Biaxial MEMS mirror with hidden hinge
View Patent ↗A multi-layer hidden hinge and actuator design for high fill factor biaxial MEMS mirror array for wavelength selective switches (WSS) based on a silicon-on-insulator (SOI) process with wafer bonding and coarsely aligned orthogonal vertical comb and/or parallel plate actuator. Each micro-mirror in the MEMS linear piano micro-mirror array comprises a micro-mirror layer, a hinge layer and an electrode/substrate layer. Preferably, the roll and tilt electrodes are substantially disposed along the roll axis to provide a high fill factor. The structure is formed by fabricating the layers separately in SOI structure and then bonding them together.
1. A micro-electro-mechanical device comprising:
a substrate with first and second supports extending upwardly therefrom;
a tilting element pivotable about a first axis;
first hinges, defining the first axis, extending from opposite sides of the tilting element;
a rolling element, surrounding the tilting element and receiving the ends of the first hinges, pivotable about a second axis perpendicular to the first axis;
second hinges, defining the second axis, extending from opposite ends of the rolling element, the outer ends of which are fixed to one of the first and second supports;
a pedestal extending upwardly from the tilting element;
a reflective body mounted on the pedestal;
a first electrode mounted on the substrate along the second axis for rotating the tilting element and the reflective body about the first axis; and
a second electrode mounted on the substrate including a first section along the second axis between the first electrode and the first support and a second section along the second axis between the first electrode and the second support, for rotating the rolling element, the tilting element and the reflective body about the second axis.
2. The MEMs device according to claim 1 , wherein the second electrode also comprises an elongated portion extending between the first and second sections adjacent to the first electrode, and beneath a side of the rolling element.
3. The MEMs device according to claim 1 , wherein the reflective body is wider than the rolling element, whereby the reflective bodies of adjacent MEMs device have only an air gap therebetween.
4. The MEMs device according to claim 1 , wherein the first electrode comprises a first electrostatic comb drive including comb fingers extending laterally parallel to the first axis; and wherein the tilting element includes laterally extending beams offset with the comb fingers in the first electrode.
5. The MEMs device according to claim 4 , wherein the comb fingers of the first electrode are symmetrical about the second axis.
6. The MEMs device according to claim 1 , wherein the second electrode comprises second and third electrostatic comb drives, each including comb fingers extending longitudinally parallel to the second axis; and wherein the rolling element includes longitudinally extending beams offset with the comb fingers in the second and third electrostatic comb drives.
7. The MEMs device according to claim 1 , wherein the rolling element comprises first and second crossbraces extending along opposite sides of the tilting element for receiving the ends of the first hinge, and first and second rolling structures fixed at opposite ends of the first and second crossbars providing ground electrode surfaces.
8. The MEMs device according to claim 7 , wherein each of the first and second rolling structures comprises longitudinally extending beams forming a ground electrode disposed above the second electrode; and wherein the second electrode comprises comb fingers offset from the longitudinally extending beams.
9. The MEMs device according to claim 8 , wherein the tilting element comprises first and second tilting structures, each comprised of laterally extending beams forming a ground electrode disposed above the first electrode; and wherein the first electrode comprises comb fingers offset from the laterally extending beams.
10. The MEMs device according to claim 1 , wherein the tilt hinges comprise serpentine torsional hinges with an aspect ratio greater than ten, enabling rotation of the tilting element about the first axis and resisting rotation of the tilting element about the second axis; and
wherein the roll hinges comprise serpentine torsional hinges with an aspect ratio greater than ten, enabling rotation of the rolling element about the second axis and resisting rotation of the rolling element about the first axis.
11. A method of manufacturing a MEMs device comprising:
a) forming a substrate with first and second electrodes thereon;
b) forming a middle section on a first wafer handle including:
a tilting element pivotable about a first axis;
first hinges, defining the first axis extending laterally from opposite sides of the tilting element;
a rolling element, pivotable about a second axis perpendicular to the first axis, surrounding the tilting element, and receiving the ends of the first torsional hinge;
second hinges, defining the second axis, extending longitudinally from opposite ends of rolling element; and
a mounting platform fixed to each outer end of the second torsional hinge;
c) forming a reflective body section including a pedestal and a reflective body on a second wafer handle;
d) mounting the pedestal of the mirror section onto the tilting element of the middle section;
e) removing the first wafer handle from the middle section;
f) mounting the mounting platforms of the middle section onto opposite ends of the substrate section suspending the tilting and rolling elements above the first and second electrodes, respectively; and
g) removing the second handle wafer of the reflective body section.
12. The method according to claim 11 , wherein the first electrode is mounted on the substrate along the second axis for rotating the tilting element and the reflective body about the first axis; and
a second electrode is mounted on the substrate and includes a first section along the second axis between the first electrode and the first support and a second section along the second axis between the first electrode and the second support, for rotating the rolling element, the tilting element and the reflective body about the second axis.
13. The method according to claim 11 , wherein step f) includes fixing the mounting platforms of the middle section onto raised portions of the second electrodes.
14. The method according to claim 11 , wherein step f) includes fixing the mounting platforms of the middle section onto raised portions of the substrate.
15. The method according to claim 11 , wherein step a) includes forming the first electrode with a first electrostatic comb drive including comb fingers extending laterally parallel to the first axis; and wherein step b) includes forming the tilting element with laterally extending beams offset with the comb fingers in the first electrode.
16. The method according to claim 15 , wherein step a) includes forming the comb fingers of the first electrode symmetrical about the second axis.
17. The method according to claim 11 , wherein step a) includes forming the second electrode with second and third electrostatic comb drives, each including comb fingers extending longitudinally parallel to the second axis; and wherein step b) including forming the rolling element with longitudinally extending beams offset with the comb fingers in the second and third electrostatic comb drives.