Thin film forming method and color filter manufacturing method
View Patent ↗A method for forming a thin film by discharging a liquid including a material for forming the thin film, the material being dissolved or dispersed in a solvent, from a plurality of nozzles so as to dispose the liquid into a plurality of predetermined areas included in an effective area set on a substrate to form the thin film while the plurality of nozzles and the substrate are relatively scanned, includes: (a) forming a plurality of reception parts surrounded by a plurality of partitions and bottoms of the predetermined areas, the partitions being provided around the predetermined areas; and (b) forming a plurality of thin films by disposing the liquid from the nozzles into the reception parts. In step (a), a plan view area of at least one of the reception parts in a peripheral area of the effective area is made smaller than a plan view area of the reception part in a central area of the effective area.
1. A method for manufacturing a color filter to be installed in an electrooptic apparatus having a plurality of pixel electrodes, the color filter including a substrate having a plurality of pixel areas disposed within an effective area at positions corresponding to the pixel electrodes, the method comprising:
(a) forming a plurality of reception parts surrounded by a plurality of partitions on the substrate, each of the reception parts respectively corresponding to each of the pixel areas disposed within the effective area; and
(b) forming a plurality of thin films by disposing a liquid including a material for forming a thin film of a colored layer from a plurality of nozzles into the reception parts while the nozzles and the substrate are relatively scanned, wherein
in step (a), a plan view area of at least one of the reception parts in a peripheral area within the effective area is made smaller than a plan view area of the reception part in a central area within the effective area.
2. The method for manufacturing a color filter according to claim 1 , further comprising
(c) obtaining, prior to step (a), measurement values of thicknesses of the thin films formed by discharging the liquid into the predetermined areas under a predetermined discharge condition, wherein
in step (a), the reception parts are formed on the basis of the obtained measurement values.
3. The method for manufacturing a color filter according to claim 1 , further comprising
(d) measuring, prior to step (a), amounts of the liquid discharged from the nozzles under a predetermined condition.
4. The method for manufacturing a color filter according to claim 3 , wherein
in step (d), the liquid is discharged onto a measurement substrate whose contact angle with the liquid has been controlled and then the amounts of the discharged liquid are measured by optical interferometry.
5. The method for manufacturing a color filter according to claim 4 , wherein
the optical interferometry is white-light interferometry.
6. The method for manufacturing a color filter according to claim 3 , wherein
in step (d), thin films made of the forming material are formed by evaporating the solvent included in the discharged liquid and then the amounts of the discharged liquid are calculated from volumes of the formed thin films.
7. The method for manufacturing a color filter according to claim 1 , wherein
the partitions are formed using a photoresist.
8. The method for manufacturing a color filter according to claim 1 ,
wherein, at least one of the partitions has a sidewall facing the colored layer, the side wall having a first edge at a bottom thereof, the bottom making contact with the substrate, and a second edge at a top thereof, and
a plan view area surrounded by the first edge and a plan view area surrounded by the second edge are both equal to or larger than a plan view area of a corresponding one of the pixel electrodes included in the electrooptic element.