Enhanced magnetoresistance and localized sensitivity by gating in lorentz magnetoresistors
View Patent ↗A Lorentz magnetoresistive sensor that employs a gating voltage to control the momentum of charge carriers in a quantum well structure. A gate electrode can be formed at the top of the sensor structure to apply a gate voltage. The application of the gate voltage reduces the momentum of the charge carriers, which makes their movement more easily altered by the presence of a magnetic field, thereby increasing the sensitivity of the sensor.
1. A Lorentz magnetoresistive sensor, comprising:
a quantum well structure formed between first and second semiconductor layers;
an insulation layer formed next to a portion of the second semiconductor layer at a side opposite the quantum well structure; and
a gate electrode formed next to the insulation layer such that the insulation layer is sandwiched between the second semiconductor layer and the gate electrode.
2. A Lorentz magnetoresistive sensor as in claim 1 wherein the quantum well has an edge, the magnetoresistive sensor further comprising first and second voltage leads contacting the edge of the quantum well and first and second current leads contacting the edge of the quantum well structure.
3. A Lorentz magnetoresistive sensor as in claim 1 wherein the quantum well has an edge, the magnetoresistive sensor further comprising first and second voltage leads contacting the edge of the quantum well and first and second current leads contacting the edge of the quantum well, the second current lead being located between the first and second voltage leads.
4. A Lorentz magnetoresistive sensor as in claim 1 wherein the quantum well has an edge, the magnetoresistive sensor further comprising first and second voltage leads contacting the edge of the quantum well and first and second current leads contacting the edge of the quantum well, the second current lead being located between the first and second voltage leads and the gate electrode being localized to cover an area just adjacent to the first and second voltage leads and the second current lead.
5. A Lorentz magnetoresistive sensor as in claim 1 wherein the quantum well has an edge, the magnetoresistive sensor further comprising first and second voltage leads contacting, the edge of the quantum well and first and second current leads contacting the edge of the quantum well, and wherein
the second current lead is located between the first and second voltage leads;
the first and second voltage leads are separated by a distance corresponding to a magnetic bit to be read; and
the gate electrode is localized to cover an area just adjacent to the first and second voltage leads and the second current lead.
6. A Lorentz magnetoresistive sensor as in claim 1 wherein the insulation layer comprises alumina and the gate electrode comprises Au, Al, Pd, Ru, Rh, Ta, titanium nitride or successive layers of these materials.
7. A Lorentz magnetoresistive sensor as in claim 1 further comprising an electrically conductive lead electrically connected with the gate electrode for supplying a gating voltage to the gate electrode.
8. A Lorentz magnetoresistive sensor as in claim 1 further comprising an electrically conductive lead electrically connected with the gate electrode for supplying a gating voltage to the gate electrode, the electrically conductive lead being electrically connected with a voltage source.
9. A Lorentz magnetoresistive sensor as in claim 1 further comprising an electrically conductive lead electrically connected with the gate electrode for supplying a gating voltage to the gate electrode, the electrically conductive lead being electrically connected with a voltage source that is controllable to control the amount of gate voltage to achieve a desired carrier momentum in the quantum well.
10. A Lorentz magnetoresistive sensor, comprising:
a mesa structure including a semiconductor heterostructure that forms a magnetically active quantum well, the mesa structure having and second opposed edges and a surface extending between the first and second edges;
first and second voltage leads connected with the first edge;
an electrically conductive shunt structure connected with the second edge;
an electrically insulating layer formed on the surface of the mesa structure; and
an electrically conductive gate electrode formed on the electrically insulating layer, such that the electrically insulating layer is between the electrically conductive gate electrode and the mesa structure.
11. A Lorentz magnetoresistive sensor as in claim 10 further comprising first and second current leads connected with the first edge.
12. A Lorentz magnetoresistive sensor as in claim 10 wherein the electrically conductive gate electrode is localized to cover only an area substantially adjacent to the voltage leads.
13. A Lorentz magnetoresistive sensor as in claim 10 wherein the electrically conductive gate electrode covers only an area corresponding to a length of a magnetic bit to be sensed.
14. A Lorentz magnetoresistive sensor as in claim 10 further comprising first and second current leads connected with the first edge, and arranged such that the second current leads is between the first and second voltage leads.
15. A Lorentz magnetoresistive sensor as in claim 10 further comprising first and second current leads connected with the first edge, and arranged such that the second current leads is between the first and second voltage leads, the first and second voltage leads being separated by a distance that corresponds to a length of a magnetic bit to be sensed.
16. A Lorentz magnetoresistive sensor as in claim 1 wherein the electrically conductive gate electrode covers only an area corresponding to a length of a magnetic bit to be sensed.
17. A Lorentz magnetoresistive sensor as in claim 10 further comprising an electrically conductivity lead connected with the gate electrode for supplying a gating voltage to the gate electrode.
18. A Lorentz magnetoresistive sensor as in claim 10 further comprising an electrically conductive lead connected with the gate electrode, and a voltage source connected with the electrically conductive lead for supplying a gating voltage to the gate electrode.
19. A Lorentz magnetoresistive sensor as in claim 10 further comprising an electrically conductive lead connected with the gate electrode, and a voltage source connected with the electrically conductive lead for supplying a gating voltage to the gate electrode the voltage source being controllable to vary the amount of gate voltage applied to the gate electrode to thereby control a momentum of charge carriers in the quantum well structure.
20. A Lorentz magnetoresistive sensor as in claim 10 wherein the semiconductor heterostructure includes first, second and third semiconductor layers, the second semiconductor layer being sandwiched between the first and third semiconductor layers, the second semiconductor layer having a band-gap that is smaller than a bandgap of the first and third semiconductor layers.