IP Library Granted Patent US 7,599,214
Granted Patent B2
US 7,599,214 · App. 12/325,820 · Granted Oct 6, 2009

Semiconductor memory device

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Quick Facts
Patent No.
US 7,599,214
App. No.
12/325,820
Granted
Oct 6, 2009
Kind
B2
Abstract

Source contacts of driver transistors are short-circuited through the use of an internal metal line within a memory cell. This metal line is isolated from memory cells in an adjacent column and extends in a zigzag form in a direction of the columns of memory cells. Individual lines for transmitting the source voltage of driver transistors can be provided for each column, and the source voltage of driver transistors can be adjusted also in units of memory cell columns in the structure of single port memory cell.

Claims (38)

1. A semiconductor memory device comprising:

a memory cell array including a plurality of memory cells, arranged in rows and columns, each memory cell including

a pair of load transistor elements of a second conductivity type formed in a first substrate region of a first conductivity type,

each load transistor having a first conduction node coupled to a power supply node to which a first power supply voltage is supplied through a first power supply line, and

drive transistor elements of the first conductivity type formed in respective second substrate regions of the second conductivity type arranged on opposite sides of the first substrate region of the first conductivity type,

the drive transistors being connected so as to form a flip-flop with the load transistor elements and having first conduction nodes connected together to receive a second power supply voltage;

access transistor elements of the first conductivity type formed in respective second substrate regions of the second conductivity type arranged on opposite sides of the first substrate region of the first conductivity type,

second power supply lines provided to respective memory cell columns for supplying the second power supply voltage to the drive transistor elements in the plurality of memory cells,

each second power supply line continuously extending in a column direction of the memory cell array, and crossing over the first substrate region of each memory cell in a corresponding memory cell column to connect together the first conduction nodes of the drive transistor elements;

a plurality of word lines, provided corresponding to the respective memory cell rows, each connecting to a gate electrode of the access transistor on a corresponding row; and

a plurality of bit lines, provided corresponding to the respective memory cell columns, each connecting to a second conduction node of the access transistor on a corresponding column,

wherein said second power supply lines provided to the respective memory cell columns are isolated from each other.

2. The semiconductor memory device according to claim 1 ,

wherein the first power supply line is formed in a second metal layer for supplying said first power supply voltage,

the bit lines are each formed in said second metal layer, and

each second power supply line is placed in a first metal layer below the second metal layer.

3. The semiconductor memory device according to claim 1 , wherein

each second power supply line is placed in a first metal layer below a second metal layer constituting said bit lines, and

the word lines are placed in a third metal layer above the second metal layer.

4. The semiconductor memory device according to claim 1 , wherein

said power supply node comprises an impurity region of the first conductivity type formed in the first substrate region, and a conductive layer for electrically connecting said impurity region of the first conductivity type to an impurity region of the second conductivity type constituting the first conduction node of each load transistor.

5. The semiconductor memory device according to claim 4 , wherein

said second power supply lines and said bit lines are formed in a first metal layer, and

the word lines are formed in a second metal layer below said first metal layer.

6. The semiconductor memory device according to claim 1 , wherein

each of the access transistors further comprises first and second access transistors, formed in each second substrate region, each made selectively conductive in accordance with a voltage of a control electrode node thereof,

each word line comprises first and second word lines provided corresponding to the first and second access transistors, respectively, and connected to the control electrode nodes of the respective first and second access transistors, and

each bit line comprise first and second bit lines connected to the first and second access transistors, respectively.

7. The semiconductor memory device according to claim 1 , wherein the first

power supply line comprises a power line arranged extending in a direction of the columns for each column and coupled to the power supply nodes of the load transistors of memory cells in a corresponding column.

8. The semiconductor memory device according to claim 1 ,

further comprising a voltage controlling circuit for setting a voltage of each second power supply line in accordance with a column selecting signal for each column.

9. The semiconductor memory device according to claim 1 ,

wherein the first conduction nodes of the pair of drive transistors are placed in respective portions of the memory cell boundary regions opposite to each other in a column extending direction in each memory cell, and

each second power supply line comprises an interconnection line formed into a step form having portions that continuously extends in the column direction and a row direction within each memory cell and connecting the first conduction nodes of the

drive transistor elements in a corresponding memory cell, said second power supply line extending in a zigzag form continuously in the column extending direction, for supplying the second power supply voltage to the memory cells in a corresponding column.

10. The semiconductor memory device according to claim 1 ,

wherein each second power supply line comprises a first conductive line extending in the column direction commonly to the memory cells in each column and a second conductive line formed in a layer below said first conductive line and electrically coupling the first conduction nodes of the drive transistor elements to the first conductive line in each memory cell in a corresponding column.

Assignments (2)
CHANGE OF ADDRESS Recorded Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →
CHANGE OF NAME Recorded Sep 10, 2010
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 024973/0001 →