IP Library Granted Patent US 8,225,729
Granted Patent B2
US 8,225,729 · App. 12/336,078 · Granted Jul 24, 2012

Three-dimensional wiping substrate and method therefor

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Quick Facts
Patent No.
US 8,225,729
App. No.
12/336,078
Granted
Jul 24, 2012
Kind
B2
Abstract

A planar substrate has a moisture activated shrinking filament applied thereon. When wetted, the shrinking filament shrinks and causes the planar substrate to gather and pucker. The planar substrate with the filament thereon may be compressed into a compact shape when in a dry state.

Claims (11)

1. A method of creating a three-dimensional article comprising the steps of:

(a) providing a planar substrate;

(b) stitching the planar substrate with a moisture sensitive shrinking filament;

wherein the stitching forms a pattern, and wherein the stitching is not displaced with respect to the planar substrate;

(c) compressing the planar substrate into a pill configuration; and

(d) applying an aqueous liquid to the planar substrate.

2. The method according to claim 1 wherein the steps are carried out in the following order: a, b, c, and d.

3. The method according to claim 1 wherein the stitching pattern comprises a plurality of discrete shapes.

4. The method according to claim 1 wherein the stitching pattern comprises shapes that are formed by a first stitch line crossing over a second stitch line.

5. The method according to claim 1 wherein the stitching pattern comprises shapes that are formed by stitching lines that do not cross one another.

6. The method according to claim 1 wherein the moisture sensitive shrinking filament comprises polyvinyl alcohol.

Assignments (2)
NAME CHANGE Recorded Feb 3, 2015
From: KIMBERLY-CLARK WORLDWIDE, INC.
To: KIMBERLY-CLARK WORLDWIDE, INC.
Reel/Frame 034880/0704 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 19, 2009
From: MACDONALD, JOHN GAVIN; KIM, JAEHO; LEE, WANDUK; HEO, JIN; KOH, CHOLWOH; LEE, SANGSOO
To: KIMBERLY-CLARK WORLDWIDE, INC.
Reel/Frame 022125/0371 →