Method of manufacturing bellows
View Patent ↗Method for producing at low cost bellows which show high durability even when used in a quite reactive atmosphere. The method for manufacturing bellows includes the steps of: I: forming an untreated bellows from a flat base plate, the base plate including 15 to 30 wt % of Cr, 5 to 40 wt % of Ni, 0.9 to 6 wt % of Al, less than 1 wt % of Mo, less than 0.1 wt % of Mn, less than 0.1 wt % of C, less than 0.1 wt % of S, less than 0.1 wt % of P and a balance of Fe and an unavoidable impurity (relative to 100 wt % of the base plate); and II: heating the untreated bellows at a temperature of 750 to 895° C. in an atmosphere which contains water and hydrogen and in which the volume ratio of hydrogen to water (H 2 /H 2 O) is in the range of 2×10 3 to 1×10 12 , thereby forming an Al 2 O 3 passivation film on a surface of the untreated bellows.
1. A method for manufacturing bellows, comprising the steps of:
I: forming an untreated bellows from a flat base plate, the base plate comprising 15 to 30 wt % of Cr, 5 to 40 wt % of Ni, 0.9 to 6 wt % of Al, less than 1 wt % of Mo, less than 0.1 wt % of Mn, less than 0.1 wt % of C, less than 0.1 wt % of S, less than 0.1 wt % of P and a balance of Fe and an unavoidable impurity relative to 100 wt % of the base plate; and
II: heating the untreated bellows at a temperature within a range of 750 to 895° C. in an atmosphere which contains water and hydrogen and in which the volume ratio of hydrogen to water (H 2 /H 2 O) is in the range of 2×10 3 to 1×10 12 , thereby forming an Al 2 O 3 passivation film on a surface of the untreated bellows.
2. The method according to claim 1 , wherein the atmosphere in the step of II contains water and hydrogen in total at 0.001 to 100% by volume, and an inert gas at 99.999 to 0% by volume.
3. The method according to claim 1 , wherein the step I comprises:
a first step in which at least four annular plate members each having an outer peripheral rim and an inner peripheral rim are punched out from a flat base plate, the base plate comprising 15 to 30 wt % of Cr, 5 to 40 wt % of Ni, 0.9 to 6 wt % of Al, less than 1 wt % of Mo, less than 0.1 wt % of Mn, less than 0.1 wt % of C, less than 0.1 wt % of S, less than 0.1 wt % of P and a balance of Fe and an unavoidable impurity relative to 100 wt % of the base plate;
a second step in which each pair of the annular plate members is stacked and joined together by welding the inner peripheral rims to produce a plurality of welded members; and
a third step in which the plurality of the welded members are stacked and joined together by welding the outer peripheral rims to form an untreated bellows.
4. The method according to claim 1 , wherein the flat base plate is an electropolished flat base plate.
5. The method according to claim 3 , further comprising a step of electropolishing surfaces of the annular plate members between the first step and the second step.
6. The method according to claim 1 , wherein the Al 2 O 3 passivation film has a thickness of 20 to 150 nm.
7. The method according to claim 1 , wherein the Al 2 O 3 passivation film contains Al 2 O 3 at 98 to 100 wt %.
8. The method according to claim 2 , wherein the step I comprises:
a first step in which at least four annular plate members each having an outer peripheral rim and an inner peripheral rim are punched out from a flat base plate, the base plate comprising 15 to 30 wt % of Cr, 5 to 40 wt % of Ni, 0.9 to 6 wt % of Al, less than 1 wt % of Mo, less than 0.1 wt % of Mn, less than 0.1 wt % of C, less than 0.1 wt % of S, less than 0.1 wt % of P and a balance of Fe and an unavoidable impurity relative to 100 wt % of the base plate;
a second step in which each pair of the annular plate members is stacked and joined together by welding the inner peripheral rims to produce a plurality of welded members; and
a third step in which the plurality of the welded members are stacked and joined together by welding the outer peripheral rims to form an untreated bellows.
9. The method according to claim 2 , wherein the flat base plate is an electropolished flat base plate.
10. The method according to claim 2 , wherein the Al 2 O 3 passivation film has a thickness of 20 to 150 nm.
11. The method according to claim 2 , wherein the Al 2 O 3 passivation film contains Al 2 O 3 at 98 to 100 wt %.
12. A bellows obtained by:
forming an untreated bellows from a flat base plate, the base plate comprising 15 to 30 wt % of Cr, 5 to 40 wt % of Ni, 0.9 to 6 wt % of Al, less than 1 wt % of Mo, less than 0.1 wt % of Mn, less than 0.1 wt % of C, less than 0.1 wt % of S, less than 0.1 wt % of P and a balance of Fe and an unavoidable impurity relative to 100 wt % of the base plate; and
heating the untreated bellows at a temperature within a range of 750 to 895° C. in an atmosphere which contains water and hydrogen and in which the volume ratio of hydrogen to water (H 2 /H 2 O) is in the range of 2×10 3 to 1×10 12 , thereby forming an Al 2 O 3 passivation film on a surface of the untreated bellows.
13. The bellows according to claim 12 , wherein the atmosphere contains water and hydrogen in total at 0.001 to 100% by volume, and an inert gas at 99.999 to 0% by volume.
14. The bellows according to claim 13 , wherein the Al 2 O 3 passivation film has a thickness of 20 to 150 nm.
15. The bellows according to claim 13 , wherein the Al 2 O 3 passivation film contains Al 2 O 3 at 98 to 100 wt %.
16. The bellows according to claim 12 , wherein the Al 2 O 3 passivation film has a thickness of 20 to 150 nm.
17. The bellows according to claim 12 , wherein the Al 2 O 3 passivation film contains Al 2 O 3 at 98 to 100 wt %.