IP Library Granted Patent US 7,881,102
Granted Patent B2
US 7,881,102 · App. 12/370,283 · Granted Feb 1, 2011

Semiconductor device including resistance storage element

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Quick Facts
Patent No.
US 7,881,102
App. No.
12/370,283
Granted
Feb 1, 2011
Kind
B2
Abstract

A phase change memory includes a memory cell with a phase change element storing data according to level change of a resistance value in association with phase change, a write circuit converting the phase change element to an amorphous state or a polycrystalline state according to the logic of write data in a write operation mode, a read circuit reading out stored data from the phase change element in a readout operation mode, and a discharge circuit applying a discharge voltage to the phase change element to remove electrons trapped in the phase change element in a discharge operation mode. Accordingly, variation in the resistance value at the phase change element can be suppressed.

Claims (59)

1. A semiconductor device comprising:

a memory cell including a resistance storage element storing data according to level change of a resistance value,

a write circuit applying a write voltage according to a logic of write data to said resistance storage element, and setting the resistance value of said resistance storage element in a write operation mode,

a read circuit applying a read voltage to said resistance storage element to read out stored data from said resistance storage element based on current flowing to said resistance storage element in a readout operation mode, and

a discharge circuit applying a discharge voltage to said resistance storage element to remove charge trapped in said resistance storage element in a discharge operation mode.

2. The semiconductor device according to claim 1 , wherein

said resistance storage element includes a phase change element storing data according to level change of a resistance value in association with phase change, and

said write circuit applies a first write voltage to said phase change element to convert said phase change element to a polycrystalline state when data of a first logic is to be written, and applies a second write voltage to said phase change element to convert said phase change element to an amorphous state when data of a second logic is to be written.

3. The semiconductor device according to claim 2 , wherein said phase change element includes a conductive layer and a phase change material layer that are stacked.

4. The semiconductor device according to claim 2 , wherein said phase change element includes a conductive layer, an insulation layer, and a phase change material layer that are stacked.

5. The semiconductor device according to claim 1 , wherein said discharge circuit applies said discharge voltage to one electrode of said resistance storage element and sets the other electrode to an open state in said discharge operation mode.

6. The semiconductor device according to claim 1 , wherein said discharge voltage differs from said write voltage and said read voltage.

7. The semiconductor device according to claim 1 , wherein said discharge operation is carried out immediately before and also immediately after at least one of said write operation and said readout operation.

8. The semiconductor device according to claim 1 , wherein said discharge operation is carried out immediately before at least one of said write operation and said readout operation.

9. The semiconductor device according to claim 1 , wherein said discharge operation is carried out immediately after at least one of said write operation and said readout operation.

10. The semiconductor device according to claim 1 , wherein said discharge operation is carried out in a period independent of immediately before and immediately after each of said write operation and said readout operation.

11. The semiconductor device according to claim 1 , wherein said memory cell includes only said resistance storage element.

12. The semiconductor device according to claim 1 , wherein said memory cell includes a diode and said resistance storage element connected in series.

13. The semiconductor device according to claim 1 , wherein said memory cell includes a field effect transistor and said resistance storage element connected in series.

14. The semiconductor device according to claim 1 , wherein said memory cell includes a bipolar transistor and said resistance storage element connected in series.

15. A semiconductor device comprising:

a memory cell array including a plurality of memory cells arranged in a plurality of rows and a plurality of columns, a plurality of word lines provided corresponding to said plurality of rows, respectively, and a plurality of bit lines provided corresponding to said plurality of columns, respectively,

each memory cell including a phase change element storing data according to level change of a resistance value in association with phase change, and an N type transistor having a gate connected to a corresponding word line, and connected to a corresponding bit line in series with said phase change element,

a write circuit applying a write voltage according to a logic of write data to a phase change element of a selected memory cell to set the resistance value of said phase change element in a write operation mode,

a read circuit applying a read voltage to a phase change element of a selected memory cell to read out stored data from said phase change element based on current flowing to said phase change element in a readout operation mode, and

a discharge circuit applying a discharge voltage to one electrode of a phase change element in each memory cell and setting the other electrode at an open state to remove charge trapped at each phase change element in a discharge operation mode.

16. The semiconductor device according to claim 15 , wherein

said N type transistor has its drain connected to a corresponding bit line via a corresponding phase change element, and receives a ground voltage at its source,

said discharge circuit sets each word line at the ground voltage, and applies a positive voltage to each bit line as said discharge voltage in said discharge operation mode.

17. The semiconductor device according to claim 15 , wherein

said memory array further includes a source line provided common to said plurality of memory cells,

said N type transistor has its drain connected to a corresponding bit line via a corresponding phase change element, and its source connected to said source line, and

said discharge circuit sets each word line at a positive voltage and each bit line at an open state, and applies a positive voltage to said source line as said discharge voltage in said discharge operation mode.

18. The semiconductor device according to claim 15 , wherein

said memory array further includes a source line and a well line provided common to said plurality of memory cells,

said N type transistor has its drain connected to a corresponding bit line via a corresponding phase change element, its source connected to said source line, and its substrate connected to said well line, and

said discharge circuit sets each word line at a ground voltage and each bit line at an open state, sets said source line at one of a positive voltage and an open state, and applies a positive voltage to said well line as said discharge voltage.

19. The semiconductor device according to claim 15 , wherein

said memory array further includes a source line provided common to said plurality of memory cells,

said N type transistor has its drain connected to a corresponding bit line via a corresponding phase change element, and its source connected to said source line, and

said discharge circuit sets each word line at one end of a positive voltage and ground voltage, applies a positive voltage to each bit line as said discharge voltage, and sets said source line at an open state in said discharge operation mode.

20. The semiconductor device according to claim 15 , wherein

said memory array further includes a source line and a well line provided common to said plurality of memory cells,

said N type transistor has its drain connected to a corresponding bit line via a corresponding phase change element, its source connected to said source line, and its substrate connected to said well line, and

said discharge circuit sets each word line at a negative voltage and each bit line at an open state, applies a negative voltage to said source line as said discharge voltage, and sets said well line at a negative voltage in said discharge operation mode.

21. The semiconductor device according to claim 15 , wherein

said memory array further includes a well line provided common to said plurality of memory cells,

said N type transistor has its drain connected to a corresponding bit line, receives a ground voltage at its source via a corresponding phase change element, and has its substrate connected to said well line,

said discharge circuit sets each word line at a negative voltage, and applies a negative voltage to each bit line as said discharge voltage, and sets said well line at a negative voltage in said discharge operation mode.

22. The semiconductor device according to claim 15 , wherein

said memory array further includes a source line provided common to said plurality of memory cells,

said N type transistor has its drain connected to a corresponding bit line, and its source connected to said source line via a corresponding phase change element, and

said discharge circuit sets each word line at a ground voltage, and applies a positive voltage to said source line as said discharge voltage in said discharge operation mode.

23. The semiconductor device according to claim 15 , wherein

said memory array further includes a source line and a well line provided common to said plurality of memory cells,

said N type transistor has its drain connected to a corresponding bit line, its source connected to said source line via a corresponding phase change element, and its substrate connected to said well line, and

said discharge circuit sets each word line at a ground voltage, each bit line at one of a positive voltage and an open state, said source line at an open state, and applies a positive voltage to said well line as said discharge voltage in said discharge operation mode.

24. The semiconductor device according to claim 15 , wherein said discharge circuit is rendered active in response to a discharge pulse signal, and

further comprises a pulse generation circuit generating said discharge pulse signal in response to one of a write activation signal activating said write circuit, a read activation signal activating said read circuit, a chip activation signal activating said semiconductor device, a module activation signal activating a module in said semiconductor device, and a discharge designation signal designating execution of said discharge operation.

Assignments (3)
CHANGE OF ADDRESS Recorded Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →
CHANGE OF NAME Recorded Sep 10, 2010
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 024973/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 12, 2009
From: NITTA, FUMIHIKO; IIDA, YOSHIKAZU; YAMAKI, TAKASHI
To: RENESAS TECHNOLOGY CORP.
Reel/Frame 022251/0764 →