Granted Patent B2

US 8,177,323 · App. 12/404,295 · Granted May 15, 2012

Abstract

Claims (35)

1. A method for printing an image on a substrate, the method comprising:

applying a clear liftoff material to a surface of the substrate to form a sacrificial pattern, the clear liftoff material being substantially optically clear;

applying a first marking material to the surface of the substrate to form a first static pattern, a portion of the first static pattern arranged directly above a portion of the sacrificial pattern;

removing the portion of the first static pattern from the surface of the substrate;

after removing the portion of the first static pattern from the surface of the substrate, tacking a remaining portion of the first static pattern using an Ultra-Violet (UV) light; and

removing the sacrificial pattern from the surface of the substrate.

2. The method of claim 1 , further comprising, before applying the first marking material, smoothing the top surface of the sacrificial pattern.

3. The method of claim 1 , in which applying the clear liftoff material to the surface of the substrate comprises ink jetting the clear liftoff material at a temperature such that a viscosity of the clear liftoff material is less than about 20 centipoise (cP) before it contacts the substrate.

4. The method of claim 3 , in which applying the clear liftoff material to the surface of the substrate further comprises ink jetting the clear liftoff material at the temperature such that the viscosity of the clear liftoff material is about 1 to about 10 centipoise (cP) before it contacts the substrate.

5. The method of claim 1 , further comprising simultaneously increasing a viscosity of the first marking material and decreasing a viscosity of the clear liftoff material by exposing the first marking material and the clear liftoff material to an Ultra-Violet (UV) light.

6. The method of claim 5 , further comprising using a chemical wash to selectively dissolve the clear lift-off material layer without attacking the marking material or substrate.

7. The method of claim 5 , in which decreasing the viscosity of the clear liftoff material comprises breaking a chemical bond in the clear liftoff material using the UV light.

8. The method of claim 5 , in which decreasing the viscosity of the clear liftoff material comprises heating the clear liftoff material.

9. The method of claim 1 , in which the clear liftoff material comprises silicone oil or a silicone-like copolymer that is structured to repel the first marking material.

10. The method of claim 1 , in which removing the portion of the first static pattern from the surface of the substrate and removing the sacrificial pattern from the surface of the substrate comprises:

heating the clear liftoff material such that it splits from the substrate; and

picking up the portion of the first static pattern and picking up the clear liftoff material using a cleaning roller.

11. The method of claim 10 , in which heating the clear liftoff material such that it splits from the substrate comprises heating the clear liftoff material such that a viscosity of the clear liftoff material is in the range of 5,000 to about 50,000 centipoise (cP).

12. The method of claim 1 , in which removing the sacrificial pattern from the surface of the substrate comprises decreasing a viscosity of the clear liftoff material such that the clear liftoff material is absorbed into the substrate.

13. The method of claim 12 , in which a tackiness of the marking material relative to the substrate is greater than a tackiness of the clear liftoff material relative to the substrate.

14. The method of claim 1 , in which removing the portion of the first static pattern from the surface of the substrate and removing the sacrificial pattern from the surface of the substrate comprises mechanically scraping the clear liftoff material and the portion of the first static pattern from the surface of the substrate.

15. The method of claim 1 , further comprising:

applying a second marking material to the surface of the substrate to form a second static pattern, a portion of the second static pattern arranged directly above the portion of the sacrificial pattern; and

removing the portion of the second static pattern from the surface of the substrate.

16. A system comprising:

a first unit arranged to inkjet a clear liftoff material onto a selected portion of a surface of a substrate;

a second unit arranged to apply a first amount of marking material to the surface of the substrate and a surface of the clear liftoff material, the first amount of marking material including a second amount of marking material that is applied to the surface of the clear liftoff material;

a tacking unit positioned downstream of the second unit, the tacking unit arranged to emit ultra-violet (UV) light onto the substrate; and

a heating roller and a web cleaner positioned downstream of the second unit, the heating roller adapted to encourage splitting of the clear liftoff material, the web cleaner adapted to remove the second amount of marking material and the clear liftoff material from the substrate.

17. The system of claim 16 , the second unit comprising an offset printing unit.

18. The system of claim 16 , further comprising a heater disposed downstream of the heated roller.

19. The system of claim 16 , in which the tacking unit is disposed upstream of the heated roller.

20. The system of claim 16 , in which the tacking unit is disposed downstream of the heated roller.

21. The system of claim 16 , the second unit comprising a flexographic printing unit, the tacking unit disposed between the flexographic printing unit and the heating roller.

22. The system of claim 16 , further comprising a scraper configured to scrape the clear liftoff material from the surface of the substrate.

Assignments (11)