Semiconductor device with a diode-type ESD protection circuit
View Patent ↗A semiconductor device has a semiconductor chip, an internal circuit region arranged on an inner side of the semiconductor chip, and a bonding pad region arranged adjacently to the internal circuit region. A diode-type ESD protection circuit is formed of a junction between a first conductivity type diffusion layer for fixing a substrate potential of the semiconductor chip and a pair of second conductivity type diffusion layers arranged on an inner side of the first conductivity type diffusion layer. The first conductivity type diffusion layer is arranged on an entire peripheral region or a part of the peripheral region of the semiconductor chip with the peripheral region being outside of the internal circuit region and the bonding pad region. One of the pair of second conductivity type diffusion layers comprising a diffusion layer for breakdown adjustment at a junction portion with the first conductivity type diffusion layer.
1. A semiconductor device, comprising:
a semiconductor chip having a peripheral region;
an internal circuit region arranged on an inner side of the semiconductor chip;
a bonding pad region arranged adjacently to the internal circuit region, an entirety of the peripheral region of the semiconductor chip being arranged outside of the internal circuit region and the bonding pad region; and
a diode-type ESD protection circuit arranged continuously along the entirety of the peripheral region of the semiconductor chip, the diode-type ESD protection circuit being formed of a junction between a first conductivity type diffusion layer for fixing a substrate potential of the semiconductor chip and a pair of second conductivity type diffusion layers having the second conductivity type different from the first conductivity type and arranged on an inner side of the first conductivity type diffusion layer, one of the pair of second conductivity type diffusion layers comprising a diffusion layer for breakdown adjustment at a junction portion with the first conductivity type diffusion layer, the first conductivity type diffusion layer and at least one of the pair of second conductivity type diffusion layers completely surrounding the internal circuit region, and the bonding pad region being disposed between the internal circuit region and the first conductivity type diffusion layer.
2. A semiconductor device according to claim 1 ; wherein the junction portion of the first conductivity type diffusion layer and the diffusion layer for breakdown adjustment is joined in a linear shape in a plane.
3. A semiconductor device according to claim 1 ; wherein the junction portion of the first conductivity type diffusion layer and the diffusion layer for breakdown adjustment is joined in a rectangular shape in a plane.
4. A semiconductor device according to claim 1 ; wherein the junction portion of the first conductivity type diffusion layer and the diffusion layer for breakdown adjustment is joined in a wave shape in a plane.
5. A semiconductor device according to claim 1 ; wherein the junction portion of the first conductivity type diffusion layer and the diffusion layer for breakdown adjustment is joined in a wedge shape in a plane.
6. A semiconductor device according to claim 1 ; wherein patterns of the first conductivity type diffusion layer and the pair of second conductivity type diffusion layers are formed linearly in a plane.
7. A semiconductor device comprising:
a semiconductor chip having a peripheral region;
an internal circuit region arranged on an inner side of the semiconductor chip;
a bonding pad region arranged adjacently to the internal circuit region; and
a diode-type ESD protection circuit arranged continuously along an entirety of the peripheral region of the semiconductor chip, the diode-type ESD protection circuit having a first conductivity type diffusion layer for fixing a substrate potential of the semiconductor chip and a pair of second conductivity type diffusion layers having the second conductivity type different from the first conductivity type and arranged on an inner side of the first conductivity type diffusion layer, one of the pair of second conductivity type diffusion layers comprising a diffusion layer for breakdown adjustment at a junction with the first conductivity type diffusion layer, the first conductivity type diffusion layer and at least one of the pair of second conductivity type diffusion layers completely surrounding the internal circuit region, and the bonding pad region being disposed between the internal circuit region and the first conductivity type diffusion layer.
8. A semiconductor device according to claim 7 ; wherein patterns of the first conductivity type diffusion layer and the pair of second conductivity type diffusion layers are formed linearly in a plane.
9. A semiconductor device according to claim 7 ; wherein the junction of the first conductivity type diffusion layer and the diffusion layer for breakdown adjustment is joined in a linear shape in a plane.
10. A semiconductor device according to claim 1 ; wherein the first conductivity type diffusion layer is formed on a semiconductor substrate having the first conductivity type.
11. A semiconductor device according to claim 7 ; wherein the first conductivity type diffusion layer is formed on a semiconductor substrate having the first conductivity type.