IP Library Granted Patent US 8,420,258
Granted Patent B2
US 8,420,258 · App. 12/392,525 · Granted Apr 16, 2013

High capacity electrodes

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Quick Facts
Patent No.
US 8,420,258
App. No.
12/392,525
Granted
Apr 16, 2013
Kind
B2
Abstract

A high capacity electrode includes a conducting substrate on which a plurality of support filaments are disposed. Each of the support filaments have a length substantially greater than their width and may include, for example, a carbon nano-tube (CNT), a carbon nano-fiber (CNF), and/or a nano-wire (NW). The support filaments are coated with a material, such as silicon, having a greater ion absorbing capacity greater than the neat support filaments. A trunk region of the support filaments proximate to the substrate is optionally kept free of ion absorbing material. This trunk region allows for the expansion of the ion absorbing material without detaching the support filaments form the substrate.

Claims (28)

1. A system comprising:

a first electrode disposed in a first region of electrolyte and including a substrate, a plurality of electron conductive support filaments attached to the substrate, and

an ion absorbing material attached to the support filaments and configured to expand in volume at least 5 percent up to 400 percent when absorbing ions;

a separator configured to separate the first region and a second region of electrolyte; and

a second electrode disposed in the second region of electrolyte, the first and second electrodes and separator configured to operate as a rechargeable battery.

2. The system of claim 1 , wherein the ion absorbing material covers some but not all of each of the plurality of support filaments.

3. The system of claim 1 , wherein the ion absorbing material covers an area of a member of the plurality of support filaments distal to the substrate and does not cover an area of the member of the plurality of support filaments proximate to the substrate.

4. The system of claim 1 , wherein a thickness of the ion absorbing material is greater at an end of the support filaments distal to the substrate relative to a thickness at an end of the support filaments proximate to the substrate.

5. The system of claim 1 , wherein the plurality of support filaments are each branched.

6. The system of claim 1 , wherein the ion absorbing material includes silicon.

7. The system of claim 1 , wherein the plurality of support filaments comprise a carbon nano-tube (CNT), a carbon nano-fiber (CNF), or a nano-wire (NW).

8. The system of claim 1 , wherein a density of the plurality of support filaments is selected such that the ion absorbing material can expand at least 5 percent up to 400 percent in volume without detaching members of the plurality of support filaments from the substrate.

9. The system of claim 1 , wherein the plurality of support filaments are substantially each less than 500 nanometers and greater than 100 nanometers in diameter.

10. An electrode comprising: a conductive substrate; a plurality of electron conductive support filaments attached to the substrate, the support filaments

comprising a carbon nano-tube (CNT), a carbon nano-fiber (CNF), or a nano-wire (NW), and

an ion absorbing material attached to some but not all of each of the support filaments and configured to expand in volume by at least five percent when absorbing ions.

11. The electrode of claim 10 , wherein the ion absorbing material is disposed on the support filaments so as to form a trunk of the support filaments essentially not coated by the ion absorbing material.

12. The electrode of claim 11 , wherein the trunk is at least 0.25 micrometers in length.

13. The electrode of claim 10 , wherein the ion absorbing material includes silicon.

14. The electrode of claim 10 , wherein the plurality of support filaments are attached to the conductive substrate using a seed layer.

15. A method comprising: receiving a conductive substrate; forming a plurality of electron conductive support filaments coupled to the conductive substrate, the

support filaments having an aspect ratio (length/width) of at least 10:1 to 100:1; and

coating the plurality of support filaments with an ion absorbing material to create an electrode, the ion absorbing material having at least a two times greater ion absorbing capacity for ions than the support filaments.

16. The method of claim 15 , further comprising forming a seed layer on the substrate, the seed layer configured for forming the plurality of support filaments.

17. The method of claim 15 , further comprising placing the electrode in contact with an electrolyte.

18. The method of claim 15 , further comprising using the electrode in a rechargeable battery.

19. The method of claim 15 , further comprising repeatedly using the electrode to absorb and desorb ions without detaching the plurality of support filaments from the substrate.

20. The method of claim 15 , wherein coating the plurality of support filaments with the ion absorbing material includes producing a trunk of the support filaments proximate to the substrate essentially free of ion absorbing material.

Assignments (7)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 20, 2024
From: CF TRAVERSE LLC
To: CONTEMPORARY AMPEREX TECHNOLOGY (HONG KONG) LIMITED
Reel/Frame 069347/0777 →
RELEASE OF SECURITY INTEREST Recorded Sep 3, 2024
From: DBD CREDIT FUNDING LLC
To: CF TRAVERSE LLC
Reel/Frame 068473/0389 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 13, 2018
From: TRAVERSE TECHNOLOGIES CORP.
To: CF TRAVERSE LLC
Reel/Frame 045535/0786 →
SECURITY INTEREST Recorded Jan 11, 2017
From: MOTHEYE TECHNOLOGIES, LLC; SYNCHRONICITY IP LLC; TRAVERSE TECHNOLOGIES CORP.; 3D NANOCOLOR CORP.; BISMARCK IP INC.; MAGNUS IP GMBH; MUNITECH IP S.À.R.L.; VERMILION PARTICIPATIONS; MARATHON VENTURES S.À.R.L; NYANZA PROPERTIES; MARATHON IP GMBH; ORTHOPHOENIX, LLC; MEDTECH DEVELOPMENT DEUTSCHLAND GMBH; SYNCHRONICITY IP GMBH; TLI COMMUNICATIONS GMBH
To: DBD CREDIT FUNDING LLC, AS COLLATERAL AGENT
Reel/Frame 041333/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 12, 2016
From: CPT IP HOLDINGS, LLC
To: TRAVERSE TECHNOLOGIES CORP.
Reel/Frame 039996/0478 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 29, 2016
From: CATALYST POWER TECHNOLOGIES, INC.
To: CPT IP HOLDINGS, LLC
Reel/Frame 038124/0115 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 26, 2013
From: ROJESKI, RONALD A.
To: CATALYST POWER TECHNOLOGIES
Reel/Frame 030296/0442 →