IP Library Granted Patent US 8,059,367
Granted Patent B2
US 8,059,367 · App. 12/341,925 · Granted Nov 15, 2011

Methods for creating a magnetic main pole with side shield and systems thereof

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Quick Facts
Patent No.
US 8,059,367
App. No.
12/341,925
Granted
Nov 15, 2011
Kind
B2
Abstract

A method according to another embodiment includes forming a side shield layer of ferromagnetic material above a substrate; masking the side shield layer; milling an unmasked region of the side shield layer for forming a pole trench therein; and forming a pole layer in the pole trench. A structure according to one embodiment includes a substrate; a side shield layer of ferromagnetic material on the substrate, wherein the substrate has a region covered by the side shield layer and a region not covered by the side shield layer; a pole trench in the side shield layer and the region of the substrate not covered by the side shield layer; a layer of nonmagnetic material in the pole trench; and a pole layer in the pole trench, wherein the pole layer has a greater thickness above the region of the substrate not covered by the side shield layer than above the region of the substrate covered by the side shield layer.

Claims (42)

1. A method, comprising:

forming a side shield layer of ferromagnetic material on a substrate such that the substrate has a region covered by the side shield layer and a region not covered by the side shield layer;

masking the side shield layer and the uncovered region of the substrate;

forming a pole trench in an unmasked region of the side shield layer and an unmasked region of the substrate;

forming a layer of nonmagnetic material in the pole trench;

forming a pole layer in the pole trench above the layer of nonmagnetic material and the substrate; and

planarizing the pole layer, wherein the pole layer has a greater thickness above the region of the substrate not covered by the side shield layer than above the region of the substrate covered by the side shield layer.

2. A method as recited in claim 1 , wherein the pole trench is formed in the side shield layer by milling.

3. A method as recited in claim 1 , wherein the pole layer is formed by plating.

4. A method as recited in claim 1 , wherein the pole layer has a flare point defined away from the side shield layer.

5. A method as recited in claim 1 , wherein the side shield layer is formed with a preliminary trench therein at a location of where the pole trench is formed in a subsequent step.

6. A method as recited in claim 1 , further comprising forming a top shield above the pole layer.

7. A method as recited in claim 6 , further comprising forming a layer of nonmagnetic material between the top shield and the pole layer, wherein the top shield is in electrical communication with the side shield layer.

8. A method as recited in claim 6 , further comprising forming a layer of nonmagnetic material between the top shield and the pole and side shield layers.

9. A method, comprising:

forming a side shield layer of ferromagnetic material above a substrate;

masking the side shield layer;

milling an unmasked region of the side shield layer for forming a pole trench therein; and

forming a pole layer in the pole trench,

wherein the side shield layer is formed with a preliminary trench therein at a location of where the pole trench is formed in a subsequent step.

10. A method as recited in claim 9 , wherein the pole layer is formed by plating.

11. A method as recited in claim 9 , wherein the pole layer has a flare point defined away from the side shield layer.

12. A method as recited in claim 9 , further comprising forming a top shield above the pole layer.

13. A method as recited in claim 12 , further comprising forming a layer of nonmagnetic material between the top shield and the pole layer.

14. A method as recited in claim 13 , wherein the top shield is in electrical communication with the side shield layer.

15. A method as recited in claim 9 , wherein the pole layer has a greater thickness in the unmasked region of the substrate than in the unmasked region of the side shield layer.

16. A method, comprising:

forming a side shield layer of ferromagnetic material above a substrate;

masking the side shield layer;

milling an unmasked region of the side shield layer for forming a pole trench therein;

forming a pole layer in the pole trench, and

milling the substrate for forming a pole trench therein, and forming the pole layer in the pole trench of the substrate.

17. A method as recited in claim 16 , further comprising planarizing the pole layer, wherein the pole layer has a greater thickness above the pole trench of the substrate than above the pole trench of the side shield layer.

18. A structure, comprising:

a substrate;

a side shield layer of ferromagnetic material on the substrate, wherein the substrate has a region covered by the side shield layer and a region not covered by the side shield layer;

a pole trench in the side shield layer and the region of the substrate not covered by the side shield layer;

a layer of nonmagnetic material in the pole trench; and

a pole layer in the pole trench, wherein the pole layer has a greater thickness above the region of the substrate not covered by the side shield layer than above the region of the substrate covered by the side shield layer.

19. A structure as recited in claim 18 , wherein the pole trench has sidewalls characterized as having an angled or concave shape resulting from milling.

20. A structure as recited in claim 18 , further comprising a top shield above the pole layer.

21. A structure as recited in claim 20 , further comprising forming a layer of nonmagnetic material between the top shield and the pole layer.

Assignments (6)
PATENT COLLATERAL AGREEMENT - DDTL LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 067045/0156 →
PATENT COLLATERAL AGREEMENT - A&R LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 064715/0001 →
RELEASE OF SECURITY INTEREST AT REEL 052915 FRAME 0566 Recorded Feb 8, 2022
From: JPMORGAN CHASE BANK, N.A.
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 059127/0001 →
SECURITY INTEREST Recorded Feb 6, 2020
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A., AS AGENT
Reel/Frame 052915/0566 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 6, 2016
From: HGST NETHERLANDS B.V.
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 040826/0821 →
CHANGE OF NAME Recorded Oct 25, 2012
From: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V.
To: HGST NETHERLANDS B.V.
Reel/Frame 029341/0777 →