Alkali-free glass substrate, method for producing it and liquid crystal display panel
View Patent ↗To provide an alkali-free glass substrate, which has a high Young's modulus, a low linear expansion coefficient, a high strain point and a low density, does not devitrify in the float forming process and is excellent in acid resistance. An alkali-free glass substrate, which contains neither alkali component nor BaO and consists essentially of, as represented by mol % based on oxide, from 57.0 to 65.0% of SiO 2 , from 10.0 to 12.0% of Al 2 O 3 , from 6.0 to 9.0% of B 2 O 3 , from 5.0 to 10.0% of MgO, from 5.0 to 10.0% of CaO and from 2.5 to 5.5% of SrO, provided that MgO+CaO+SrO is from 16.0 to 19.0%, MgO/(MgO+CaO+SrO)≧0.40, and B 2 O 3 /(SiO 2 +Al 2 O 3 +B 2 O 3 )≦0.12; wherein Young's modulus ≧75 GPa; the linear expansion coefficient at from 50 to 350° C. is from 30×10 −7 /° C. to 40×10 −7 /° C.; the strain point ≧640° C.; the temperature T 2 (the viscosity η satisfies log η=2)≦1,620° C.; the temperature T 4 (the viscosity η satisfies log η=4)≦1,245° C.; the devitrification temperature ≦T 4 ; and weight loss per unit area is at most 0.6 mg/cm 2 , when immersed in 0.1N HCl at 90° C. for 20 hours.
1. An alkali metal-free glass substrate, comprising substantially no alkali component or BaO and consisting essentially of, as represented by mol% based on oxide, from 57.0 to 65.0% of SiO 2 , from 10.0 to 12.0% of Al 2 O 3 , from 6.0 to 9.0% of B 2 O 3 , from 5.0 to 10.0% of MgO, from 6.0 to 8.0% of CaO and from 2.5 to 5.5% of SrO, provided that MgO+CaO+SrO is from 16.0 to 19.0%, MgO/(MgO+CaO+SrO)≧0.40, and B 2 O 3 /(SiO 2 +Al 2 O 3 )≦0.12; wherein Young's modulus ≧75 GPa; the linear expansion coefficient at from 50 to 350° C. is from 30×10 −7 /° C. to 40×10 −7 /° C.; the strain point ≧640° C.; the temperature T 2 (the viscosity η satisfies logη=2) is at least 1,580° C. and at most 1,620° C.; the temperature T 4 (the viscosity η satisfies logη=4) ≦1,245° C.; the devitrification temperature ≦T 4 ; and weight loss per unit area is at most 0.2 mg/cm 2 , when immersed in 0.1N HCl at 90° C. for 20 hours.
2. The alkali metal-free glass substrate according to claim 1 , consisting essentially of, as represented by mol% based on oxide, from 60.0 to 65.0% of SiO 2 , from 10.0 to 12.0% of Al 2 O 3 , from 6.0 to 9.0% of B 2 O 3 , from 5.5 to 8.5% of MgO, from 5.0 to 10.0% of CaO and from 2.5 to 5.5% of SrO, provided that MgO+CaO+SrO is from 16.0 to 18.5%, MgO/(MgO+CaO+SrO) ≧0.40, and B 2 O 3 /(SiO 2 +Al 2 O 3 +B 2 O 3 )≦0.12.
3. The alkali metal-free glass substrate according to claim 1 , further comprising from 500 ppm to 1.0 weight % of SnO 2 .
4. A liquid crystal display panel, comprising at least one alkali metal-free glass substrate as defined in claim 1 .
5. A method for producing an alkali metal-free glass substrate, comprising:
melting a glass material so as to form a glass composition which comprises neither alkali component nor BaO and consists essentially of, as represented by mol % based on oxide, from 57.0 to 65.0% of SiO 2 , from 10.0 to 12.0% of Al 2 O 3 , from 6.0 to 9.0% of B 2 O 3 , from 5.0 to 10.0% of MgO, from 6.0 to 8.0% of CaO and from 2.5 to 5.5% of SrO, provided that MgO+CaO+SrO is from 16.0 to 19.0%; MgO/(MgO+CaO+SrO) ≧0.40, and B 2 O 3 /(SiO 2 +Al 2 O 3 +B 2 O 3 ) ≦0.12, followed by
forming said alkali-free glass substrate by a float process, wherein the temperature to melt the glass material is lower than 1,630° C., and the maximum temperature of the glass melt at an inlet of a float bath is 1,250° C.
6. The method for producing an alkali metal-free glass substrate according to claim 5 , comprising:
melting a glass material so as to form a glass composition which comprises neither alkali component nor BaO and consists essentially of, as represented by mol % based on oxide, from 60.0 to 65.0% of SiO 2 , from 10.0 to 12.0% of Al 2 O 3 , from 6.0 to 9.0% of B 2 O 3 , from 5.5 to 8.5% of MgO, from 5.0 to 10.0% of CaO and from 2.5 to 5.5% of SrO; MgO+CaO+SrO is from 16.0 to 18.5%, MgO/(MgO+CaO+SrO) ≧0.40, and B 2 O 3 /(SiO 2 +Al 2 O 3 +B 2 O 3 ) ≦0.12, followed by
forming by a float process, wherein the temperature to melt the glass material is lower than 1,620° C., and the maximum temperature of the glass melt at an inlet of a float bath is 1,245° C.
7. The method for producing an alkali metal-free glass substrate according to claim 5 , wherein the glass material comprises from 0.1 to 1.0 weight % of SnO 2 .
8. The method for producing an alkali metal-free glass substrate according to claim 5 , wherein the glass material further comprises from 0.1 to 1.0 weight % of SnO 2 , and the method comprises
heating the glass material at a temperature of from 1,450 to 1,580° C. to form molten glass, and
subsequent to forming the molten glass, heating the molten glass at a temperature of at least 1,500° C. and lower than 1,630° C. to remove bubbles, wherein the temperature of the molten glass to remove bubbles is higher by at least 30° C. than the temperature of the molten glass to be formed.