IP Library Granted Patent US 7,705,666
Granted Patent B1
US 7,705,666 · App. 12/365,874 · Granted Apr 27, 2010

Filler circuit cell

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Quick Facts
Patent No.
US 7,705,666
App. No.
12/365,874
Granted
Apr 27, 2010
Kind
B1
Abstract

A filler circuit cell is disclosed. The filler circuit cell includes a decoupled capacitor, a tie low circuit and a tie high circuit. The decoupled capacitor includes a first NMOS transistor and a first PMOS transistor, in which the source/drain of the first NMOS transistor is connected to a second voltage source and the source/drain of the first PMOS transistor is connected to a first voltage source. The tie low circuit includes a second NMOS transistor and a second PMOS transistor and the tie high circuit includes a third NMOS transistor and a third PMOS transistor.

Claims (25)

1. A filler circuit cell, comprising:

a decoupled capacitor comprising a first n-type metal-oxide semiconductor (NMOS) transistor and a first p-type metal-oxide semiconductor (PMOS) transistor, wherein the source and drain of the first NMOS transistor is connected to a second voltage source and the source and drain of the first PMOS transistor is connected to a first voltage source;

a tie low circuit disposed between the first voltage source, a gate of the first PMOS transistor and the second voltage source, wherein the tie low circuit comprises a second NMOS transistor and a second PMOS transistor; and

a tie high circuit disposed between the first voltage source, a gate of the first NMOS transistor and the second voltage source, wherein the tie high circuit comprises a third NMOS transistor and a third PMOS transistor.

2. The filler circuit cell of claim 1 , wherein one source/drain of the second NMOS transistor is connected to the gate of the first PMOS transistor.

3. The filler circuit cell of claim 2 , wherein the other source and drain of the second NMOS transistor is connected to the second voltage source.

4. The filler circuit cell of claim 1 , wherein one source and drain and gate of the second PMOS transistor is connected to the gate of the second NMOS transistor.

5. The filler circuit cell of claim 4 , wherein the other source and drain of the second PMOS transistor is connected to the first voltage source.

6. The filler circuit cell of claim 1 , wherein one source and drain and gate of the third NMOS transistor is connected to the gate of the third PMOS transistor.

7. The filler circuit cell of claim 6 , wherein the other source and drain of the third NMOS transistor is connected to the second voltage source.

8. The filler circuit cell of claim 1 , wherein one source and drain of the third PMOS transistor is connected to the gate of the first NMOS transistor.

9. The filler circuit cell of claim 8 , wherein the other source and drain of the third PMOS transistor is connected to the first voltage source.

10. The filler circuit cell of claim 1 , wherein the first voltage source is a Vdd voltage source.

11. The filler circuit cell of claim 1 , wherein the second voltage source is a Vss voltage source.

12. A filler circuit cell, comprising:

a decoupled capacitor comprising a first MOS transistor, wherein the source and drain of the first MOS transistor is connected to a first voltage source; and

a voltage stabilizing unit disposed between the first voltage source, a gate of the first MOS transistor and a second voltage source to prevent damage for the gate of the first MOS transistor caused by sudden glitches, wherein the voltage stabilizing unit comprises a second MOS transistor and a third MOS transistor.

13. The filler circuit cell of claim 12 , wherein one source and drain of the second MOS transistor is connected to the gate of the first MOS transistor.

14. The filler circuit cell of claim 13 , wherein another source and drain of the second MOS transistor is connected to the second voltage source.

15. The filler circuit cell of claim 12 , wherein one source and drain of the third MOS transistor is connected to the first voltage source.

16. The filler circuit cell of claim 15 , wherein another source and drain and gate of the third MOS transistor is connected to the gate of the second MOS transistor.

17. The filler circuit cell of claim 12 , wherein the first voltage source is a Vdd voltage source.

18. The filler circuit cell of claim 14 , wherein the second voltage source is a Vss voltage source.

19. The filler circuit cell of claim 12 , wherein the first voltage source is a Vss voltage source.

20. The filler circuit cell of claim 14 , wherein the second voltage source is a Vdd voltage source.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 23, 2024
From: UNITED MICROELECTRONICS CORPORATION
To: MARLIN SEMICONDUCTOR LIMITED
Reel/Frame 068378/0470 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 4, 2009
From: HSU, CHEN-HSIEN; WANG, CHIEN-KUO
To: UNITED MICROELECTRONICS CORP.
Reel/Frame 022207/0748 →