Use of chained implants in solar cells
View Patent ↗The manufacture of solar cells is simplified and cost reduced through by performing successive ion implants, without an intervening thermal cycle. In addition to reducing process time, the use of chained ion implantations may also improve the performance of the solar cell. In another embodiment, two different species are successively implanted without breaking vacuum. In another embodiment, the substrate is implanted, then flipped such that it can be and implanted on both sides before being annealed. In yet another embodiment, one or more different masks are applied and successive implantations are performed without breaking the vacuum condition, thereby reducing the process time.
1. A method of manufacturing a solar cell using a substrate, comprising:
creating a vacuum wherein said substrate is implanted;
performing a first ion implantation on first surface of said substrate using a first species;
introducing a mask pattern so as to cover a portion of said first surface of said substrate; and
performing a second ion implantation on said surface using a second species, whereby only an uncovered portion of said first surface of said substrate is implanted with said second species, and wherein said first and second ion implantations are performed without breaking said vacuum.
2. The method of claim 1 , wherein said first and second species are the same species.
3. The method of claim 1 , wherein said first and second species comprise dopants.
4. The method of claim 1 , wherein said first and second species are different species.
5. The method of claim 1 , wherein said first species or said second species comprises a non-dopant.
6. The method of claim 1 , wherein a second mask pattern is introduced prior to said first ion implantation, such that only a portion of said substrate is implanted by said first species.
7. A method of manufacturing a solar cell using a substrate, comprising:
creating a vacuum wherein said substrate is implanted;
performing a first ion implantation on a first surface of said substrate using a first species;
flipping said substrate so as to expose a second surface;
introducing a mask pattern so as to cover a portion of said second surface of said substrate; and
performing a second ion implantation on said second surface using a second species, whereby only an uncovered portion of said second surface of said substrate is implanted with said second species, and wherein said first and second ion implantations are performed without breaking said vacuum.
8. The method of claim 7 , wherein said first and second species are the same species.
9. The method of claim 7 , wherein said first and second species comprise dopants.
10. The method of claim 7 , wherein said first and second species are different species.
11. The method of claim 7 , wherein said first species or said second species comprises a non-dopant.
12. The method of claim 7 , wherein a second mask pattern is introduced prior to said first ion implantation, such that only a portion of said first surface of said substrate is implanted by said first species.
13. A method of manufacturing a solar cell using a substrate, comprising:
creating a vacuum wherein said substrate is implanted;
performing a first ion implantation on a first surface of said substrate using a first species;
flipping said substrate so as to expose a second surface; and
performing a second ion implantation on said second surface using a second species, wherein said first and second ion implantations are performed without breaking said vacuum.
14. The method of claim 13 , wherein said first and second species are the same species.
15. The method of claim 13 , wherein said first and second species comprise dopants.
16. The method of claim 13 , wherein said first and second species are different species.
17. The method of claim 13 , wherein said first species or said second species comprises a non-dopant.
18. The method of claim 13 , wherein a first mask pattern is introduced prior to said first ion implantation, such that only a portion of said first surface of said substrate is implanted by said first species.
19. The method of claim 17 , wherein a second mask pattern is introduced prior to said second ion implantation, such that only a portion of said second surface of said substrate is implanted by said second species.
20. The method of claim 13 , wherein a mask pattern is introduced prior to said second ion implantation, such that only a portion of said second surface of said substrate is implanted by said second species.