Method to texture a lamina surface within a photovoltaic cell
View Patent ↗It is advantageous to create texture at the surface of a photovoltaic cell to reduce reflection and increase travel length of light within the cell. A method is disclosed to create texture at the surface of a silicon body by reacting a silicide-forming metal at the surface, where the silicide-silicon interface is non-planar, then stripping the silicide, leaving behind a textured surface. Depending on the metal and the conditions of silicide formation, the resulting surface may be faceted. The peak-to-valley height of this texturing will generally be between about 300 and about 5000 angstroms, which is well-suited for use in photovoltaic cells comprising a thin silicon lamina.
1. A method to form a photovoltaic assembly, the method comprising:
doping a first surface of a semiconductor donor body by diffusion doping to a first conductivity type to form a doped first surface;
defining a cleave plane in the semiconductor donor body;
affixing the doped first surface to a receiver element;
cleaving a lamina from the semiconductor donor body at the cleave plane, wherein the lamina remains affixed to the receiver element, wherein a second surface of the lamina is created by the cleaving step;
depositing amorphous silicon directly on the second surface, wherein at least a part of the amorphous silicon is heavily doped; and
fabricating a photovoltaic cell with an emitter and a base, wherein the heavily doped amorphous silicon comprises the emitter of the photovoltaic cell, and the lamina comprises the base of the photovoltaic cell.
2. The method of claim 1 wherein in the completed photovoltaic cell, a conductive material is disposed between the lamina and the receiver element.
3. The method of claim 2 wherein, in the completed photovolta cell, a dielectric layer is disposed between the conductive material and the receiver element.
4. The method of claim 1 wherein the heavily doped amorphous silicon is doped to a second conductivity type opposite the first conductivity type.
5. The method of claim 2 , wherein the conductive material is cobalt.
6. The method of claim 1 wherein at least a part of the amorphous silicon is intrinsic amorphous silicon.