Lithography method
Embodiments of the invention relate to lithography method useful for patterning at sub-micron resolution. This method comprised of deposition and patterning self-assembled monolayer resists using rolling applicator and rolling mask exposure apparatus. Typically the application of these self-assembled monolayers involves contacting substrate materials with a rotatable applicator in the shape of cylinder or cone wetted with precursor materials. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact with self-assembled monolayer. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating mask surface comprises metal nano holes or nanoparticles.
1. A lithography method, comprising:
a) depositing a self-assembled monolayer on substrate surface;
b) providing a rotatable mask having a shape of a cylinder or a cone and a nanopattem on an exterior surface of said rotatable mask;
c) contacting said nanopattem with said self-assembled monolayer;
d) distributing radiation through said nanopattem, while rotating said rotatable mask over said self-assembled monolayer, whereby an image having a feature size less than 500 nm is created in said self-assembled monolayer.
2. A method in accordance with the claim 1 , wherein such depositing a self-assembled monolayer on a substrate, comprising:
a) providing a substrate,
b) providing an applicator in a shape of cylinder or cone,
c) coating this applicator with molecules, terminating at least at one end in a functional group capable to bind to the substrate material,
d) transferring these molecules from the applicator onto the substrate by rolling said applicator on the surface of the substrate.
3. A method in accordance with claim 2 , wherein said molecules terminating at the other end in a functional group not capable to bind to said substrate material, thus molecules are binding to said surface preferentially with only one end and thus form a self-assembled monolayer on said substrate material.
4. A method according to claim 2 wherein said applicator made of a polymer material.
5. A method according to claim 2 wherein said polymer material is a silicone elastomer.
6. A method according to claim 2 wherein coating of said applicator is done by soaking in liquid.
7. A method according to claim 2 wherein said molecules are allowed to swell into said polymer.
8. A method according to claim 2 wherein more than one applicators used sequentially to transfer molecules to said substrate surface.
9. A method according to claim 2 , wherein the substrate is static and applicator is moving during said rolling.
10. A method according to claim 2 , wherein substrate is moving and applicator position is static during said rolling action.
11. A method according to claim 2 , further comprising using an additional applicator positioned on the other side of the said substrate to provide deposition on both sides of said substrate.
12. A method in accordance with claim 2 further comprising providing a controllable moisture containment.
13. A method in accordance with claim 1 , wherein said nanopattern is a conformable nanopattern, which conforms to said self-assembled monolayer.
14. A method in accordance with claim 1 , wherein said conformable nanopattern is a shaped or nanostructured polymeric material.
15. A method in accordance with claim 1 , wherein said rotatable mask is a phase-shifting mask which causes radiation to form an interference pattern in said radiation-sensitive layer.
16. A method in accordance with claim 1 , wherein said mask employs surface plasmon behavior.
17. A method in accordance with claim 1 , wherein said rotatable mask is a transparent cylinder or cone, whereby radiation may be transmitted from a location interior of said cylinder or cone.
18. A method in accordance with claim 1 , wherein said mask is a phase shifting mask which is present on a layer applied over a surface of said cylinder or cone.
19. A method in accordance with claim 1 , wherein said substrate is kept in dynamic contact with said rotatable mask during distribution of radiation from the contact surface of said mask.
20. A method according to claim 1 further comprising providing a containment with controllable flow of oxygen or ozone.