Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the same
An etchant composition that allows simplification and optimization of semiconductor manufacturing process is presented, along with a method of patterning a conductive layer using the etchant and a method of manufacturing a flat panel display using the etchant. The etchant includes nitric acid, phosphoric acid, acetic acid, and an acetate compound in addition to water.
1. A composition of etchant, comprising:
nitric acid of about 2 weight % to about 5 weight %;
phosphoric acid of about 50 weight % to about 77 weight %;
acetic acid of about 1 weight % to about 25 weight %;
acetate compound of about 1 weight % to about 10 weight %;
and water of residual quantity.
2. The composition according to claim 1 , wherein the acetate compound includes at least one anion of sodium (Na), potassium (K), ammonia (NH3), calcium (Ca), and aluminum (Al).
3. The composition according to claim 1 , wherein the acetate compound is an acid salt.