Method for manufacturing patterned magnetic recording medium
View Patent ↗A method for manufacturing a patterned magnetic recording medium that allows processing only required sites with high precision, in a dry etching process during formation of an uneven pattern in an interlayer. The method includes forming sequentially, on a substrate, a soft magnetic layer, an etching stop layer, a seed layer, an interlayer, a hard mask layer and a resist; obtaining a resist pattern by patterning the resist; obtaining a patterned hard mask layer by etching the hard mask layer using the resist pattern as a mask; stripping the resist pattern; obtaining a patterned interlayer by etching the interlayer using the patterned hard mask layer as a mask; stripping the patterned hard mask layer; and forming a magnetic recording layer by forming a perpendicular orientation section on the patterned interlayer, and forming a random orientation section on the seed layer.
1. A method for manufacturing a patterned magnetic recording medium, comprising:
forming sequentially, on a substrate, a soft magnetic layer, an etching stop layer, a seed layer, an interlayer, a hard mask layer and a resist;
obtaining a resist pattern by patterning the resist;
obtaining a patterned hard mask layer by etching the hard mask layer using the resist pattern as a mask;
stripping the resist pattern;
obtaining a patterned interlayer by etching the interlayer using the patterned hard mask layer as a mask;
stripping the patterned hard mask layer; and
forming a magnetic recording layer by forming a perpendicular orientation section on the patterned interlayer and forming a random orientation section on the seed layer.
2. The method for manufacturing a patterned magnetic recording medium according to claim 1 , wherein a non-magnetic material is used in the etching stop layer.
3. The method for manufacturing a patterned magnetic recording medium according to claim 1 , wherein an amorphous material is used in the etching stop layer.
4. The method for manufacturing a patterned magnetic recording medium according to claim 1 , wherein ion beam etching is used to etch the interlayer, and a material having a lower sputtering yield than a material of the interlayer is used in the etching stop layer.
5. The method for manufacturing a patterned magnetic recording medium according to claim 1 , wherein ion reactive etching is used to etch the interlayer, and a non-magnetic material resistant to a reactive gas is used in a material of the interlayer.
6. The method for manufacturing a patterned magnetic recording medium according to claim 1 , wherein the thickness of the etching stop layer is no greater than 10 nm.
7. The method for manufacturing a patterned magnetic recording medium according to claim 1 , wherein electron beam exposure or imprinting is used to pattern the resist.
8. The method for manufacturing a patterned magnetic recording medium according to claim 1 , further comprising forming a protective layer on the magnetic recording layer.
9. The method for manufacturing a patterned magnetic recording medium according to claim 1 , wherein dry etching is used to etch at least one of the hard mask layer and the interlayer.
10. The method for manufacturing a patterned magnetic recording medium according to claim 1 , wherein stripping of the resist pattern and etching of the interlayer are carried out simultaneously, a material comprising Ru is used in the interlayer, and an O 2 gas plasma is used in the etching.