plurality of sense-amplification MOS transistors which are each constituted of the second-conductivity-type semiconductor layer and are formed in the first-conductivity-type well so as to amplify the potential difference occurring between the bit lines due to the read operation,
wherein the equalize-MOS transistor is disposed in proximity to a boundary of the first-conductivity-type well, and
wherein the sense-amplification MOS transistors are distanced from the boundary of the first-conductivity-type well.
11. The semiconductor device according to claim 10 , wherein the boundary is in a rectangle.