Imprint lithography method
View Patent ↗A template is treated to provide a surfactant rich region and a surfactant depleted region. A contact angle at the surfactant rich region may be greater than, less than, or substantially similar to a contact angle of the surfactant depleted region.
1. An imprint lithography method comprising:
dispensing on a substrate a first imprint fluid comprising a first polymerizable material and a surfactant;
contacting a surface of an imprint lithography template, in superimposition with the substrate, with the first imprint fluid such that at least a portion of the surfactant of the first imprint fluid contacts the surface of the imprint lithography template;
solidifying the first imprint fluid;
separating the surface of the imprint lithography template and the solidified first imprint fluid to form on the surface of the imprint lithography template a surfactant rich region having a first thickness and a surfactant depleted region having a second thickness; and
contacting the surface of the imprint lithography template having the surfactant rich region and the surfactant depleted region with a second imprint fluid such that at least a portion of the second imprint fluid contacts the surface of the imprint lithography imprint lithography template having the surfactant rich region and the surfactant depleted region,
wherein a first contact angle between the imprint lithography template and the second imprint fluid within the surfactant rich region of the imprint lithography template is greater than a second contact angle between the imprint lithography template and the second imprint fluid within the surfactant depleted region of the imprint lithography template.
2. The method of claim 1 , wherein the first thickness is greater than the second thickness.
3. The method of claim 1 , wherein the second thickness is substantially zero.
4. The method of claim 1 , wherein a magnitude of the first contact angle is less than 50 degrees.
5. The method of claim 1 , further comprising solidifying the second imprint fluid after the second imprint fluid is contacted with the surface of the imprint lithography template.
6. The method of claim 1 , wherein the surface of the imprint lithography template comprises a plurality of spaced-apart recesses or protrusions.
7. The method of claim 1 , wherein a magnitude of the second contact angle is less than approximately 22 degrees.
8. The method of claim 7 , wherein a magnitude of the second contact angle is less than approximately 18 degrees.
9. The method of claim 1 wherein the first thickness is between approximately 0.2 nm and approximately 5 nm.
10. The method of claim 1 , wherein:
before contacting the surface of the imprint lithography template with the first imprint fluid, the surface of the imprint lithography template is substantially free of surfactant, and
during contacting the surface of the imprint lithography template with the first imprint fluid, the portion of the surfactant of the first imprint fluid in contact with the surface of the imprint lithography template defines an initial surfactant rich region on the surface of the imprint lithography template and an initial surfactant depleted region on the surface of the imprint lithography template adjacent the initial surfactant rich region on the surface of the imprint lithography template,
wherein a third contact angle between the surface of the imprint lithography template and the first imprint fluid within the initial surfactant rich region of the imprint lithography template is greater than a fourth contact angle between the surface of the imprint lithography template and the first imprint fluid within the initial surfactant depleted region of the imprint lithography template.
11. An imprint lithography method comprising:
dispensing on a substrate a first imprint fluid comprising a first polymerizable material and a surfactant;
contacting a surface of an imprint lithography template, in superimposition with the substrate, with the first imprint fluid such that at least a portion of the surfactant of the first imprint fluid contacts the surface of the imprint lithography template;
solidifying the first imprint fluid;
separating the surface of the imprint lithography template and the solidified first imprint fluid to form on the surface of the imprint lithography template a surfactant rich region having a first thickness and a surfactant depleted region having a second thickness; and
contacting the surface of the imprint lithography template having the surfactant rich region and the surfactant depleted region with a second imprint fluid, such that at least a portion of the second imprint fluid contacts the surface of the imprint lithography template having the surfactant rich region and the surfactant depleted region,
wherein a magnitude of the difference between a first contact angle between the imprint lithography template and the second imprint fluid within the surfactant rich region of the imprint lithography template and a second contact angle between the imprint lithography template and the second imprint fluid within the surfactant depleted region of the imprint lithography template is about 2 degrees.
12. The method of claim 11 , wherein the first thickness is greater than the second thickness.
13. The method of claim 11 , wherein the second thickness is substantially zero.
14. The method of claim 11 , wherein a magnitude of the first contact angle is less than 50 degrees.
15. The method of claim 11 , further comprising solidifying the second imprint fluid after the second imprint fluid is contacted with the imprint lithography template.
16. The method of claim 11 , wherein the surface of the imprint lithography template comprises a plurality of spaced-apart recesses or protrusions.
17. The method of claim 11 wherein the first thickness is between approximately 0.2 nm and approximately 5 nm.
18. The method of claim 11 , wherein:
before contacting the surface of the imprint lithography template with the first imprint fluid, the surface of the imprint lithography template is substantially free of surfactant, and
during contacting the surface of the imprint lithography template with the first imprint fluid, the portion of the surfactant of the first imprint fluid in contact with the surface of the imprint lithography template defines an initial surfactant rich region on the surface of the imprint lithography template and an initial surfactant depleted region on the surface of the imprint lithography template adjacent the initial surfactant rich region on the surface of the imprint lithography template,
wherein a third contact angle between the surface of the imprint lithography template and the first imprint fluid within the initial surfactant rich region of the imprint lithography template is greater than a fourth contact angle between the surface of the imprint lithography template and the first imprint fluid within the initial surfactant depleted region of the imprint lithography template.